Patents by Inventor Hoe Young Yang

Hoe Young Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11959857
    Abstract: Provided is a Raman scattering measurement apparatus including a light source which emits light to smoke particles, a filter configured to block light which is incident to the smoke particles and passes through the particle and to allow Raman scattered light to pass therethrough, and a photodetector which detects the Raman scattered light passing through the filter in order to distinguish fire smoke generated due to a true fire from non-fire smoke generated due to daily life or industrial activity. The present invention also provides a fire determination apparatus including a unit which reads a Raman shift from Raman scattered light detected by the photodetector of the Raman scattering measurement apparatus, estimates a smoke component from the read Raman shift, and determines fire/non-fire from the estimated smoke component and a method thereof.
    Type: Grant
    Filed: September 17, 2021
    Date of Patent: April 16, 2024
    Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Hoe Sung Yang, Soo Cheol Kim, Hyun Seok Kim, Sang Hyun Mo, So Young Park, Kang Bok Lee, Kyu Won Han
  • Publication number: 20150187887
    Abstract: Provided is a III nitride semiconductor device higher heat dissipation performance, and a method of manufacturing a III nitride semiconductor device which makes it possible to fabricate such a III nitride semiconductor device at higher yield. In a method of a III nitride semiconductor device, a semiconductor structure obtained by sequentially stacking an n-layer, an active layer, and a p-layer is formed on a growth substrate; a support body including a first support electrically connected to an n-layer to serve as an n-side electrode, a second support electrically connected to a p-layer to serve as a p-side electrode, and structures made of an insulator for insulation between first and second supports is formed on the p-layer side of the semiconductor structure; and the growth substrate is separated using a lift-off process. The first support and the second support are grown by plating.
    Type: Application
    Filed: July 4, 2012
    Publication date: July 2, 2015
    Applicants: DOWA ELECTRONICS MATERIALS CO., LTD., BBSA LIMITED
    Inventors: Meoung Whan Cho, Seog Woo Lee, Pil Guk Jang, Hoe Young Yang, Jin Hee Kim, Ho Kyun Rho, Se Young Moon, Ryuichi Toba, Yoshitaka Kadowaki