Patents by Inventor Hong-Liang Lin

Hong-Liang Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240145561
    Abstract: A semiconductor may include an active region, an epitaxial source/drain formed in and extending above the active region, and a first dielectric layer formed over a portion of the active region. The semiconductor may include a first metal gate and a second metal gate formed in the first dielectric layer, a second dielectric layer formed over the first dielectric layer and the second metal gate, and a titanium layer, without an intervening fluorine residual layer, formed on the metal gate and the epitaxial source/drain. The semiconductor may include a first metal layer formed on top of the titanium on the first metal gate, a second metal layer formed on top of the titanium layer on the epitaxial source/drain, and a third dielectric layer formed on the second dielectric layer. The semiconductor may include first and second vias formed in the third dielectric layer.
    Type: Application
    Filed: January 10, 2024
    Publication date: May 2, 2024
    Inventors: Yu-Ting TSAI, Chung-Liang CHENG, Hong-Ming LO, Chun-Chih LIN, Chyi-Tsong NI
  • Publication number: 20240136463
    Abstract: This disclosure discloses an optical sensing device. The device includes a carrier body; a first light-emitting device disposed on the carrier body; and a light-receiving device including a group III-V semiconductor material disposed on the carrier body, including a light-receiving surface having an area, wherein the light-receiving device is capable of receiving a first received wavelength having a largest external quantum efficiency so the ratio of the largest external quantum efficiency to the area is ?13.
    Type: Application
    Filed: December 20, 2023
    Publication date: April 25, 2024
    Applicant: EPISTAR CORPORATION
    Inventors: Yi-Chieh LIN, Shiuan-Leh LIN, Yung-Fu CHANG, Shih-Chang LEE, Chia-Liang HSU, Yi HSIAO, Wen-Luh LIAO, Hong-Chi SHIH, Mei-Chun LIU
  • Publication number: 20060102686
    Abstract: A stapler nose includes a passage defined therein and a plurality of stops extend from two sides of a face of the nose. A top plate is mounted on the face of the nose has positioning blocks which are engaged with the stops. Two first lugs extend from a face of two sides of the top plate. Two hooks are connected to one pair of the stops and each hook has an engaging recess. A fastening device includes a pivotable member which includes two second lugs and each second lug has a notch. The two second lugs are pivotably connected between the two first lugs. An enclosed loop has a first straight section for being engaged with the notches in the two second lugs and a rear straight section for being engaged with the first engaging recesses of the hooks.
    Type: Application
    Filed: November 12, 2004
    Publication date: May 18, 2006
    Inventor: Hong-Liang Lin
  • Patent number: 7032796
    Abstract: A stapler nose includes a passage defined therein and a plurality of stops extend from two sides of a face of the nose. A top plate is mounted on the face of the nose has positioning blocks which are engaged with the stops. Two first lugs extend from a face of two sides of the top plate. Two hooks are connected to one pair of the stops and each hook has an engaging recess. A fastening device includes a pivotable member which includes two second lugs and each second lug has a notch. The two second lugs are pivotably connected between the two first lugs. An enclosed loop has a first straight section for being engaged with the notches in the two second lugs and a rear straight section for being engaged with the first engaging recesses of the hooks.
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: April 25, 2006
    Assignee: Apach Industrial Co., Ltd.
    Inventor: Hong-Liang Lin