Patents by Inventor Homgqing Shan

Homgqing Shan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Double slit-valve doors for plasma processing
    Patent number: 7147719
    Abstract: In a substrate vacuum processing chamber, a second inner slit passage door apparatus and method to supplement the normal slit valve and its door at the outside of the chamber. The inner slit passage door, blocks the slit passage at or adjacent the substrate processing location in a vacuum processing chamber to prevent process byproducts from depositing on the inner surfaces of the slit passage beyond the slit passage door and improves the uniformity of plasma in the processing chamber by eliminating a large cavity adjacent to the substrate processing location into which the plasma would otherwise expand.
    Type: Grant
    Filed: June 23, 2003
    Date of Patent: December 12, 2006
    Assignee: Applied Materials, Inc.
    Inventors: Michael D. Welch, Homgqing Shan, Paul E. Luscher, Evans Y. Lee, James D. Carducci, Siamak Salimian
  • Double slit-valve doors for plasma processing
    Publication number: 20040083978
    Abstract: In a substrate vacuum processing chamber, a second inner slit passage door apparatus and method to supplement the normal slit valve and its door at the outside of the chamber. The inner slit passage door, blocks the slit passage at or adjacent the substrate processing location in a vacuum processing chamber to prevent process byproducts from depositing on the inner surfaces of the slit passage beyond the slit passage door and improves the uniformity of plasma in the processing chamber by eliminating a large cavity adjacent to the substrate processing location into which the plasma would otherwise expand.
    Type: Application
    Filed: June 23, 2003
    Publication date: May 6, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Michael D. Welch, Homgqing Shan, Paul E. Luscher, Evans Y Lee, James D. Carducci, Siamak Salimian
  • Double slit-valve doors for plasma processing
    Patent number: 6647918
    Abstract: In a substrate vacuum processing chamber, a second inner slit passage door apparatus and method to supplement the normal slit valve and its door at the outside of the chamber. The inner slit passage door, blocks the slit passage at or adjacent the substrate processing location in a vacuum processing chamber to prevent process byproducts from depositing on the inner surfaces of the slit passage beyond the slit passage door and improves the uniformity of plasma in the processing chamber by eliminating a large cavity adjacent to the substrate processing location into which the plasma would otherwise expand.
    Type: Grant
    Filed: November 13, 2000
    Date of Patent: November 18, 2003
    Assignee: Applied Materials, Inc
    Inventors: Michael D. Welch, Homgqing Shan, Paul E. Luscher, Evans Y. Lee, James D. Carducci, Siamak Salimian
  • Double slit-valve doors for plasma processing
    Patent number: 6192827
    Abstract: In a substrate vacuum processing chamber, a second inner slit passage door apparatus and method to supplement the normal slit valve and its door at the outside of the chamber. The inner slit passage door, blocks the slit passage at or adjacent the substrate processing location in a vacuum processing chamber to prevent process byproducts from depositing on the inner surfaces of the slit passage beyond the slit passage door and improves the uniformity of plasma in the processing chamber by eliminating a large cavity adjacent to the substrate processing location into which the plasma would otherwise expand.
    Type: Grant
    Filed: July 3, 1998
    Date of Patent: February 27, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Michael D. Welch, Homgqing Shan, Paul E. Luscher, Evans Y. Lee, James D. Carducci, Siamak Salimian