Patents by Inventor Hojeong PARK

Hojeong PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOSENSITIVE COMPOSITIONS, PREPARATION METHODS THEREOF, QUANTUM DOT POLYMER COMPOSITE PREPARED THEREFROM
    Publication number: 20210200082
    Abstract: A photosensitive composition including a quantum dot dispersion, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes an acid group-containing polymer and a plurality of quantum dots dispersed in the acid group-containing polymer, and wherein the acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group or a phosphonic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic group and not having a carboxylic acid group and a phosphonic acid group.
    Type: Application
    Filed: March 17, 2021
    Publication date: July 1, 2021
    Inventors: Shin Ae JUN, Shang Hyeun PARK, Hojeong PARK, Jonggi KIM, Hyeyeon YANG, Eun Joo JANG, Yong Seok HAN