Patents by Inventor Hong Siang Tan

Hong Siang Tan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7014738
    Abstract: A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of macroparticles from the plasma. The apparatus comprises a second filter (10) for further removal of macroparticles from the plasma, made up of a baffle (11), an aperture (12) through which plasma can pass and second magnetic means (13) for steering plasma through the aperture. The aperture size may be less than 33% of the duct sectional area at that point. The source can also include an ion beam generator. Also described is a method of depositing coatings of ions using the second filter and closing the aperture in the filter when required.
    Type: Grant
    Filed: January 15, 2003
    Date of Patent: March 21, 2006
    Assignee: Filplas Vacuum Technology PTE Ltd.
    Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan
  • Patent number: 6899828
    Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminum. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, while retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.
    Type: Grant
    Filed: March 25, 2002
    Date of Patent: May 31, 2005
    Assignee: Nanyang Technological University
    Inventors: Xu Shi, Hong Siang Tan, Beng Kang Tay
  • Patent number: 6761805
    Abstract: A cathode arc source has means for generating first and second magnetic fields, of opposite or reverse direction to each other. The resultant magnetic field includes a null point between the target and the substrate, though close to the target. Field strength normal to the target is zero at the null point, and field strength lateral to the target is strong at the target surface, constraining movement of the arc spot and reducing the risk of migration off the target surface. A target is made by pressing graphite powder at elevated temperature and pressure in the absence of binding material. Both source and target contribute to reduced macroparticles in deposited films.
    Type: Grant
    Filed: January 25, 1999
    Date of Patent: July 13, 2004
    Assignee: Filplas Vacuum Technology Pte. Ltd.
    Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan, David Ian Flynn
  • Patent number: 6736949
    Abstract: Deposition apparatus incorporating either a single or multiple filtered cathodic arc (FCA) source for depositing coatings such as tetrahedral amorphous carbon (TAC); metal oxides; compounds and alloys of such materials onto various types of substrates, such as metals semiconductors, plastics ceramics and glasses. Substrates are moved through the plasma beam(s) of the FCA source(s) and beam scanning increases deposition area. Macroparticles are filtered by a double bend filter duct.
    Type: Grant
    Filed: December 11, 2001
    Date of Patent: May 18, 2004
    Assignee: Filplas Vacuum Technology Pte Ltd.
    Inventors: Xu Shi, Beng Kang Tay, David Ian Flynn, Hong Siang Tan, Michael Fulton
  • Publication number: 20030155230
    Abstract: A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of macroparticles from the plasma. The apparatus comprises a second filter (10) for further removal of macroparticles from the plasma, made up of a baffle (11), an aperture (12) through which plasma can pass and second magnetic means (13) for steering plasma through the aperture. The aperture size may be less than 33% of the duct sectional area at that point. The source can also include an ion beam generator. Also described is a method of depositing coatings of ions using the second filter and closing the aperture in the filter when required.
    Type: Application
    Filed: January 15, 2003
    Publication date: August 21, 2003
    Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan
  • Patent number: 6571865
    Abstract: The present invention relates to a heat transfer surface comprising a layer of carbon, to a heating element or condenser comprising said heat transfer surface, to a method of applying said heat transfer surface, and to a method for carrying out dropwise condensation employing said heat transfer surface. The carbon layer employed in the present invention is tetrahedral amorphous carbon and/or diamond-like carbon. In addition, the carbon layer may be a composite (eg. an alloy) of the above carbon sources with another component such as nickel, chromium or Teflon®. The heat transfer surface of the present invention permits dropwise condensation rather than film wise condensation to proceed. The surface also exhibits improved resistance to fouling such as scale build-up caused by hard water. The heat transfer surface of the present invention has particular application in kettles, washing machines, dishwashers and condensers.
    Type: Grant
    Filed: June 18, 1999
    Date of Patent: June 3, 2003
    Assignee: Nanyang Technological University
    Inventors: Xu Shi, Hong Siang Tan
  • Publication number: 20030085123
    Abstract: Deposition apparatus incorporating either a single or multiple filtered cathodic arc (FCA) source for depositing coatings such as tetrahedral amorphous carbon (TAC); metal oxides; compounds and alloys of such materials onto various types of substrates, such as metals semiconductors, plastics ceramics and glasses. Substrates are moved through the plasma beam(s) of the FCA source(s) and beam scanning increases deposition area. Macroparticles are filtered by a double bend filter duct.
    Type: Application
    Filed: December 11, 2001
    Publication date: May 8, 2003
    Inventors: Xu Ian Shi, Beng Kang Tay, David Ian Flynn, Hong Siang Tan, Michael Fulton
  • Patent number: 6511585
    Abstract: A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of macroparticles from the plasma. The apparatus comprises a second filter for further removal of macroparticles from the plasma, made up of a baffle, an aperture through which plasma can pass and second magnetic means for steering plasma through the aperture. The source can also include an ion beam generator. Also described is a method of depositing coatings of ions using the second filter and closing the aperture in the filter when required.
    Type: Grant
    Filed: October 6, 2000
    Date of Patent: January 28, 2003
    Assignee: Filplas Vacuum Technology PTE Ltd.
    Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan
  • Publication number: 20020102398
    Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminum. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, while retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.
    Type: Application
    Filed: March 25, 2002
    Publication date: August 1, 2002
    Inventors: Xu Shi, Hong Siang Tan, Beng Kang Tay
  • Patent number: 6413387
    Abstract: A cathode arc source generates positive ions from a non-graphite target. The cathode arc source includes (a) a cathode station to receive the target; (b) a first magnet to generate a first magnetic field at the target; and (c) a second magnet to generate a second magnetic field at the target. The second magnetic field has a direction opposite to that of the first magnetic field so that the resultant magnetic field has a point of zero field strength above the target. In an embodiment, the first magnet is located below the target and includes a coil with a diameter greater than the diameter of the target. The second magnet is located above the target.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: July 2, 2002
    Assignee: Filplas Vacuum Technology PTE Ltd.
    Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan
  • Patent number: 6387443
    Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminium. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, whilst retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.
    Type: Grant
    Filed: October 3, 2000
    Date of Patent: May 14, 2002
    Assignee: Nanyang Technological University
    Inventors: Xu Shi, Hong Siang Tan, Beng Kang Tay
  • Patent number: 6338779
    Abstract: A cathode arc source apparatus for depositing a coating on a substrate is provided with a monitor for monitoring the cathode arc source. The monitor is useful for monitoring position of an arc spot on the target, plasma emission by the source, or current through or potential difference at a secondary anode. A controller can take actions such as shutting down the source, varying the power or restriking the arc in response to output from the monitor.
    Type: Grant
    Filed: October 6, 2000
    Date of Patent: January 15, 2002
    Assignee: Filplas Vacuum Technology PTE Ltd
    Inventors: Xu Shi, Xiao Zhe Jin, Hong Siang Tan
  • Patent number: 6319369
    Abstract: A coating of positive ions is applied to a substrate by generating an arc at a cathode, directing a beam of ions emitted from the cathode to the substrate via a filter path to remove macroparticles, igniting the arc by moving an arc ignition from a retracted position to an ignition position in which cathode contact is made, and storing the position in which arc ignition occurred.
    Type: Grant
    Filed: November 5, 1999
    Date of Patent: November 20, 2001
    Assignee: Filplas Vacuum Technology PTE, Ltd.
    Inventors: David Ian Flynn, Xu Shi, Hong Siang Tan, Beng Kang Tay
  • Patent number: 6262539
    Abstract: Apparatus for feeding a target into a chamber of a cathode arc source comprises support structure (22, 23, 24) attached to or integral with the cathode arc source (10), a cathode station (16, 17, 18) for receiving a target (18) in electrical connection with an arc power supply, wherein the cathode station is mounted for movement (21, 37) on the support structure relative to the chamber so as to feed the target into the chamber. The apparatus can also have a target cutter in the chamber for removing an upper portion of the target. A graphite target for feeding into the source is a composite of at least inner and outer sections, the inner section comprising graphite powder and having a density in the range 1.7-2.0 g/cm3 and the outer section comprising graphite powder and having a density that is at least 0.1 g/cm3 less than that of the inner section.
    Type: Grant
    Filed: October 13, 2000
    Date of Patent: July 17, 2001
    Assignee: Filplas Vacuum Technology PTE Ltd
    Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan
  • Publication number: 20010002002
    Abstract: Deposition apparatus incorporating either a single or multiple filtered cathodic arc (FCA) source for depositing coatings such as tetrahedral amorphous carbon (TAC); metal oxides; compounds and alloys of such materials onto various types of substrates, such as metals semiconductors, plastics ceramics and glasses. Substrates are moved through the plasma beam(s) of the FCA source(s) and beam scanning increases deposition area. Macroparticles are filtered by a double bend filter duct.
    Type: Application
    Filed: November 21, 1997
    Publication date: May 31, 2001
    Applicant: FILPLAS VACUUM TECHNOLOGY PTE, LTD.
    Inventors: DAVID IAN FLYNN, MICHAEL FULTON, XU SHI, HONG SIANG TAN, BENG KANG TAY
  • Patent number: 6143142
    Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminium. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, whilst retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.
    Type: Grant
    Filed: June 21, 1999
    Date of Patent: November 7, 2000
    Assignee: Nanyang Technological University
    Inventors: Xu Shi, Hong Siang Tan, Beng Kang Tay
  • Patent number: 6031239
    Abstract: The plasma beam from a cathodic arc is filtered by baffles, a double bend toroidal plasma duct and a biased, corrugated liner within the duct, giving coatings virtually free of contaminating macroparticles. Reactive gas is ionised in the plasma ball and automatic arc ignition is provided.
    Type: Grant
    Filed: November 21, 1997
    Date of Patent: February 29, 2000
    Assignee: Filpas Vacuum Technology Pte Ltd.
    Inventors: Xu Shi, David Ian Flynn, Beng Kang Tay, Hong Siang Tan