Abstract: The present invention discloses a surface treatment process for enhancing both the release rate of metal ions from a sacrificial electrode, and the working life of the electrode. A high density of micro pores are formed on the surface of the sacrificial electrode. Chlorine ions are then implanted into the pores. The chlorine ions prevent a passive film from forming on the sacrificial electrode during use, in which an electric current flows through the sacrificial electrode.

Abstract: The present invention provides an improvement for H2O2-containing wastewater treatment, wherein activated carbon for reducing the hydrogen peroxide content in the wastewater has an enhanced efficiency and a longer useful lifetime. The method of the present invention monitors a pH value of the H2O2-containing wastewater, and adjusts the pH value to 4 or higher by adding a base, when the pH is lower than 4, prior to causing the wastewater to contact activated carbon.

Abstract: A water treatment reactor adapted to simultaneously carry out electrocoagulation and advanced oxidation processes is disclosed, which includes an upright sealed tank having a metal body, or a metal mounted on an inner wall thereof, used as a cathode; a sacrificial electrode used as an anode, which is disposed in the tank and non-electrically connected to the cathode; a mixing device disposed in the bottom of the tank for enabling mixing of influent water and an air or oxygen-containing gas introduced into the tank; a gas-liquid separator which is in fluid communication with the tank at the top for expelling a gas from the tank without expelling water; and a direct current supply having a positive electrode electrically connected to the anode and a negative electrode electrically connected to the cathode.

Abstract: The present invention discloses a surface treatment process for enhancing both the release rate of metal ions from a sacrificial electrode, and the working life of the electrode. A high density of micro pores are formed on the surface of the sacrificial electrode. Chlorine ions are then implanted into the pores. The chlorine ions prevent a passive film from forming on the sacrificial electrode during use, in which an electric current flows through the sacrificial electrode.

Abstract: The present invention discloses a process and an apparatus for removing deep sub-micron particles from water. The invented process includes adjusting pH value and conductivity, adding an oxidation agent, performing an electro coagulation reaction/an electro-oxidation reaction, and performing a flocculation sedimentation, etc. The invented apparatus includes a front adjustment tank for adjusting the properties of waste water, wherein the adjustment includes a pH adjustment, an electrolyte adjustment, or an oxidant addition, etc.

Abstract: The present invention discloses a process and an apparatus for removing deep sub-micron particles from water. The invented process includes adjusting pH value and conductivity, adding an oxidation agent, performing an electro coagulation reaction/an electro-oxidation reaction, and performing a flocculation sedimentation, etc. The invented apparatus includes a front adjustment tank for adjusting the properties of waste water, wherein the adjustment includes a pH adjustment, an electrolyte adjustment, or an oxidant addition, etc.