Patents by Inventor Holger Letsch

Holger Letsch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Microstructure with reactive bonding
    Patent number: 8299630
    Abstract: A microstructure has at least one bonding substrate and a reactive multilayer system. The reactive multilayer system has at least one surface layer of the bonding substrate with vertically oriented nanostructures spaced apart from one another. Regions between the nanostructures are filled with at least one material constituting a reaction partner with respect to the material of the nanostructures. A method for producing at least one bonding substrate and a reactive multilayer system, includes, for forming the reactive multilayer system, at least one surface layer of the bonding substrate is patterned or deposited in patterned fashion with the formation of vertically oriented nanostructures spaced apart from one another, and regions between the nanostructures are filled with at least one material constituting a reaction partner with respect to the material of the nanostructures.
    Type: Grant
    Filed: January 26, 2010
    Date of Patent: October 30, 2012
    Assignees: Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung E.V., Technische Universitaet Chemnitz
    Inventors: Joerg Braeuer, Thomas Gessner, Lutz Hofmann, Joerg Froemel, Maik Wiemer, Holger Letsch, Mario Baum
  • MICROSTRUCTURE, METHOD FOR PRODUCING THE SAME, DEVICE FOR BONDING A MICROSTRUCTURE AND MICROSYSTEM
    Publication number: 20110284975
    Abstract: A microstructure has at least one bonding substrate and a reactive multilayer system. The reactive multilayer system has at least one surface layer of the bonding substrate with vertically oriented nanostructures spaced apart from one another. Regions between the nanostructures are filled with at least one material constituting a reaction partner with respect to the material of the nanostructures. A method for producing at least one bonding substrate and a reactive multilayer system, includes, for forming the reactive multilayer system, at least one surface layer of the bonding substrate is patterned or deposited in patterned fashion with the formation of vertically oriented nanostructures spaced apart from one another, and regions between the nanostructures are filled with at least one material constituting a reaction partner with respect to the material of the nanostructures.
    Type: Application
    Filed: January 26, 2010
    Publication date: November 24, 2011
    Applicants: Fraunhofer Gesellschaft zur Foerderung der Angewan, TECHNISCHE UNIVERSITAET CHEMNITZ
    Inventors: Joerg Braeuer, Thomas Gessner, Lutz Hofmann, Joerg Froemel, Maik Wiemer, Holger Letsch, Mario Baum