Patents by Inventor Hong Yee Low

Hong Yee Low has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7615179
    Abstract: The present invention is directed to micro- and nano-scale imprinting methods and the use of such methods to fabricate supported and/or free-standing 3-D micro- and/or nano-structures of polymeric, ceramic, and/or metallic materials, particularly for pixel segregation in OLED-based displays. In some embodiments, a duo-mold approach is employed in the fabrication of these structures. In such methods, surface treatments are employed to impart differential surface energies to different molds and/or different parts of the mold(s). Such surface treatments permit the formation of three-dimensional (3-D) structures through imprinting and the transfer of such structures to a substrate. In some or other embodiments, such surface treatments and variation in glass transition temperature of the polymers used can facilitate separation of the 3-D structures from the molds to form free-standing micro- and/or nano-structures individually and/or in a film.
    Type: Grant
    Filed: March 24, 2005
    Date of Patent: November 10, 2009
    Assignee: Agency For Science, Technology and Research
    Inventors: Jarrett Dumond, Hong Yee Low
  • Publication number: 20090047478
    Abstract: A method for forming hierarchical patterns on an article by nanoimprinting is disclosed. The method includes using a first mould to form a primary pattern on the article at a first temperature and a first pressure, the first temperature and the first pressure being able to reduce the elastic modulus of the article; and using a second mould to form a second pattern on the primary pattern at a second temperature that is below the article's glass transition temperature, the forming of the second pattern being at a second pressure.
    Type: Application
    Filed: October 20, 2005
    Publication date: February 19, 2009
    Inventors: Fengxiang Zhang, Hong Yee Low
  • Publication number: 20080138580
    Abstract: There is disclosed an imprinted polymer support for solid phase organic synthesis (SPOS). The polymer support being obtainable from a method that comprises providing a substrate and a mold, the mold having a defined surface pattern. A composition is placed between the defined surface pattern of the mold and the substrate. The composition comprises a polymerisation medium with at least one functional monomer and a free radical initiator. The composition is polymerised to form an array of polymer imprints adhered to the substrate.
    Type: Application
    Filed: September 15, 2004
    Publication date: June 12, 2008
    Inventors: Hong Yee Low, Suresh Parappuveetil Sarangadharan, Yen Peng Kong, Karen Darmono
  • Patent number: 6692610
    Abstract: An improved method of fabricating a device such as OLED is disclosed. The method includes applying an adhesive on a cap or substrate. The adhesive is partially cured to initiate the cross-linking process while remaining in the liquid phase. The cap is then mounted onto the substrate and the adhesive is cured to encapsulate the device. By partially curing the adhesive prior to mounting the cap, the curing of the adhesive can be achieved without prolonged exposure to UV radiation or high temperatures which can adversely impact the device.
    Type: Grant
    Filed: July 26, 2001
    Date of Patent: February 17, 2004
    Assignee: Osram Opto Semiconductors GmbH
    Inventors: Hong Yee Low, Soo Jin Chua, Ewald Karl Michael Guenther
  • Publication number: 20030064324
    Abstract: A method of removing organic material having a conjugated structure from a selected region of a surface of an organic microelectronic device (OMED) during production of the OMED, the method comprising the acts of providing a source of ultraviolet radiation, irradiating at least the selected region of the surface of the OMED with ultraviolet radiation, thereby photolyzing at least some of the organic material and subjecting the selected region of the surface of the OMED to a temperature sufficient to evaporate at least some of the photolysed organic material.
    Type: Application
    Filed: June 18, 2002
    Publication date: April 3, 2003
    Inventors: Wei Wang, Hong Yee Low, Soo Jin Chua
  • Publication number: 20030019572
    Abstract: An improved method of fabricating a device such as OLED is disclosed. The method includes applying an adhesive on a cap or substrate. The adhesive is partially cured to initiate the cross-linking process while remaining in the liquid phase. The cap is then mounted onto the substrate and the adhesive is cured to encapsulate the device. By partially curing the adhesive prior to mounting the cap, the curing of the adhesive can be achieved without prolonged exposure to UV radiation or high temperatures which can adversely impact the device.
    Type: Application
    Filed: July 26, 2001
    Publication date: January 30, 2003
    Inventors: Hong Yee Low, Soo Jin Chua, Ewald Karl Michael Guenther