Abstract: A steering device which includes coded microstructures which are provided on the steering shaft and/or on a device that is connected to the steering shaft in a non-positive manner; a sensor which detects the microstructures and outputs associated measuring signals; and an electronic circuit to which the measuring signals of the sensor are fed, and which outputs electronic signals to control the steering is disclosed.

Abstract: The present invention relates to a force measuring device comprising an amorphous carbon layer which is disposed on a solid actuator and has piezoresistive properties.

Abstract: A steering device which includes coded microstructures which are provided on the steering shaft and/or on a device that is connected to the steering shaft in a non-positive manner; a sensor which detects the microstructures and outputs associated measuring signals; and an electronic circuit to which the measuring signals of the sensor are fed, and which outputs electronic signals to control the steering is disclosed.

Abstract: The invention relates to a force measuring assembly for processing pressure signals in electronic, especially electromechanical, brake systems, particularly for motor vehicles comprising at least one force sensor subassembly and at least one signal processing device per wheel brake. At least one force sensor subassembly encompasses a brake actuator (2, 3) that is in non-positive connection with at least one pressure component (1) which is provided at least in part with an amorphous piezoresistive diamond-like carbon layer (4) forming a force sensor.

Abstract: The invention relates to a control device for non-positive connections, especially screw connections. The device includes two force application elements and a measuring element arranged therebetween. The measuring element is at least partially provided with a layer having a force sensory effect. The surface of the layer is provided with elevations for receiving a force applied by the force application elements.

Abstract: The present invention relates to a sensor for measuring actual loads acting upon a surface of a mechanical component, wherein as a sensor an amorphous hydrocarbon layer with piezoresistive properties is used, which is preferably doped with at least one metallic and/or non-metallic element and is connected by contacts to a measuring device; the present invention further relates to the use of carbon layers having piezoresistive properties and preferably doped with metallic and/or non-metallic elements as a sensor for load measurements, as well as to a method of measuring actual loads at stressed surfaces of mechanical components, wherein as a measuring sensor an amorphous carbon layer preferably doped with metallic and/or non-metallic elements is used.

Abstract: A method and apparatus for determining the wear resistance of the surface of a sample object includes an abrasive grinding belt, run between the sample object and a counter-body, with the grinding belt being pressed against the sample object with a predetermined force by the counter-body. The position of the counter-body is determined at, at least, a first position and a second position, each occurring at two different points in time. The wear resistance of the surface of the sample object is determined from the difference in determined positions.

Abstract: The invention relates to a control device for non-positive connections, especially screw connections. The device includes two force application elements and a measuring element arranged therebetween. The measuring element is at least partially provided with a layer having a force sensory effect. The surface of the layer is provided with elevations for receiving a force applied by the force application elements.

Abstract: A method and apparatus for determining the wear resistance of the surface of a sample object includes an abrasive grinding belt, run between the sample object and a counter-body, with the grinding belt being pressed against the sample object with a predetermined force by the counter-body. The position of the counter-body is determined at, at least, a first position and a second position, each occurring at two different points in time. The wear resistance of the surface of the sample object is determined from the difference in determined positions.

Abstract: The present invention relates to a sensor for measuring actual loads acting upon a surface of a mechanical component, wherein as a sensor an amorphous hydrocarbon layer with piezoresistive properties is used, which is preferably doped with at least one metallic and/or non-metallic element and is connected by contacts to a measuring device; the present invention further relates to the use of carbon layers having piezoresistive properties and preferably doped with metallic and/or non-metallic elements as a sensor for load measurements, as well as to a method of measuring actual loads at stressed surfaces of mechanical components, wherein as a measuring sensor an amorphous carbon layer preferably doped with metallic and/or non-metallic elements is used.

Abstract: An applicator device for applying photoresist to a surface of a base body having a receiving device therefor, including a photoresist feeder movable relative to the base body, the feeder being a point source device, and a device for performing a defined movement of the base body, comprising a conically shaped tip formed on the point source device for applying photoresist in a defined spot.

Abstract: An applicator device for applying photoresist to a surface of a base body having a receiving device therefor, including a photoresist feeder movable relative to the base body, the feeder being a point source device, and a device for performing a defined movement of the base body, comprising a conically shaped tip formed on the point source device for applying photoresist in a defined spot.

Abstract: Process for producing wear-resistant layers of cubic boron nitride or wear-resistant layers containing cubic boron nitride by sputtering with RF or DC voltage in the operating mode of an unbalanced magnetron, in which the plasma is generated by DC arc discharges or DC operated magnetron cathodes. The initial target for the production of the layer from which the material is removed comprises electrically conductive material containing boron, preferably boron carbide, and, in the process, the reactive process is conducted with the addition of N.sub.2 and Ar in such a way that the necessary stoichiometric ratio BiN in the layer can be adjusted.

Abstract: The invention relates to a method of manufacturing a mask support (diaphragm) of SiC for radiation lithography masks, in which an SiC layer is deposited at least on one of the two major surfaces of a substrate in the form of a silicon single crystal wafer and the silicon single crystal wafer is removed except at an edge region by means of a selective etching step, the mask support being annealed before or after the selective etching step in an oxidizing atmosphere at a temperature in the range of 200.degree. to 1350.degree. C. for a duration of 2 to 10 h.

Abstract: A method is set forth of manufacturing a mask for radiation lithography having a mask support and a substrate, on which an absorber layer is provided to be structured according to a desired mask pattern. The absorber layer having a thickness preferably in the range of from 0.2 to 1.2 .mu.m of partly oxidized tungsten having an oxygen content in the range of from 21 to 29 at. % in the layer is deposited on the substrate, preferably by means of cathode sputtering.

Abstract: A mask for X-ray lithography is formed of a multilayer diaphragm with a patterned absorber layer on the diaphragm. The diaphragm includes a layer of magnesium and at least one intermediate layer.

Abstract: In a mask for X-ray lithography, in which a pattern of a layer corresponding to the structure to be manufactured and consisting of a material opaque to visible light is applied to a thin diaphragm of a material transparent to X-ray radiation, an adjustment with visible radiation, such as laser light, is made possible using a diaphragm consisting of a material opaque to visible light and using adjustment windows of a material transparent to the visible light of the spectrum through the diaphragm.

Abstract: The manufacture of semiconductor systems by means of radiation lithography requires low-stress masks when it is important to achieve very fine structures. In accordance with the invention, such a mask comprises a carrier of boron-doped silicon, a radiation absorbing pattern consisting of a double layer of different metals, such as molybdenum and tungsten, or a double layer of layers of the same metal, such as molybdenum, which are deposited in a different manner.

Abstract: A magnetic field sensor including a substrate supporting a magnetic layer having an easy axis of magnetization is manufactured by depositing the magnetic layer on the substrate in the absence of a magnetic orienting field, producing a structure in the layer in the form of a plurality of parallel equally large strips having an area of approximately 1/4 to 1/30 of the overall area of the magnetic layer, and subsequently subjecting the layer to a tempering process in a magnetic orienting field.

Abstract: A thin-layer magnetic field sensor in which a thin magnetic layer which is magnetized in a preferred direction is surrounded by a magnetic HF measuring coil with variable inductance and in which an external magnetic field and the coil axis are aligned so as to be parallel to one of the preferred directions. The sensor comprises a sequence of geometrically structured layers arranged on a substrate, i.e. a structurized metal electrically conducting layer, a dielectric layer, a magnetic layer magnetized in a preferred direction, a further dielectric layer and a further structurized metal electrically conducting layer which forms with the first electrically conducting layer a coil which surrounds the magnetic layer.