Patents by Inventor Holger Kohr

Holger Kohr has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240128050
    Abstract: A method of automated data acquisition for a transmission electron microscope, the method comprising: obtaining a reference image of a sample at a first magnification; for each of a first plurality of target locations identified in the reference image: steering an electron beam of the transmission electron microscope to the target location, obtaining a calibration image of the sample at a second magnification greater than the first magnification, and using image processing techniques to identify an apparent shift between an expected position of the target location in the calibration image and an observed position of the target location in the calibration image, training a non-linear model using the first plurality of target locations and the corresponding apparent shifts; based on the non-linear model, calculating a calibrated target location for a next target location; steering the electron beam to the calibrated target location and obtaining an image at a third magnification greater than the first magnifica
    Type: Application
    Filed: September 28, 2023
    Publication date: April 18, 2024
    Applicant: FEI Company
    Inventors: Yuchen DENG, Holger KOHR, Bart VAN KNIPPENBERG, Peter TIEMEIJER, Lingbo YU
  • Publication number: 20240071051
    Abstract: Disclosed herein are CPM support systems, as well as related methods, computing devices, and computer-readable media. For example, in some embodiments, a method may comprise determining, based on selection data indicating selections of areas of microscopy imaging data, training data for a machine-learning model. The method may comprise training, based on the training data, the machine-learning model to automatically determine one or more areas of microscopy imaging data for performing at least one operation, such as high resolution data acquisition and data analysis. The method may comprise causing a computing device to be configured to use the machine-learning model to automatically determine areas of microscopy imaging data for the at least one operation.
    Type: Application
    Filed: August 31, 2022
    Publication date: February 29, 2024
    Inventors: John Francis Flanagan, IV, Holger Kohr, Yuchen Deng, Fanis Grollios
  • Patent number: 11906450
    Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
    Type: Grant
    Filed: August 31, 2022
    Date of Patent: February 20, 2024
    Assignee: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr
  • Patent number: 11887809
    Abstract: Computer-implemented methods for controlling a charged particle microscopy system include estimating a drift of a stage of the charged particle microscopy system based on an image sequence, and automatically adjusting a stage settling wait duration based on the drift estimate. Charged particle microscopy systems include an imaging system, a movement stage, and a processor and memory configured with computer-executable instructions that, when executed, cause the processor to estimate a stage settling duration of the movement stage based on an image sequence obtained with the imaging system, and automatically adjust a stage settling wait duration for the movement stage based on the stage settling duration.
    Type: Grant
    Filed: January 24, 2022
    Date of Patent: January 30, 2024
    Assignee: FEI Company
    Inventors: Yuchen Deng, Erik Franken, Bart van Knippenberg, Holger Kohr
  • Publication number: 20230245291
    Abstract: Various approaches are provided for automatically focusing particle beams for SPA. In one example, a method includes determining a focus adjustment for a region of a sample to achieve a targeted defocus based on at least one defocus measurement from at least one neighboring region of the sample, and causing an acquisition of an image of the sample at the region with the focus adjustment. In this way, a targeted defocus may be achieved across regions of a sample with reduced auxiliary imaging, thereby providing increased and uniform image quality while reducing the time and thus increasing the throughput of processing.
    Type: Application
    Filed: January 28, 2022
    Publication date: August 3, 2023
    Applicant: FEI Company
    Inventors: Yuchen Deng, Erik Franken, Bart van Knippenberg, Holger Kohr
  • Publication number: 20230238207
    Abstract: Computer-implemented methods for controlling a charged particle microscopy system include estimating a drift of a stage of the charged particle microscopy system based on an image sequence, and automatically adjusting a stage settling wait duration based on the drift estimate. Charged particle microscopy systems include an imaging system, a movement stage, and a processor and memory configured with computer-executable instructions that, when executed, cause the processor to estimate a stage settling duration of the movement stage based on an image sequence obtained with the imaging system, and automatically adjust a stage settling wait duration for the movement stage based on the stage settling duration.
    Type: Application
    Filed: January 24, 2022
    Publication date: July 27, 2023
    Applicant: FEI Company
    Inventors: Yuchen Deng, Erik Franken, Bart van Knippenberg, Holger Kohr
  • Publication number: 20230003672
    Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
    Type: Application
    Filed: August 31, 2022
    Publication date: January 5, 2023
    Applicant: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr
  • Publication number: 20220414855
    Abstract: Disclosed herein are apparatuses, systems, methods, and computer-readable media relating to area selection in charged particle microscope (CPM) imaging. For example, in some embodiments, a CPM support apparatus may include: first logic to generate a first data set associated with an area of a specimen by processing data from a first imaging round of the area by a CPM; second logic to generate predicted parameters of the area; and third logic to determine whether a second imaging round of the area is to be performed by the CPM based on the predicted parameters of the area; wherein the first logic is to, in response to a determination by the third logic that a second imaging round of the area is to be performed, generate a second data set, including measured parameters, associated with the area by processing data from a second imaging round of the area by the CPM.
    Type: Application
    Filed: June 25, 2021
    Publication date: December 29, 2022
    Applicant: FEI Company
    Inventors: Yuchen DENG, Holger KOHR, Maurice PEEMEN
  • Publication number: 20220373481
    Abstract: Tomographic images are obtained by processing a tilt series of 2D images by aligning and combining images withing a group of neighbor images. The tilt series generally includes sparsely sampled images. Images of the tilt series at tilt angles associated with the sparsely sample images are selected as reference frames, grouped with neighbor images, and the group of images aligned. The aligned images are combined to produce replacement frames and a replacement frame tilt series that can be used for tomographic reconstruction.
    Type: Application
    Filed: May 24, 2021
    Publication date: November 24, 2022
    Applicant: FEI Company
    Inventors: Maurice Peemen, Holger Kohr, Pavel Potocek
  • Patent number: 11460419
    Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
    Type: Grant
    Filed: March 30, 2020
    Date of Patent: October 4, 2022
    Assignee: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr
  • Patent number: 11404241
    Abstract: Methods for using a single electron microscope system for investigating a sample with TEM and STEM techniques include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam that is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the STEM beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image and a STEM image.
    Type: Grant
    Filed: March 30, 2020
    Date of Patent: August 2, 2022
    Assignee: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr
  • Publication number: 20210305012
    Abstract: Methods for using a single electron microscope system for investigating a sample with TEM and STEM techniques include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam that is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the STEM beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image and a STEM image.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr
  • Publication number: 20210305007
    Abstract: Methods and systems for investigating a sample using a dual beam bifocal charged particle microscope, according to the present disclosure include emitting a plurality of charged particles toward the sample, forming the plurality of charged particles into a first charged particle beam and a second charged particle beam, and modifying the focal properties of at least one of the first charged particle beam and the second charged particle beam. The focal properties of at least one of the first charged particle beam and the second charged particle beam is modified such that the corresponding focal planes of the first charged particle beam and the second charged particle beam are different.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr, Ali Mohammadi-Gheidari
  • Publication number: 20210302333
    Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr
  • Patent number: 10937625
    Abstract: The invention relates to a method of imaging a sample, said sample mounted on a sample holder in an electron microscope, the electron microscope comprising an electron source for generating a beam of energetic electrons along an optical axis and optical elements for focusing and deflecting the beam so as to irradiate the sample with a beam of electrons. The sample holder is capable of positioning and tilting the sample with respect to the electron beam. The method comprises the step of acquiring a tilt series of images by irradiating the sample with the beam of electrons, and concurrently changing a position of the sample during acquisition of the images, so that each image is acquired at an associated unique tilt angle and an associated unique position.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: March 2, 2021
    Assignee: FEI Company
    Inventors: Erik Michiel Franken, Remco Schoenmakers, Bart Jozef Janssen, Martin Verheijen, Holger Kohr, Yuchen Deng, Andreas Voigt
  • Patent number: 10923308
    Abstract: Various methods and systems are provided for generating an energy resolved chroma image of a sample. Upon irradiated by a charged particle beam, scattered charged particles from the sample are directed to form a first image before entering a spectrometer. The scattered charged particles are then dispersed based on their energy when passing through the spectrometer. The dispersed particles form a second image on a detector. The scattered particles at each location of the first image is spread along a corresponding energy spread vector in the second image.
    Type: Grant
    Filed: November 7, 2019
    Date of Patent: February 16, 2021
    Assignee: FEI Company
    Inventors: Yuchen Deng, Peter Christiaan Tiemeijer, Holger Kohr, Jaydeep Sanjay Belapure
  • Publication number: 20200168433
    Abstract: The invention relates to a method of imaging a sample, said sample mounted on a sample holder in an electron microscope, the electron microscope comprising an electron source for generating a beam of energetic electrons along an optical axis and optical elements for focusing and deflecting the beam so as to irradiate the sample with a beam of electrons. The sample holder is capable of positioning and tilting the sample with respect to the electron beam. The method comprises the step of acquiring a tilt series of images by irradiating the sample with the beam of electrons, and concurrently changing a position of the sample during acquisition of the images, so that each image is acquired at an associated unique tilt angle and an associated unique position.
    Type: Application
    Filed: November 21, 2019
    Publication date: May 28, 2020
    Applicant: FEI Company
    Inventors: Erik Michiel Franken, Remco Schoenmakers, Bart Jozef Janssen, Martin Verheijen, Holger Kohr, Yuchen Deng, Andreas Voigt