Patents by Inventor Hong-seok Sim

Hong-seok Sim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Defect repair method for photomask and defect-free photomask
    Patent number: 7785754
    Abstract: A method of repairing a photomask with a depression defect includes providing a photomask including a depression defect on a transparent substrate, forming a protection layer which covers the depression defect, etching a predetermined depth of the transparent substrate of the photomask with the protection layer as the etch mask, and removing the protection layer and the transparent substrate under the unetched protection layer, wherein a defect free photomask is produced.
    Type: Grant
    Filed: August 9, 2007
    Date of Patent: August 31, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hong-seok Sim, Moon-gyu Sung, Sang-hyeon Lee
  • Defect Repair Method for Photomask and Defect-Free Photomask
    Publication number: 20080081267
    Abstract: A method of repairing a photomask with a depression defect includes providing a photomask including a depression defect on a transparent substrate, forming a protection layer which covers the depression defect, etching a predetermined depth of the transparent substrate of the photomask with the protection layer as the etch mask, and removing the protection layer and the transparent substrate under the unetched protection layer, wherein a defect tree photomask is produced.
    Type: Application
    Filed: August 9, 2007
    Publication date: April 3, 2008
    Inventors: Hong-seok Sim, Moon-gyu Sung, Sang-hyeon Lee