Abstract: Photoresist compositions improving the quality of a photoresist pattern, methods for forming a pattern using the same, and methods for fabricating a semiconductor device using the same are provided. The photoresist composition includes a photosensitive resin, a photoacid generator, a photoacid-labile additive comprising a structure of Formula 1-1, and optionally a solvent: Ar2—Y-PG2??[Formula 1-1] wherein Ar1 is a substituted or unsubstituted aromatic ring, Y is an ester group, an oxycarbonyl group, an acetal group, an amide group, or a thioester group, and PG2 is a substituted or unsubstituted secondary alkyl group, a substituted or unsubstituted tertiary alkyl group, a substituted or unsubstituted alkoxyalkyl group, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted alkyloxycarbonyl group.

Abstract: Disclosed herein is a preparation method of homopolymer nanoparticles without using a surfactant. The homopolymer nanoparticles prepared thereby are expected to be widely used not only as a template of a semiconductor metal oxide, a drug delivery system (DDS), an electron transport layer (ETL), and a seed having vertical structural shape, but also in a high precision field such as replacement of an organic device polystyrene bead film.

Abstract: Disclosed herein is a preparation method of homopolymer nanoparticles without using a surfactant. The homopolymer nanoparticles prepared thereby are expected to be widely used not only as a template of a semiconductor metal oxide, a drug delivery system (DDS), an electron transport layer (ETL), and a seed having vertical structural shape, but also in a high precision field such as replacement of an organic device polystyrene bead film.

Abstract: An organic crystalline composition is provided. The organic crystalline composition includes a main material having ?-conjugated back bone and a functional group containing an atom having an unshared electron pair, and a linking material combining with the adjacent main material at the functional group by quaternization, organic material-metal interaction, ionic bonding, or hydrogen bonding.