Abstract: A package comprising an integrated device and a substrate. The integrated device is coupled to the substrate. The substrate includes a core layer, at least one first dielectric layer coupled to a first surface of the core layer, and at least one second dielectric layer coupled to a second surface of the core layer. The substrate includes a match structure located in the core layer. The match structure includes at least one first match interconnect extending vertically and horizontally in the match structure. The match structure also includes at least one second match interconnect extending vertically in the match structure. The at least one first match interconnect and the at least one second match interconnect are configured for skew matching.

Abstract: Some features pertain to a hybrid package that includes a die, a first substrate structure, and a first metallization structure that is at least partially coplanar with the substrate. The die is electrically coupled to the first metallization structure and the first substrate through a second metallization structure. The first metallization structure is configured to provide an electrical path for data signaling. The second metallization structure is configured as a ground plane and is coupled to a ground signal. The first substrate structure is configured to provide an electrical path for power signaling.

Abstract: A package comprising a substrate and an integrated device coupled to the substrate. The substrate includes a first dielectric layer, a second dielectric layer, a third dielectric layer, and a plurality of interconnects located in the first dielectric layer, the second dielectric layer and the third dielectric layer. The second dielectric layer is located between the first dielectric layer and the third dielectric layer. The second dielectric layer includes a different material than the first dielectric layer and the third dielectric layer.

Abstract: A package comprising a substrate, a first integrated device coupled to a first surface of the substrate, and a second integrated device coupled to the first surface of the substrate; wherein a back side of the second integrated device is coupled to a back side of the first integrated device through an adhesive. The substrate includes at least one dielectric layer and a plurality of interconnects. The substrate includes a flexible portion that is configured to be bend such that the back side of the first integrated device faces the back side of the second integrated device in the package.

Abstract: A package comprising a first substrate, a first integrated device coupled to the first substrate, a second substrate coupled to the first substrate through a first plurality of solder interconnects such that the first integrated device is located between the first substrate and the second substrate, wherein the second substrate includes a first surface and a second surface, an electrical device coupled to a second surface of the second substrate such that the electrical device is located between the first substrate and the second substrate, and an encapsulation layer coupled to the first substrate and the second substrate. The encapsulation layer is located between the first substrate and the second substrate. The encapsulation layer encapsulates the first integrated device and the electrical device.

Abstract: A package comprising a first integrated device, a first metallization portion coupled to the first integrated device, a second integrated device, a second metallization portion coupled to the second integrated device and the first metallization portion, and an encapsulation layer coupled to the first metallization portion, the second integrated device and the second metallization portion. The first metallization portion includes at least one first dielectric layer and a first plurality of metallization interconnects. The second metallization portion includes at least one second dielectric layer and a second plurality of metallization interconnects.

Abstract: Deep trench capacitors (DTCs) employing bypass metal trace signal routing supporting signal bypass routing, and related integrated circuit (IC) packages and fabrication methods are disclosed. The DTC includes an outer metallization layer (e.g., a redistribution layer (RDL)) to provide an external interface to the DTC. In exemplary aspects, to make available signal routes that can extend through a DTC, an outer metallization layer of the DTC includes additional metal interconnects. These additional metal interconnects are not coupled the capacitors in the DTC. These additional metal interconnects are interconnected to each other by metal traces (e.g., metal lines) in the outer metallization layer of the DTC to provide bypass signal routes through the DTC. This is opposed to signal paths in a package substrate in which the DTC is coupled or embedded having to be routed around the DTC in the package substrate.

Abstract: Integrated circuit (IC) packages employing wire bond channel over package substrate, and related fabrication methods. The IC package includes a first semiconductor die (“first die”) and a first electronic device each coupled to a package substrate. To provide signal routing paths between the first die and the first electronic device, the IC package includes a wire bond channel that includes wire bonds coupled between first and second metal pads coupled to the respective first die and first electronic device to provide signal routing paths between the first die and first electronic device. The wire bonds extend outside of the package substrate in a vertical direction. The wire bond channel may be able to support more direct signal routing paths between the first die and the first electronic device without having to route such signal routing paths around a KoZ in the package substrate.

Abstract: Terminal connection routing on top of a substrate surface connects to component terminals to and from PMIC devices and provides a novel structure to connect surface mount technology (SMT) passive device terminals on an SMT layer (such as a Cu bar mesh) that uses the 3D space available near to components to lower resistance/lower inductive path and provides a shorter path, SIP form factor reduction, a component placement density increase, creates an additional PDN layer for connectivity and, if the routing is encapsulated in a mold, protects the metal in the connection from oxidation. Methods are presented for providing a substrate, attaching a first device to a first surface of the substrate near a center of the substrate, attaching a second device to the first surface of the substrate near an edge of the substrate, and connecting a connection located on the first surface of the substrate between the first device and the second device.

Abstract: A package comprising a substrate and an integrated device coupled to the substrate. The substrate comprises at least one dielectric layer; a plurality of interconnects comprising plurality of pad-on-pad interconnects, wherein the plurality of pad-on-pad interconnects is embedded through a first surface of the substrate. The plurality of pad-on-pad interconnects includes a first pad-on-pad interconnect comprising a first pad and a second pad coupled to the first pad. The package further comprising a solder resist layer located over the first surface of the substrate. The solder resist layer comprises a first solder resist layer portion comprising a first thickness; and a second solder resist layer portion comprising a second thickness that is less than the first thickness. The second solder resist layer portion is located between the at least one dielectric layer and the integrated device.

Abstract: A semiconductor device includes a die having one or more trenches on a back side of the die. The semiconductor device also includes a layer of thermally conductive material deposited on the back side of the die to fill the one or more trenches to form one or more plated trenches. The size (e.g., surface area or thickness (Z-height)) or location of the plated trenches may be determined based on one or more heat generating elements such as logic devices (CPU or GPU, for example) on an active side of the die. The thermally conductive material, which may be a metal such as copper (Cu) or silver (Ag), has a heat dissipation coefficient that is greater than a heat dissipation coefficient of a substrate of the die.

Abstract: Multi-sided antenna modules employing antennas on multiple sides of a package substrate for enhanced antenna coverage, and related antenna module fabrication methods. The multi-sided antenna module includes an integrated circuit (IC) die(s) disposed on a first side of the package substrate. The multi-sided antenna module further includes first and second substrate antenna layers disposed on respective first and second sides of the package substrate. The first substrate antenna layer includes a first antenna(s) disposed on the first side of the package substrate adjacent to the IC die(s). The second substrate antenna layer includes a second antenna(s) disposed on the second side of the package substrate opposite of the first side of the package substrate. In this manner, the multi-sided antenna module, including antennas on multiple sides of the package substrate, provides antenna coverage that extends from both sides of the package substrate to provide multiple directions of coverage.

Abstract: A device comprising a first substrate comprising a first plurality of pillar interconnects; a second substrate comprising a second plurality of pillar interconnects, wherein the second plurality of pillar interconnects is coupled to the first plurality of pillar interconnects through a plurality of solder interconnects; a passive component located between the first substrate and the second substrate; and an integrated device coupled to the first substrate.

Abstract: Integrated circuit (IC) packages employing a package substrate with a double side embedded trace substrate (ETS), and related fabrication methods. To facilitate providing a reduced thickness substrate in the IC package to reduce overall height of the IC package while supporting higher density input/output (I/O) connections, a package substrate in the IC package includes a double side ETS. A double side ETS includes two (2) adjacent ETS metallization layers that both include metal traces embedded in an insulating layer. The embedded metal traces in the ETS metallization layers of the double side ETS can be electrically coupled to each other through vertical interconnect accesses (vias) (e.g., metal pillars, metal posts) to provide signal routing paths between embedded metal traces in the ETS metallization layers.

Abstract: Examples herein include die to metallization structure connections that eliminate the solder joint to reduce the resistance and noise on the connection. In one example, a first die is attached to a metallization layer by a plurality of copper interconnections and a second is attached to the metallization layer opposite the first die through another plurality of copper interconnections. In this example, the copper interconnects may connect the respective die to a metallization structure in the metallization layer.

Abstract: A package comprising a substrate and an integrated device coupled to the substrate. The substrate includes at least one dielectric layer, a plurality of interconnects comprising a plurality of protruding pad interconnects, and a solder resist layer located over the at least one dielectric layer, the solder resist layer comprising a thickness that is greater than a thickness of the plurality of protruding pad interconnects. A protruding pad interconnect may include a first pad portion and a second pad portion.

Abstract: Package substrates employing a pad metallization layer for increased signal routing capacity, and related integrated circuit (IC) packages and fabrication methods. To support increased signal routing density in an IC package while mitigating an increase in overall IC package thickness, an outer metallization layer of the package substrate is provided as a thinner, pad metallization layer. A metal layer in the pad metallization layer includes metal pads for forming external connections to the package substrate. This allows an area in the adjacent metallization layer that would otherwise have larger width metal pads for forming external interconnects, to be used for other signal routing within the package substrate. This can increase the overall signal routing density of the package substrate while mitigating the increase in overall package substrate thickness if a full-sized additional metallization layer were added to the package substrate.

Abstract: A package that includes a substrate, a first integrated device coupled to the substrate, and a second integrated device coupled to the substrate. The substrate includes at least one dielectric layer, and a plurality of interconnects comprising a plurality of escape interconnects. The plurality of escape interconnects includes a first embedded escape interconnect, a second embedded escape interconnect, and a third escape interconnect located between the first embedded escape interconnect and the second embedded escape interconnect.

Abstract: An IC package includes a heat-generating device and an electrical device on a surface of a substrate, a mold compound disposed on the electrical device, and a thermal structure disposed on the heat-generating device, without the mold compound, to improve heat dissipation. In an example, the thermal structure includes a thermal interface material (TIM) layer and a heat sink. In the example, the TIM layer extends from the heat-generating device to a height equal to or less than the mold compound and the heat sink includes a planar exterior surface above the heat-generating device and the electrical device. In an example, a first heat sink portion of the heat sink on the heat-generating device may be a different thickness than a second heat sink portion of the heat sink on the electrical device. The thermal structure reduces a thermal resistance between the heat-generating device and the heat sink.

Abstract: A package comprising a substrate, a first integrated device and a second integrated device. The substrate includes at least one dielectric layer, a plurality of interconnects, a solder resist layer, and a plurality of periphery interconnects located over the solder resist layer. The first integrated device is coupled to the substrate. The second integrated device is coupled to the substrate. The second integrated device is configured to be electrically coupled to the first integrated device through the plurality of periphery interconnects.