Patents by Inventor Hoite Pieter Tolsma

Hoite Pieter Tolsma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090051934
    Abstract: The invention provides a method for determining vibration-related information by projecting an aerial image at an image position in a projection plane, mapping an intensity of the aerial image into an image map, the image map arranged for comprising values of coordinates of sampling locations and of the intensity sampled at each sampling location, and measuring intensity of the aerial image received through a slot pattern. The method further includes determining from the image map a detection position of a slope portion of the image map, at the detection position of the slope portion, measuring of a temporal intensity of the aerial image and measuring of relative positions of the slot pattern and the image position, the relative positions of the slot being measured as position-related data of the slot pattern and determining from the temporal intensity of the aerial image vibration-related information for said aerial image.
    Type: Application
    Filed: July 7, 2008
    Publication date: February 26, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Haico Victor Kok, Hoite Pieter Tolsma, Gerbrand Van Der Zouw, Koen Kivits, Ron Van De Laak, Johannes Maria Kuiper
  • Publication number: 20060091330
    Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
    Type: Application
    Filed: December 6, 2005
    Publication date: May 4, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Johannes Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Koren, Hoite Pieter Tolsma, Hubertus Johannes Simons, Johny Schuurhuis, Sicco Schets, Brian Lee, Allan Dunbar
  • Publication number: 20050254030
    Abstract: An arrangement for and a method of automatically selecting substrate alignment marks on a substrate in a lithographic apparatus or overlay metrology targets in an overlay metrology apparatus. The apparatus has a processor and a memory connected to the processor. The memory stores locations of one or more sets of substrate alignment marks or overlay metrology targets available for selection and selection rules to select suitable substrate alignment marks or overlay metrology targets from this at least one set. The selection rules are based on experimental or theoretical knowledge about which substrate alignment mark or overlay metrology targets locations are optimal in dependence on one or more selection criteria.
    Type: Application
    Filed: May 14, 2004
    Publication date: November 17, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hoite Pieter Tolsma, Ramon Navarro Y. Koren, Hubertus Simons, Remi Edart, Pui Lam, Bernardus Hulshof, Roland Adrianus Bogers