Patents by Inventor Hong-Dar Chen

Hong-Dar Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8685262
    Abstract: A nozzle plate containing multiple micro-orifices for the cascade impactor and a method for manufacturing the same are disclosed. The nozzle plate is formed by a series of semiconductor processes, including lithography, etching and electroplating. The nozzle plate comprises a plate body and a plurality of micro-orifices formed on the plate body. The orifice has a diameter which gradually expands in the direction away from the bottom of the plate body to achieve a smooth inner surface, allowing particles to pass therethrough smoothly without being clogged in the nozzle plate.
    Type: Grant
    Filed: October 1, 2013
    Date of Patent: April 1, 2014
    Assignee: National Chiao Tung University
    Inventors: Chuen-Jinn Tsai, Sheng-Chieh Chen, Hong-Dar Chen
  • Publication number: 20140027406
    Abstract: A nozzle plate containing multiple micro-orifices for the cascade impactor and a method for manufacturing the same are disclosed. The nozzle plate is formed by a series of semiconductor processes, including lithography, etching and electroplating. The nozzle plate comprises a plate body and a plurality of micro-orifices formed on the plate body. The orifice has a diameter which gradually expands in the direction away from the bottom of the plate body to achieve a smooth inner surface, allowing particles to pass therethrough smoothly without being clogged in the nozzle plate.
    Type: Application
    Filed: October 1, 2013
    Publication date: January 30, 2014
    Applicant: National Chiao Tung University
    Inventors: Chuen-Jinn TSAI, Sheng-Chieh CHEN, Hong-Dar CHEN
  • Publication number: 20110209528
    Abstract: A nozzle plate containing multiple micro-orifices for the cascade impactor and a method for manufacturing the same are disclosed. The nozzle plate is formed by a series of semiconductor processes, including lithography, etching and electroplating. The nozzle plate comprises a plate body and a plurality of micro-orifices formed on the plate body. The orifice has a diameter which gradually expands in the direction away from the bottom of the plate body to achieve a smooth inner surface, allowing particles to pass therethrough smoothly without being clogged in the nozzle plate.
    Type: Application
    Filed: July 22, 2010
    Publication date: September 1, 2011
    Applicant: NATIONAL CHIAO TUNG UNIVERSITY
    Inventors: Chuen-Jinn Tsai, Sheng-Chieh Chen, Hong-Dar Chen