Patents by Inventor Hong Qui

Hong Qui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • OPTICAL METROLOGY MODEL OPTIMIZATION FOR REPETITIVE STRUCTURES
    Publication number: 20080195342
    Abstract: An optical metrology model for a repetitive structure is optimized by selecting one or more profile parameters using one or more selection criteria. One or more termination criteria are set, the one or more termination criteria comprising measures of stability of the optical metrology model. The profile shape features of the repetitive structure are characterized using the one or more selected profile parameters. The optical metrology model is optimized using a set of values for the one or more selected profile parameters. One or more profile parameters of the profile of the repetitive structure are determined using the optimized optical metrology model and one or more measured diffraction signals. Values of the one or more termination criteria are calculated using the one or more determined profile parameters.
    Type: Application
    Filed: April 8, 2008
    Publication date: August 14, 2008
    Applicant: Timbre Technologies, Inc.
    Inventors: Shifang LI, Junwei Bao, Hong Qui, Victor Liu
  • Optical metrology model optimization for repetitive structures
    Patent number: 7355728
    Abstract: An optical metrology model for a repetitive structure is optimized by selecting one or more profile parameters using one or more selection criteria. One or more termination criteria are set, the one or more termination criteria comprising measures of stability of the optical metrology model. The profile shape features of the repetitive structure are characterized using the one or more selected profile parameters. The optical metrology model is optimized using a set of values for the one or more selected profile parameters. One or more profile parameters of the profile of the repetitive structure are determined using the optimized optical metrology model and one or more measured diffraction signals. Values of the one or more termination criteria are calculated using the one or more determined profile parameters.
    Type: Grant
    Filed: June 16, 2005
    Date of Patent: April 8, 2008
    Assignee: Timbre Technologies, Inc.
    Inventors: Shifang Li, Junwei Bao, Hong Qui, Victor Liu
  • Parallel profile determination for an optical metrology system
    Publication number: 20080015812
    Abstract: A system to process requests for wafer structure profile determination from optical metrology measurements off a plurality of structures formed on one or more wafer includes a diffraction signal processor, a diffraction signal distributor, and a plurality of profile search servers. The diffraction signal processor is configured to obtain a plurality of measured diffraction signals of the plurality of structures. The diffraction signal distributor is coupled to the diffraction signal processor. The diffraction signal processor is configured to transmit the plurality of measured diffraction signals to the diffraction signal distributor. The plurality of profile search servers is coupled to the diffraction signal distributor. The diffraction signal distributor is configured to distribute the plurality of measured diffraction signals to the plurality of profile search servers.
    Type: Application
    Filed: July 11, 2006
    Publication date: January 17, 2008
    Applicant: Tokyo Electron Limited
    Inventors: Tri Thanh Khuong, Junwei Bao, Jeffrey A. Chard, Wei Liu, Ying Zhu, Sachin Deshpande, Pranav Sheth, Hong Qui
  • Optical metrology model optimization for repetitive structures
    Publication number: 20060290947
    Abstract: An optical metrology model for a repetitive structure is optimized by selecting one or more profile parameters using one or more selection criteria. One or more termination criteria are set, the one or more termination criteria comprising measures of stability of the optical metrology model. The profile shape features of the repetitive structure are characterized using the one or more selected profile parameters. The optical metrology model is optimized using a set of values for the one or more selected profile parameters. One or more profile parameters of the profile of the repetitive structure are determined using the optimized optical metrology model and one or more measured diffraction signals. Values of the one or more termination criteria are calculated using the one or more determined profile parameters.
    Type: Application
    Filed: June 16, 2005
    Publication date: December 28, 2006
    Applicant: Timbre Technologies, Inc.
    Inventors: Shifang Li, Junwei Bao, Hong Qui, Victor Liu
  • Light for and attachment to a cell phone
    Patent number: D539951
    Type: Grant
    Filed: March 16, 2006
    Date of Patent: April 3, 2007
    Assignee: Advertising Techniques and Promotions, Inc.
    Inventor: Yun Hong Qui