Abstract: A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.

Abstract: Methods, apparatuses and computer-readable media for creating a spatial bookmark are provided. A method includes performing an action at a near location which causes a spatial bearing parameter corresponding to a real-time video image captured by a video-camera platform at a remote location to be stored in a computer-readable memory, wherein the video-camera platform has a controllable LOS. Performing an action at the near location that designates to a computer an image displayed on a screen, wherein the image is representative of the real-time video image, thereby causing the computer to retrieve the spatial bearing parameter from the computer-readable memory, and performing an action causing the computer to aim the video-camera platform along a LOS, wherein the video-camera platform captures a real-time video image that is received at a screen for display at the near location.

Abstract: A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.

Abstract: A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.

Abstract: A method for reducing audio latency when executing program instructions for processing audio data is provided. In this method, a top threshold value and a bottom threshold value are provided. A determination is then made as to the amount of audio data stored in an audio buffer of an audio renderer. Thereafter, the amount is compared with the top threshold value and the bottom threshold value, and accordingly, an audio data feed to the audio renderer is adjusted incrementally such that the amount is between the top threshold value and the bottom threshold value.

Abstract: A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.

Abstract: A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.

Abstract: An apparatus includes a light-emitting diode. The light-emitting diode has a semiconductor matrix of one or more group III-nitride alloys and quantum dots dispersed inside the matrix. The quantum dots include a group III-nitride alloy different from the one or more group III-nitride alloys of the matrix.

Abstract: A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.

Abstract: An apparatus includes a substrate and a plurality of DNA oligomers in contact with a top surface of the substrate. The substrate is a polar ferroelectric or a polar compound semiconductor.

Abstract: The invention comprises a method of dual oxide gate formation comprising the steps of forming a first gate oxide and forming a second gate oxide using in-situ steam generation oxidation.

Abstract: A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.

Abstract: A media sheet handling system for duplex printing is disclosed. During duplex printing, the media sheet whose first side is printed is directed into a duplex print path, wherein the media sheet is reversed to a flipped over state with respect to its original position and the original leading edge is maintained to be the leading edge for subsequent printing.

Abstract: A printer having a system to manage the output path of wet printed media is disclosed. In such a system, the wet printed media are held for a time before being ejected into an output tray to avoid the smearing of the wet print markings made on the media. The system achieves this holding time by causing the wet printed media to travel an additional distance over movable ramps before being ejected. In addition, the movements of the ramps are synchronized with the various operations in the printing cycle of the printer.

Abstract: A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.