Abstract: A light-emitting diode includes a substrate, a buffer layer on the substrate, a first semiconductor layer on the buffer layer, a light-emitting layer on the first semiconductor layer, a second semiconductor layer on the light-emitting layer, wherein the first semiconductor layer is partially exposed through the second semiconductor layer and the light-emitting layer, a first electrode on the exposed first semiconductor layer, and a second electrode on the second semiconductor layer, the second electrode having a grid shape.

Abstract: A prism sheet, a back light unit using the same and liquid crystal display device having the back light unit are disclosed, for improvement of light concentration, frontal luminance and viewing angle, in which the prism sheet includes a light-condensing film. The light condensing film has a plurality of prism peaks, each having a triangular cross section inclined surface which is inclined from a top surface of the light-condensing film at an angle of about 20° to about 40°.

Abstract: A backlight unit for a display device is disclosed. The backlight unit includes a first optical sheet, a light source to supply light to the first optical sheet, and a first antireflection layer on a surface of the first optical sheet.

Abstract: A light-emitting diode includes a substrate, a buffer layer on the substrate, a first semiconductor layer on the buffer layer, a light-emitting layer on the first semiconductor layer, a second semiconductor layer on the light-emitting layer, wherein the first semiconductor layer is partially exposed through the second semiconductor layer and the light-emitting layer, a first electrode on the exposed first semiconductor layer, and a second electrode on the second semiconductor layer, the second electrode having a grid shape.

Abstract: A backlight unit for a display device is disclosed. The backlight unit includes a first optical sheet, a light source to supply light to the first optical sheet, and a first antireflection layer on a surface of the first optical sheet.

Abstract: A semiconductor device includes a substrate and a first layer of a first conductive material on the substrate, the first layer having a first etching rate. A second layer of a second conductive material has a first hole on a portion of the first layer, the second layer having a second etching rate higher than the first etching rate. A third layer includes a combination of the first and second layers between the first and the second layers, the third layer having a third etching rate lower than the second etching rate. An insulating layer has a second hole on the third layer, the insulating layer having a fourth etching rate higher than the first etching rate. A transparent conductive layer is on the third layer through the first and second holes.

Abstract: A semiconductor device includes a substrate and a first layer of a first conductive material on the substrate, the first layer having a first etching rate. A second layer of a second conductive material has a first hole on a portion of the first layer, the second layer having a second etching rate higher than the first etching rate. A third layer includes a combination of the first and second layers between the first and the second layers, the third layer having a third etching rate lower than the second etching rate. An insulating layer has a second hole on the third layer, the insulating layer having a fourth etching rate higher than the first etching rate. A transparent conductive layer is on the third layer through the first and second holes.

Abstract: A semiconductor device includes a substrate and a first layer of a first conductive material on the substrate, the first layer having a first etching rate. A second layer of a second conductive material has a first hole on a portion of the first layer, the second layer having a second etching rate higher than the first etching rate. A third layer includes a combination of the first and second layers between the first and the second layers, the third layer having a third etching rate lower than the second etching rate. An insulating layer has a second hole on the third layer, the insulating layer having a fourth etching rate higher than the first etching rate. A transparent conductive layer is on the third layer through the first and second holes.