Patents by Inventor Hong Hie Lee

Hong Hie Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9086529
    Abstract: The present invention relates to an optical film comprising a substrate on which an array of structures is formed, wherein a material having a different refractive index, absorbancy or reflectivity from that of a surface of the structures is partially coated on the surface of the structures, and a manufacturing method thereof. Specifically, the optical film according to one embodiment of the present invention may have a different transparency depending on the direction or can transmit light asymmetrically. Further, the optical film may be applicable to image devices, which need to change brightness or images depending on the angle of view or to display three-dimensional images.
    Type: Grant
    Filed: January 17, 2012
    Date of Patent: July 21, 2015
    Assignee: SNU R&DB FOUNDATION
    Inventors: Kookheon Char, Hyunsik Yoon, Hong Hie Lee, Eun-Kyeong Bae
  • Publication number: 20140141342
    Abstract: The present invention relates to an electrolyte for a lithium secondary battery and a lithium secondary battery including the same, wherein the electrolyte comprises an organic solvent and an electrolyte additive, represented by chemical formula 1 and mixed lithium salts in the organic solvent so that room and high temperature life-time properties of the battery can be improved. Said chemical 1 is defined in the specification.
    Type: Application
    Filed: July 12, 2012
    Publication date: May 22, 2014
    Inventors: Hyeong Kyu Lim, Hong Hie Lee, Eun Gi Shim, Jong Su Kim, Chang Sin Lee, Kyung Il Park, Hahn Mok Song
  • Patent number: 7588710
    Abstract: A mold for use in forming a target patterning on a substrate by using a pattern formed at one side of the mold is made of amorphous fluorine resin. The mold is fabricated through a compression molding technique by using a master mold (104) with a pattern structure thereon facing the pattern.
    Type: Grant
    Filed: May 4, 2004
    Date of Patent: September 15, 2009
    Assignee: Minuta Technology Co., Ltd.
    Inventors: Hong Hie Lee, Dahl Young Khang
  • Patent number: 6818139
    Abstract: In a method for forming a micro-pattern on a substrate (200), polymer material having a solvent is coated on the substrate, thereby forming a polymer film on the substrate. Then, a mold (204) having a predetermined shape is compressed into the polymer film (202) on the substrate by employing a predetermined compression technique to entail a plastic deformation of the polymer film, thereby patterning the polymer film. This compression procedure is performed at a room temperature, e.g., of about 10 to about 30° C. In the present invention, before the mold (204) is pressed into the polymer film (202), a free volume in the polymer film is previously increased so that a pressure applied on the polymer material needed to plastically deform the polymer film is reduced. Thereafter, etching is performed on the substrate through the use of the patterned polymer film as an etching mask, thereby forming a micro-pattern on the substrate.
    Type: Grant
    Filed: October 15, 2001
    Date of Patent: November 16, 2004
    Assignee: Minuta Technology Co., Ltd.
    Inventors: Hong Hie Lee, Dahl Young Khang
  • Patent number: 6750073
    Abstract: A mask pattern is formed on a substrate by using a solvent absorbent mold having a pattern structure with a relief and an intaglio portion. A mask layer dissolved in a solvent to obtain fluidity is prepared on the substrate. The mold is pressed onto the mask layer with a predetermined pressure, and a portion of the mask layer that contacts with the relief portion of the mold is introduced into the intaglio portion thereof. Then, the mold absorbs the solvent contained in the mask layer to thereby solidify the mask layer. Next, the mold is separated from the substrate and the portion of the mask layer that contacts with the relief portion of the mold is removed, thus finally obtaining the desired minute mask pattern.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: June 15, 2004
    Assignee: Minuta Technology Co., Ltd.
    Inventors: Hong Hie Lee, Youn Sang Kim, Tae Wan Kim, Pil Jin Yoo
  • Publication number: 20040063334
    Abstract: A mask pattern is formed on a substrate by using a solvent absorbent mold having a pattern structure with a relief and an intaglio portion. A mask layer dissolved in a solvent to obtain fluidity is prepared on the substrate. The mold is pressed onto the mask layer with a predetermined pressure, and a portion of the mask layer that contacts with the relief portion of the mold is introduced into the intaglio portion thereof. Then, the mold absorbs the solvent contained in the mask layer to thereby solidify the mask layer. Next, the mold is separated from the substrate and the portion of the mask layer that contacts with the relief portion of the mold is removed, thus finally obtaining the desired minute mask pattern.
    Type: Application
    Filed: September 30, 2002
    Publication date: April 1, 2004
    Inventors: Hong Hie Lee, Youn Sang Kim, Tae Wan Kim, Pil Jin Yoo
  • Publication number: 20030062334
    Abstract: In a method for forming a micro-pattern on a substrate by employing a mold having a predetermined pattern structure, a mold having a predetermined pattern structure containing a recessed portion and a protruded portion is prepared. A polymer material is deposited on the substrate. Then the protruded portion of the mold is controlled to be in contact with the polymer material and the polymer material in contact with the protruded portion of the mold is incorporated into an empty space of the recessed portion thereof by using capillary force thereof, thereby removing the polymer material in contact with the protruded portion of the mold. Thereafter, a portion of the top surface of the substrate is exposed by detaching the mold to thereby form a polymer micro-pattern on the substrate.
    Type: Application
    Filed: September 28, 2001
    Publication date: April 3, 2003
    Inventors: Hong Hie Lee, Kab Yang Suh, Youn Sang Kim, Pil Jin Yoo