Patents by Inventor Hong Siang Tan
Hong Siang Tan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7014738Abstract: A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of macroparticles from the plasma. The apparatus comprises a second filter (10) for further removal of macroparticles from the plasma, made up of a baffle (11), an aperture (12) through which plasma can pass and second magnetic means (13) for steering plasma through the aperture. The aperture size may be less than 33% of the duct sectional area at that point. The source can also include an ion beam generator. Also described is a method of depositing coatings of ions using the second filter and closing the aperture in the filter when required.Type: GrantFiled: January 15, 2003Date of Patent: March 21, 2006Assignee: Filplas Vacuum Technology PTE Ltd.Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan
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Patent number: 6899828Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminum. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, while retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.Type: GrantFiled: March 25, 2002Date of Patent: May 31, 2005Assignee: Nanyang Technological UniversityInventors: Xu Shi, Hong Siang Tan, Beng Kang Tay
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Patent number: 6761805Abstract: A cathode arc source has means for generating first and second magnetic fields, of opposite or reverse direction to each other. The resultant magnetic field includes a null point between the target and the substrate, though close to the target. Field strength normal to the target is zero at the null point, and field strength lateral to the target is strong at the target surface, constraining movement of the arc spot and reducing the risk of migration off the target surface. A target is made by pressing graphite powder at elevated temperature and pressure in the absence of binding material. Both source and target contribute to reduced macroparticles in deposited films.Type: GrantFiled: January 25, 1999Date of Patent: July 13, 2004Assignee: Filplas Vacuum Technology Pte. Ltd.Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan, David Ian Flynn
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Patent number: 6736949Abstract: Deposition apparatus incorporating either a single or multiple filtered cathodic arc (FCA) source for depositing coatings such as tetrahedral amorphous carbon (TAC); metal oxides; compounds and alloys of such materials onto various types of substrates, such as metals semiconductors, plastics ceramics and glasses. Substrates are moved through the plasma beam(s) of the FCA source(s) and beam scanning increases deposition area. Macroparticles are filtered by a double bend filter duct.Type: GrantFiled: December 11, 2001Date of Patent: May 18, 2004Assignee: Filplas Vacuum Technology Pte Ltd.Inventors: Xu Shi, Beng Kang Tay, David Ian Flynn, Hong Siang Tan, Michael Fulton
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Publication number: 20030155230Abstract: A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of macroparticles from the plasma. The apparatus comprises a second filter (10) for further removal of macroparticles from the plasma, made up of a baffle (11), an aperture (12) through which plasma can pass and second magnetic means (13) for steering plasma through the aperture. The aperture size may be less than 33% of the duct sectional area at that point. The source can also include an ion beam generator. Also described is a method of depositing coatings of ions using the second filter and closing the aperture in the filter when required.Type: ApplicationFiled: January 15, 2003Publication date: August 21, 2003Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan
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Patent number: 6571865Abstract: The present invention relates to a heat transfer surface comprising a layer of carbon, to a heating element or condenser comprising said heat transfer surface, to a method of applying said heat transfer surface, and to a method for carrying out dropwise condensation employing said heat transfer surface. The carbon layer employed in the present invention is tetrahedral amorphous carbon and/or diamond-like carbon. In addition, the carbon layer may be a composite (eg. an alloy) of the above carbon sources with another component such as nickel, chromium or Teflon®. The heat transfer surface of the present invention permits dropwise condensation rather than film wise condensation to proceed. The surface also exhibits improved resistance to fouling such as scale build-up caused by hard water. The heat transfer surface of the present invention has particular application in kettles, washing machines, dishwashers and condensers.Type: GrantFiled: June 18, 1999Date of Patent: June 3, 2003Assignee: Nanyang Technological UniversityInventors: Xu Shi, Hong Siang Tan
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Publication number: 20030085123Abstract: Deposition apparatus incorporating either a single or multiple filtered cathodic arc (FCA) source for depositing coatings such as tetrahedral amorphous carbon (TAC); metal oxides; compounds and alloys of such materials onto various types of substrates, such as metals semiconductors, plastics ceramics and glasses. Substrates are moved through the plasma beam(s) of the FCA source(s) and beam scanning increases deposition area. Macroparticles are filtered by a double bend filter duct.Type: ApplicationFiled: December 11, 2001Publication date: May 8, 2003Inventors: Xu Ian Shi, Beng Kang Tay, David Ian Flynn, Hong Siang Tan, Michael Fulton
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Patent number: 6511585Abstract: A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of macroparticles from the plasma. The apparatus comprises a second filter for further removal of macroparticles from the plasma, made up of a baffle, an aperture through which plasma can pass and second magnetic means for steering plasma through the aperture. The source can also include an ion beam generator. Also described is a method of depositing coatings of ions using the second filter and closing the aperture in the filter when required.Type: GrantFiled: October 6, 2000Date of Patent: January 28, 2003Assignee: Filplas Vacuum Technology PTE Ltd.Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan
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Publication number: 20020102398Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminum. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, while retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.Type: ApplicationFiled: March 25, 2002Publication date: August 1, 2002Inventors: Xu Shi, Hong Siang Tan, Beng Kang Tay
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Patent number: 6413387Abstract: A cathode arc source generates positive ions from a non-graphite target. The cathode arc source includes (a) a cathode station to receive the target; (b) a first magnet to generate a first magnetic field at the target; and (c) a second magnet to generate a second magnetic field at the target. The second magnetic field has a direction opposite to that of the first magnetic field so that the resultant magnetic field has a point of zero field strength above the target. In an embodiment, the first magnet is located below the target and includes a coil with a diameter greater than the diameter of the target. The second magnet is located above the target.Type: GrantFiled: October 12, 2000Date of Patent: July 2, 2002Assignee: Filplas Vacuum Technology PTE Ltd.Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan
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Patent number: 6387443Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminium. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, whilst retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.Type: GrantFiled: October 3, 2000Date of Patent: May 14, 2002Assignee: Nanyang Technological UniversityInventors: Xu Shi, Hong Siang Tan, Beng Kang Tay
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Patent number: 6338779Abstract: A cathode arc source apparatus for depositing a coating on a substrate is provided with a monitor for monitoring the cathode arc source. The monitor is useful for monitoring position of an arc spot on the target, plasma emission by the source, or current through or potential difference at a secondary anode. A controller can take actions such as shutting down the source, varying the power or restriking the arc in response to output from the monitor.Type: GrantFiled: October 6, 2000Date of Patent: January 15, 2002Assignee: Filplas Vacuum Technology PTE LtdInventors: Xu Shi, Xiao Zhe Jin, Hong Siang Tan
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Patent number: 6319369Abstract: A coating of positive ions is applied to a substrate by generating an arc at a cathode, directing a beam of ions emitted from the cathode to the substrate via a filter path to remove macroparticles, igniting the arc by moving an arc ignition from a retracted position to an ignition position in which cathode contact is made, and storing the position in which arc ignition occurred.Type: GrantFiled: November 5, 1999Date of Patent: November 20, 2001Assignee: Filplas Vacuum Technology PTE, Ltd.Inventors: David Ian Flynn, Xu Shi, Hong Siang Tan, Beng Kang Tay
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Patent number: 6262539Abstract: Apparatus for feeding a target into a chamber of a cathode arc source comprises support structure (22, 23, 24) attached to or integral with the cathode arc source (10), a cathode station (16, 17, 18) for receiving a target (18) in electrical connection with an arc power supply, wherein the cathode station is mounted for movement (21, 37) on the support structure relative to the chamber so as to feed the target into the chamber. The apparatus can also have a target cutter in the chamber for removing an upper portion of the target. A graphite target for feeding into the source is a composite of at least inner and outer sections, the inner section comprising graphite powder and having a density in the range 1.7-2.0 g/cm3 and the outer section comprising graphite powder and having a density that is at least 0.1 g/cm3 less than that of the inner section.Type: GrantFiled: October 13, 2000Date of Patent: July 17, 2001Assignee: Filplas Vacuum Technology PTE LtdInventors: Xu Shi, Beng Kang Tay, Hong Siang Tan
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Publication number: 20010002002Abstract: Deposition apparatus incorporating either a single or multiple filtered cathodic arc (FCA) source for depositing coatings such as tetrahedral amorphous carbon (TAC); metal oxides; compounds and alloys of such materials onto various types of substrates, such as metals semiconductors, plastics ceramics and glasses. Substrates are moved through the plasma beam(s) of the FCA source(s) and beam scanning increases deposition area. Macroparticles are filtered by a double bend filter duct.Type: ApplicationFiled: November 21, 1997Publication date: May 31, 2001Applicant: FILPLAS VACUUM TECHNOLOGY PTE, LTD.Inventors: DAVID IAN FLYNN, MICHAEL FULTON, XU SHI, HONG SIANG TAN, BENG KANG TAY
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Patent number: 6143142Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminium. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, whilst retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.Type: GrantFiled: June 21, 1999Date of Patent: November 7, 2000Assignee: Nanyang Technological UniversityInventors: Xu Shi, Hong Siang Tan, Beng Kang Tay
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Patent number: 6031239Abstract: The plasma beam from a cathodic arc is filtered by baffles, a double bend toroidal plasma duct and a biased, corrugated liner within the duct, giving coatings virtually free of contaminating macroparticles. Reactive gas is ionised in the plasma ball and automatic arc ignition is provided.Type: GrantFiled: November 21, 1997Date of Patent: February 29, 2000Assignee: Filpas Vacuum Technology Pte Ltd.Inventors: Xu Shi, David Ian Flynn, Beng Kang Tay, Hong Siang Tan