Abstract: A touch panel includes: a substrate which has sensing and peripheral areas; first sensing electrodes located on a surface of the substrate and arranged along a first direction in the sensing area and second sensing electrodes arranged along a second direction intersecting the first direction; a first connector located on the surface of the substrate and connecting the first sensing electrodes along the first direction; an insulating layer pattern located on the first connector; a second connector located on the insulating layer pattern, intersecting the first connector to be insulated from the first connector, and connecting the second sensing electrodes along the second direction; wiring lines located on the surface of the substrate, located in the peripheral area, and electrically connected to the first sensing electrodes or the second sensing electrodes; and a conductive pattern located between each of the second sensing electrodes and the second connector.

Abstract: A touch screen panel and manufacturing method thereof are disclosed. In one aspect, the touch screen panel includes a substrate having a touch area and a peripheral area that surrounds the touch area and a plurality of first touch electrode patterns that are formed in the touch area, extend in a first direction, and are configured to transmit a first touch signal. The touch panel also includes a plurality of second touch electrode patterns that are formed in the touch area, extend in a second direction crossing the first direction, and are configured to transmit a second touch signal and a plurality of first driving circuit wirings that are formed in the peripheral area and are respectively electrically connected to the first touch electrode patterns. The first driving circuit wirings include a low resistance wiring layer.

Abstract: There is provided a display device. The display device includes a first substrate, a second substrate that faces the first substrate, and a liquid crystal layer disposed between the first substrate and the second substrate. One of the first substrate and the second substrate includes a base substrate and a light blocking pattern disposed on a surface that faces the other surface of both surfaces of the base substrate, the light blocking pattern exposing a part of the base substrate. The light blocking pattern includes a semi-transmission reflective layer a disposed on the base substrate, a phase matching layer disposed on the semi-transmission reflective layer, and a reflective metal layer disposed on the phase matching layer. The phase matching layer and the reflective metal layer include materials having substantially the same etching rate.

Abstract: A touch panel includes: a substrate which has sensing and peripheral areas; first sensing electrodes located on a surface of the substrate and arranged along a first direction in the sensing area and second sensing electrodes arranged along a second direction intersecting the first direction; a first connector located on the surface of the substrate and connecting the first sensing electrodes along the first direction; an insulating layer pattern located on the first connector; a second connector located on the insulating layer pattern, intersecting the first connector to be insulated from the first connector, and connecting the second sensing electrodes along the second direction; wiring lines located on the surface of the substrate, located in the peripheral area, and electrically connected to the first sensing electrodes or the second sensing electrodes; and a conductive pattern located between each of the second sensing electrodes and the second connector.

Abstract: An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a N (nitrogen atom)-containing heterocyclic compound from 0.5 to 5 wt %; a chloride compound from 0.1 to 5 wt %; a copper salt from 0.05 to 3 wt %; an organic acid or an organic acid salt from 0.1 to 10 wt %; an electron-donating compound from at 0.1 to 5 wt %; and a solvent of the residual amount. Also provided is a method of manufacturing a display device by using the same.

Abstract: The present invention relates to a display device and a manufacturing method thereof, wherein a spoilage layer generated in a manufacturing process is removed, and a manufacturing method of a display device according to an exemplary embodiment of the present invention includes: forming a thin film transistor on a substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in the pixel area; forming a sacrificial layer on the pixel electrode; forming a barrier layer on the sacrificial layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode; patterning the barrier layer, the common electrode, and the roof layer to exposed a portion of the sacrificial layer thereby forming an injection hole; removing the sacrificial layer to form a microcavity for a plurality of pixel areas; removing the barrier layer.

Abstract: Provided is a method for manufacturing a glycol based compound. The method comprises agitating a mixture of a first glycol based compound, a hydrazide based compound, and a sulfonic acid based compound, and performing fractional distillation of resultant materials of the agitating to recover a second glycol based compound having a formaldehyde content of 0 ppm.

Abstract: A liquid crystal display is provided. The liquid crystal display includes a substrate, a thin film transistor disposed on the substrate, a pixel electrode connected with a terminal of the thin film transistor, a microcavity disposed on the pixel electrode, the microcavity including a liquid crystal injection hole disposed at an edge of the microcavity, a supporting member disposed on the microcavity, a first hydrophobic layer disposed on an edge portion of the supporting member, and a capping layer disposed on the supporting member with the capping layer covering the liquid crystal injection hole.

Abstract: A liquid crystal display includes a first substrate, a gate line which includes a gate electrode, a gate insulating layer, a semiconductor stripe layer which is separated from the gate line in a plan view, a semiconductor island, a data line, a source electrode and a drain electrode, an interlayer insulating layer in which a data line exposure hole which exposes a part of the data line is defined, a connecting member which is disposed on the interlayer insulating layer and is connected to the data lines which are disposed on and below the gate line through the data line exposure hole in plan view; and a pixel electrode which is disposed on the interlayer insulating layer and is separated from the connecting member, where the connecting member is directly connected to the source electrode and the pixel electrode is directly connected to the drain electrode.

Abstract: A device for monitoring a liquid crystal display includes: a substrate including a display region and a non-display region disposed at an edge of the display region. The display region includes: a thin film transistor disposed on the substrate, a pixel electrode disposed on the substrate and connected to the thin film transistor, a first sacrificial layer disposed on the pixel electrode, and a roof layer disposed on the sacrificial layer. The non-display region includes: a second sacrificial layer disposed on the substrate, and the roof layer disposed on the second sacrificial layer. The first sacrificial layer has a first longitudinal dimension and a first cross-sectional area, and the second sacrificial layer has a second longitudinal dimension and a second cross-sectional area. The first cross-sectional area is the same as the second cross-sectional area. The second longitudinal dimension is greater than the first longitudinal dimension.

Abstract: A touch panel includes: a substrate which has sensing and peripheral areas; first sensing electrodes located on a surface of the substrate and arranged along a first direction in the sensing area and second sensing electrodes arranged along a second direction intersecting the first direction; a first connector located on the surface of the substrate and connecting the first sensing electrodes along the first direction; an insulating layer pattern located on the first connector; a second connector located on the insulating layer pattern, intersecting the first connector to be insulated from the first connector, and connecting the second sensing electrodes along the second direction; wiring lines located on the surface of the substrate, located in the peripheral area, and electrically connected to the first sensing electrodes or the second sensing electrodes; and a conductive pattern located between each of the second sensing electrodes and the second connector.

Abstract: A liquid crystal display includes: a substrate; a gate line and a data line disposed on the substrate; a semiconductor layer disposed on the substrate; first and second field generating electrodes disposed on the substrate; and a first protecting layer formed from the same layer as the first field generating electrode and covering at least a portion of the data line.

Abstract: A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.

Abstract: A device for monitoring a liquid crystal display includes: a substrate including a display region and a non-display region disposed at an edge of the display region. The display region includes: a thin film transistor disposed on the substrate, a pixel electrode disposed on the substrate and connected to the thin film transistor, a first sacrificial layer disposed on the pixel electrode, and a roof layer disposed on the sacrificial layer. The non-display region includes: a second sacrificial layer disposed on the substrate, and the roof layer disposed on the second sacrificial layer. The first sacrificial layer has a first longitudinal dimension and a first cross-sectional area, and the second sacrificial layer has a second longitudinal dimension and a second cross-sectional area. The first cross-sectional area is the same as the second cross-sectional area. The second longitudinal dimension is greater than the first longitudinal dimension.

Abstract: The present invention relates to a display device and a manufacturing method thereof, wherein a spoilage layer generated in a manufacturing process is removed, and a manufacturing method of a display device according to an exemplary embodiment of the present invention includes: forming a thin film transistor on a substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in the pixel area; forming a sacrificial layer on the pixel electrode; forming a barrier layer on the sacrificial layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode; patterning the barrier layer, the common electrode, and the roof layer to exposed a portion of the sacrificial layer thereby forming an injection hole; removing the sacrificial layer to form a microcavity for a plurality of pixel areas; removing the barrier layer.

Abstract: An etchant composition includes about 0.5 weight % to about 20 weight % of persulfate, about 0.01 weight % to about 2 weight % of a fluoride compound, about 1 weight % to about 10 weight % of an inorganic acid, about 0.5 weight % to about 5 weight % of a cyclic amine compound, about 0.1 weight % to about 10.0 weight % of a compound having an amino group and a sulfonic acid, about 0.1 weight % to about 15.0 weight % of an organic acid or a salt thereof, and water to 100 weight % of the etchant composition.

Abstract: A method of forming a metal pattern includes disposing a gate metal layer on a substrate; disposing a photoresist layer on the gate metal layer; etching portions of the photoresist layer to form a first photo pattern; etching portions of the gate metal layer to form a gate pattern including a gate electrode, in which the gate metal layer is patterned using the first photo pattern as a mask; ashing an end portion of the first photo pattern to form a second photo pattern; disposing a first gate insulating layer over the substrate and the second photo pattern; removing the second photo pattern and a portion of the first gate insulating layer disposed over the second photo pattern; and disposing a second insulating layer over the gate pattern and the remaining portions of the first gate insulating layer.

Abstract: The present invention relates to a display device and a manufacturing method thereof, wherein a spoilage layer generated in a manufacturing process is removed, and a manufacturing method of a display device according to an exemplary embodiment of the present invention includes: forming a thin film transistor on a substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in the pixel area; forming a sacrificial layer on the pixel electrode; forming a barrier layer on the sacrificial layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode; patterning the barrier layer, the common electrode, and the roof layer to exposed a portion of the sacrificial layer thereby forming an injection hole; removing the sacrificial layer to form a microcavity for a plurality of pixel areas; removing the barrier layer.

Abstract: A method of forming a metal pattern includes disposing a gate metal layer on a substrate; disposing a photoresist layer on the gate metal layer; etching portions of the photoresist layer to form a first photo pattern; etching portions of the gate metal layer to form a gate pattern including a gate electrode, in which the gate metal layer is patterned using the first photo pattern as a mask; ashing an end portion of the first photo pattern to form a second photo pattern; disposing a first gate insulating layer over the substrate and the second photo pattern; removing the second photo pattern and a portion of the first gate insulating layer disposed over the second photo pattern; and disposing a second insulating layer over the gate pattern and the remaining portions of the first gate insulating layer.

Abstract: An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a N (nitrogen atom)-containing heterocyclic compound from 0.5 to 5 wt %; a chloride compound from 0.1 to 5 wt %; a copper salt from 0.05 to 3 wt %; an organic acid or an organic acid salt from 0.1 to 10 wt %; an electron-donating compound from at 0.1 to 5 wt %; and a solvent of the residual amount. Also provided is a method of manufacturing a display device by using the same.