Patents by Inventor Hong Gu IM

Hong Gu IM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
    Publication number: 20230097135
    Abstract: An additive for a photoresist, a photoresist composition for a EUV including the same, and a method for manufacturing a semiconductor device using the same, the additive including a copolymer that includes a first repeating unit represented by the following Chemical Formula 1-1, and a second repeating unit represented by the following Chemical Formula 2, wherein a molar ratio of the first repeating unit to the second repeating unit is 7:3 to 2:8,
    Type: Application
    Filed: September 7, 2022
    Publication date: March 30, 2023
    Inventors: Jin Joo KIM, Ye Chan KIM, Ju-Young KIM, Ji Yup KIM, Hyun Woo KIM, Ju Hyeon PARK, Ji Cheol PARK, Hyun Ji SONG, Hong Gu IM, Suk Koo HONG