Patents by Inventor Holger Hasse

Holger Hasse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment mark for coarse alignment and fine alignment of a semiconductor wafer in an exposure tool
    Patent number: 7245351
    Abstract: An alignment mark for the coarse alignment and fine alignment of a semiconductor wafer in an exposure tool includes a first partial structure for generating a first reflection pattern in the exposure tool for the fine alignment of the semiconductor wafer, and a second partial structure for generating a second reflection pattern in the exposure tool for the coarse alignment of the semiconductor wafer. The first partial structure has a plurality of first structure elements, which are arranged relatively parallel and in a manner lying next to one another with a predetermined distance between midpoints symmetrically around the center of an inner region. The second partial structure has a plurality of second structure elements, formed in a manner corresponding to a pattern stored in the exposure tool and being arranged in the inner region.
    Type: Grant
    Filed: September 29, 2004
    Date of Patent: July 17, 2007
    Assignee: Infineon Technologies, AG
    Inventors: Diana Mattiza, Heiko Hommen, Holger Hasse
  • Alignment mark for coarse alignment and fine alignment of a semiconductor wafer in an exposure tool
    Publication number: 20050068508
    Abstract: An alignment mark for the coarse alignment and fine alignment of a semiconductor wafer in an exposure tool includes a first partial structure for generating a first reflection pattern in the exposure tool for the fine alignment of the semiconductor wafer, and a second partial structure for generating a second reflection pattern in the exposure tool for the coarse alignment of the semiconductor wafer. The first partial structure has a plurality of first structure elements, which are arranged relatively parallel and in a manner lying next to one another with a predetermined distance between midpoints symmetrically around the center of an inner region. The second partial structure has a plurality of second structure elements, formed in a manner corresponding to a pattern stored in the exposure tool and being arranged in the inner region.
    Type: Application
    Filed: September 29, 2004
    Publication date: March 31, 2005
    Inventors: Diana Mattiza, Heiko Hommen, Holger Hasse