Patents by Inventor Holger Glatzel

Holger Glatzel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070160103
    Abstract: A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery path from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path.
    Type: Application
    Filed: March 6, 2007
    Publication date: July 12, 2007
    Applicant: Cymer, Inc.
    Inventors: Palash Das, Khurshid Ahmed, Gregory Francis, Holger Glatzel, Alexei Lukashev, Jeremy Tyler, R. Webb
  • Patent number: 7190707
    Abstract: A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery pat from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable bean redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path.
    Type: Grant
    Filed: December 17, 2003
    Date of Patent: March 13, 2007
    Assignee: Cymer, Inc.
    Inventors: Palash P. Das, Khurshid Ahmed, Gregory Francis, Holger Glatzel, Alexei Lukashev, Jeremy Tyler, R. Kyle Webb
  • Publication number: 20050174576
    Abstract: A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and acc
    Type: Application
    Filed: March 8, 2005
    Publication date: August 11, 2005
    Applicant: Cymer, Inc.
    Inventors: Rajasekhar Rao, John Melchior, Holger Glatzel
  • Publication number: 20050068538
    Abstract: A spectral analysis module, including a wavemeter, for a high repetition rate gas discharge laser having a laser output beam comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a primary beam-splitter in the path of the laser output laser of the gas discharge laser operative to pass the vast majority of the output beam and to reflect a first small portion of the output beam, the primary beam splitter oriented at an angle to sufficiently reduce the fluence on the primary beam-splitter, and creating overlapping fresnel reflections in the first small portion of the laser output beam; a secondary beam splitter made from a material having a damage threshold sufficiently high to tolerate the fluence created by the overlapping portion
    Type: Application
    Filed: September 30, 2003
    Publication date: March 31, 2005
    Inventors: Rajasekhar Rao, John Melchior, Holger Glatzel
  • Publication number: 20050046856
    Abstract: A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser beam comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and acc
    Type: Application
    Filed: September 30, 2003
    Publication date: March 3, 2005
    Inventors: Rajasekhar Rao, John Melchior, Holger Glatzel
  • Publication number: 20040179560
    Abstract: A beam delivery unit and method of delivering a laser beam from a lasr light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery path from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path.
    Type: Application
    Filed: December 17, 2003
    Publication date: September 16, 2004
    Inventors: Palash P. Das, Khurshid Ahmed, Gregory Francis, Holger Glatzel, Alexei Lukashev, Jeremy Tyler, R. Kyle Webb