Patents by Inventor Hongchao Mao

Hongchao Mao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • BOTTOM ANTIREFLECTIVE COATING COMPOSITION FOR USE WITH OVERLYING PHOTORESIST AND METHOD FOR FORMING PHOTORESIST RELIEF IMAGE
    Publication number: 20230101541
    Abstract: A bottom antireflective coating composition and a method for forming a photoresist relief image. The coating composition comprises a resin containing a structural unit represented by the Formula (1), a structural unit represented by the Formula (2), and a structural unit represented by the Formula (3): The structural unit represented by the Formula (1), the structural unit represented by the Formula (2), and the structural unit represented by the Formula (3) is present in the resin in a molar ratio of (0.1-1000):(0.1-1000):1.
    Type: Application
    Filed: August 12, 2022
    Publication date: March 30, 2023
    Applicant: Xiamen Hengkun New Material Technology Co., Ltd.
    Inventors: Hongchao Mao, Hehe Li, Jing Wang, Nan Xiao