Patents by Inventor Holger Möench

Holger Möench has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10159113
    Abstract: The invention describes a heating system (100) and a corresponding method of heating a heating surface (180) of an object (150, 950) to a processing temperature of at least 100° C., wherein the heating system (100) comprises semiconductor light sources (115), and wherein the heating system (100) is adapted to heat an area element of the heating surface (180) with at least 50 semiconductor light sources (115) at the same time. The heating system (100) may be part of a reactor for processing semiconductor structures. The light emitted by means of the semiconductor light sources (115) overlaps at the heating surface (180). Differences of the characteristic of one single semiconductor light source (115) may be blurred at the heating surface (180) such that a homogeneous temperature distribution across a processing surface of a, for example, wafer may be enabled.
    Type: Grant
    Filed: January 9, 2015
    Date of Patent: December 18, 2018
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Holger Möench, Guenther Hans Derra, Stephan Gronenborn, Pavel Pekarski, Johanna Sophie Kolb, Ralf Gordon Conrads
  • Publication number: 20160381732
    Abstract: The invention describes a heating system (100) and a corresponding method of heating a heating surface (180) of an object (150, 950) to a processing temperature of at least 100° C., wherein the heating system (100) comprises semiconductor light sources (115), and wherein the heating system (100) is adapted to heat an area element of the heating surface (180) with at least 50 semiconductor light sources (115) at the same time. The heating system (100) may be part of a reactor for processing semiconductor structures. The light emitted by means of the semiconductor light sources (115) overlaps at the heating surface (180). Differences of the characteristic of one single semiconductor light source (115) may be blurred at the heating surface (180) such that a homogeneous temperature distribution across a processing surface of a, for example, wafer may be enabled.
    Type: Application
    Filed: January 9, 2015
    Publication date: December 29, 2016
    Applicant: Koninklijke Philips N.V.
    Inventors: HOLGER MÖENCH, GUENTHER HANS DERRA, STEPHAN GRONENBORN, PAVEL PEKARSKI, JOHANNA SOPHIE KOLB, RALF GORDON CONRADS
  • Publication number: 20160311230
    Abstract: The invention describes a laser printing system (100) for illuminating an object moving relative to a laser module of the laser printing system (100) in a working plane (180) and a corresponding method of laser printing. The laser module comprises at least two laser arrays (110) of semiconductor lasers (115) and at least one optical element (170). The optical element (170) is adapted to image laser light emitted by the laser arrays (110), such that laser light of semiconductor lasers (115) of one laser array (110) is imaged to one pixel in a working plane (180) of the laser printing system (100) and an area element of the pixel is illuminated by means of at least two semiconductor lasers (115). The optical element does not project or focus laser light of each single semiconductor laser (115) to the working plane (180) but images the whole laser arrays to the working plane.
    Type: Application
    Filed: December 16, 2014
    Publication date: October 27, 2016
    Inventors: RALF GORDON CONRADS, STEPHAN GRONENBORN, GERO HEUSLER, HOLGER MÖENCH
  • Publication number: 20060202598
    Abstract: The invention relates to a high-pressure discharge lamp, which emits light at least in a defined wavelength range with a defined emission spectrum, having at least one burner (2), which comprises a discharge chamber (21), wherein at least the outer contour of the burner (2) has an elliptical shape in the area of the discharge chamber (21), two electrodes (41, 42) extending into the discharge chamber (21) which are arranged opposite one another and on the longest axis of symmetry of the discharge chamber (21), and a multilayer interference filter (3), which is arranged at least on th outer contour of the burner (2) in the area of the discharge chamber (21), wherein at least a portion of the light from the defined wavelength range may pass through the interference filter (3) and another portion of the light from the defined wavelength range may be reflected into the space between the two electrodes (41, 42).
    Type: Application
    Filed: July 12, 2004
    Publication date: September 14, 2006
    Applicant: Koninklijke Philips Electronics N.V.
    Inventors: Holger Möench, Arnd Ritz