Abstract: A semiconductor device and method for fabricating the same are provided. The semiconductor device includes a substrate including a cell region, a core region, and a boundary region between the cell region and the core region, a boundary element isolation layer in the boundary region of the substrate to separate the cell region from the core region, a high-k dielectric layer on at least a part of the boundary element isolation layer and the core region of the substrate, a first work function metal pattern comprising a first extension overlapping the boundary element isolation layer on the high-k dielectric layer, and a second work function metal pattern comprising a second extension overlapping the boundary element isolation layer on the first work function metal pattern, wherein a first length of the first extension is different from a second length of the second extension.

Abstract: A semiconductor device and method for fabricating the same are provided. The semiconductor device includes a substrate including a cell region, a core region, and a boundary region between the cell region and the core region, a boundary element isolation layer in the boundary region of the substrate to separate the cell region from the core region, a high-k dielectric layer on at least a part of the boundary element isolation layer and the core region of the substrate, a first work function metal pattern comprising a first extension overlapping the boundary element isolation layer on the high-k dielectric layer, and a second work function metal pattern comprising a second extension overlapping the boundary element isolation layer on the first work function metal pattern, wherein a first length of the first extension is different from a second length of the second extension.

Abstract: A semiconductor device and method for fabricating the same are provided. The semiconductor device includes a substrate including a cell region, a core region, and a boundary region between the cell region and the core region, a boundary element isolation layer in the boundary region of the substrate to separate the cell region from the core region, a high-k dielectric layer on at least a part of the boundary element isolation layer and the core region of the substrate, a first work function metal pattern comprising a first extension overlapping the boundary element isolation layer on the high-k dielectric layer, and a second work function metal pattern comprising a second extension overlapping the boundary element isolation layer on the first work function metal pattern, wherein a first length of the first extension is different from a second length of the second extension.

Abstract: An organic light emitting diode (“OLED”) display includes: a substrate divided into a pixel area, and a peripheral area enclosing the pixel area; an OLED in the pixel area and including a first electrode, an organic emission layer and a second electrode; a common voltage line in the peripheral area and transmitting a common voltage to the second electrode; and a reaction blocking part overlapping the common voltage line.

Abstract: A semiconductor device and method for fabricating the same are provided. The semiconductor device includes a substrate including a cell region, a core region, and a boundary region between the cell region and the core region, a boundary element isolation layer in the boundary region of the substrate to separate the cell region from the core region, a high-k dielectric layer on at least a part of the boundary element isolation layer and the core region of the substrate, a first work function metal pattern comprising a first extension overlapping the boundary element isolation layer on the high-k dielectric layer, and a second work function metal pattern comprising a second extension overlapping the boundary element isolation layer on the first work function metal pattern, wherein a first length of the first extension is different from a second length of the second extension.

Abstract: A semiconductor device and method for fabricating the same are provided. The semiconductor device includes a substrate including a cell region, a core region, and a boundary region between the cell region and the core region, a boundary element isolation layer in the boundary region of the substrate to separate the cell region from the core region, a high-k dielectric layer on at least a part of the boundary element isolation layer and the core region of the substrate, a first work function metal pattern comprising a first extension overlapping the boundary element isolation layer on the high-k dielectric layer, and a second work function metal pattern comprising a second extension overlapping the boundary element isolation layer on the first work function metal pattern, wherein a first length of the first extension is different from a second length of the second extension.

Abstract: A semiconductor device and method for fabricating the same are provided. The semiconductor device includes a substrate including a cell region, a core region, and a boundary region between the cell region and the core region, a boundary element isolation layer in the boundary region of the substrate to separate the cell region from the core region, a high-k dielectric layer on at least a part of the boundary element isolation layer and the core region of the substrate, a first work function metal pattern comprising a first extension overlapping the boundary element isolation layer on the high-k dielectric layer, and a second work function metal pattern comprising a second extension overlapping the boundary element isolation layer on the first work function metal pattern, wherein a first length of the first extension is different from a second length of the second extension.

Abstract: A method for fabricating a semiconductor device includes forming a device isolation film on a substrate between first and second regions, forming first and second sealing films, such that an etch selectivity of the second sealing film is smaller than that of the first sealing film, patterning the first and second sealing films to expose the second region and a portion of the device isolation film, such that an undercut is defined under a lower surface of the second sealing film, forming a filling film filling the undercut, a thickness of the filling film being thicker on a side surface of the second sealing film than on an upper surface thereof, removing a portion of the filling film to form a filling spacer in the undercut, forming a high-k dielectric film and a metal film on the filling spacer, and patterning the high-k dielectric film and the metal film.

Abstract: An organic light emitting diode (“OLED”) display includes: a substrate divided into a pixel area, and a peripheral area enclosing the pixel area; an OLED in the pixel area and including a first electrode, an organic emission layer and a second electrode; a common voltage line in the peripheral area and transmitting a common voltage to the second electrode; and a reaction blocking part overlapping the common voltage line.

Abstract: An organic light emitting diode (“OLED”) display includes: a substrate divided into a pixel area, and a peripheral area enclosing the pixel area; an OLED in the pixel area and including a first electrode, an organic emission layer and a second electrode; a common voltage line in the peripheral area and transmitting a common voltage to the second electrode; and a reaction blocking part overlapping the common voltage line.

Abstract: A semiconductor device and method for fabricating the same are provided. The semiconductor device includes a substrate including a cell region, a core region, and a boundary region between the cell region and the core region, a boundary element isolation layer in the boundary region of the substrate to separate the cell region from the core region, a high-k dielectric layer on at least a part of the boundary element isolation layer and the core region of the substrate, a first work function metal pattern comprising a first extension overlapping the boundary element isolation layer on the high-k dielectric layer, and a second work function metal pattern comprising a second extension overlapping the boundary element isolation layer on the first work function metal pattern, wherein a first length of the first extension is different from a second length of the second extension.

Abstract: A method for fabricating a semiconductor device includes forming a device isolation film on a substrate between first and second regions, forming first and second sealing films, such that an etch selectivity of the second sealing film is smaller than that of the first sealing film, patterning the first and second sealing films to expose the second region and a portion of the device isolation film, such that an undercut is defined under a lower surface of the second sealing film, forming a filling film filling the undercut, a thickness of the filling film being thicker on a side surface of the second sealing film than on an upper surface thereof, removing a portion of the filling film to form a filling spacer in the undercut, forming a high-k dielectric film and a metal film on the filling spacer, and patterning the high-k dielectric film and the metal film.

Abstract: An organic light emitting diode (“OLED”) display includes: a substrate divided into a pixel area, and a peripheral area enclosing the pixel area; an OLED in the pixel area and including a first electrode, an organic emission layer and a second electrode; a common voltage line in the peripheral area and transmitting a common voltage to the second electrode; and a reaction blocking part overlapping the common voltage line.

Abstract: An organic light emitting diode (“OLED”) display includes: a substrate divided into a pixel area, and a peripheral area enclosing the pixel area; an OLED in the pixel area and including a first electrode, an organic emission layer and a second electrode; a common voltage line in the peripheral area and transmitting a common voltage to the second electrode; and a reaction blocking part overlapping the common voltage line.

Abstract: An organic light emitting diode (“OLED”) display includes: a substrate divided into a pixel area, and a peripheral area enclosing the pixel area; an OLED in the pixel area and including a first electrode, an organic emission layer and a second electrode; a common voltage line in the peripheral area and transmitting a common voltage to the second electrode; and a reaction blocking part overlapping the common voltage line.

Abstract: A catalyst for diesel particle filter includes a platinum (Pt)-neodymium (Nd) alloy that is carried in silica, a preparation method thereof and a soot reduction device for diesel engine including the same, wherein the catalyst for diesel particle filter can maintain high catalyst activity and implement high nitrogen monoxide (NO) conversion efficiency even though it is used under the high temperature or vulcanization condition for a long time.

Abstract: A catalyst for diesel particle filter includes a platinum (Pt)-neodymium (Nd) alloy that is carried in silica, a preparation method thereof and a soot reduction device for diesel engine including the same, wherein the catalyst for diesel particle filter can maintain high catalyst activity and implement high nitrogen monoxide (NO) conversion efficiency even though it is used under the high temperature or vulcanization condition for a long time.

Abstract: A catalyst for diesel particle filter includes a platinum (Pt)-neodymium (Nd) alloy that is carried in silica, a preparation method thereof and a soot reduction device for diesel engine including the same, wherein the catalyst for diesel particle filter can maintain high catalyst activity and implement high nitrogen monoxide (NO) conversion efficiency even though it is used under the high temperature or vulcanization condition for a long time.

Abstract: A catalyst for diesel particle filter includes a platinum (Pt)-neodymium (Nd) alloy that is carried in silica, a preparation method thereof and a soot reduction device for diesel engine including the same, wherein the catalyst for diesel particle filter can maintain high catalyst activity and implement high nitrogen monoxide (NO) conversion efficiency even though it is used under the high temperature or vulcanization condition for a long time.

Abstract: A direct internal reforming system of ethanol for a molten carbonate fuel cell (MCFC) is provided. An MCFC anode for a direct internal reforming of ethanol, a manufacturing process thereof, and a direct internal reforming method in MCFC where an ethanol solution is injected into the anode are provided. by the simple process of coating the surface of the anode with small quantity of catalyst, the drawback in that the performance of MCFC is degraded when the ethanol is directly used as a fuel is overcome. Further, an additional apparatus such as an external reforming apparatus and additional cost for pelletizing the catalyst powders are not required, which is economical. Furthermore, the performance improvement enables long-term operation, which contributes to commercialization of MCFC.