Abstract: A device assembling system includes a management apparatus, a material apparatus, and an execution apparatus. The management apparatus is communicatively connected to the material apparatus and the execution apparatus, and the material apparatus and the execution apparatus are installed into an overall structure. The management apparatus is configured to obtain a maintenance task of a maintenance device. The maintenance task includes an operation type and an operation object. The management apparatus parses the maintenance task into a first control instruction and a second control instruction. The material apparatus receives the first control instruction, and searches for a to-be-assembled part according to the first control instruction, that is, the material apparatus may determine a position of the to-be-assembled part.

Abstract: An image guided radiotherapy apparatus and a control method are provided. According to a specific embodiment, the radiotherapy apparatus includes: a treatment unit, which includes a treatment head for generating radiation beam for radiotherapy; an imaging unit for imaging a target area of a patient, wherein the imaging unit is integrated mounted with the treatment head. The radiotherapy apparatus of the present invention can be applicable to both extracorporeal and intraoperative radiotherapy, and has a high radiotherapy accuracy.

Abstract: In a method for acetylene hydrochlorination to vinyl chloride catalyzed by ultra-low content aurum-based material, a nitrogen-modified activated carbon support is obtained by using 1,10-phenanthroline as a modifier. A trace amount of aurum is used as a main active component and an organic solvent with a low polarity and a low boiling point, isopropanol, is used as a solvent. An ultra-low content of aurum-based catalyst with the aurum loading amount of 0.01 wt % using the above nitrogen-modified activated carbon as a support is prepared by improving the synthesis procedure, and the efficiency of the catalyst is significantly improved. The catalyst has high activity and vinyl chloride selectivity for acetylene hydrochlorination to vinyl chloride, which is low cost, no mercury pollution, simple in preparation process and expansibility, and has great industrial application value.

Abstract: A device assembling system includes a management apparatus, a material apparatus, and an execution apparatus. The management apparatus is communicatively connected to the material apparatus and the execution apparatus, and the material apparatus and the execution apparatus are installed into an overall structure. The management apparatus is configured to obtain a maintenance task of a maintenance device. The maintenance task includes an operation type and an operation object. The management apparatus parses the maintenance task into a first control instruction and a second control instruction. The material apparatus receives the first control instruction, and searches for a to-be-assembled part according to the first control instruction, that is, the material apparatus may determine a position of the to-be-assembled part.

Abstract: Systems and methods are disclosed that promote the remediation of contaminated materials that are produced during industrial processes. These systems and methods include heating a material, transferring heat from the material to an industrial process. During this transfer, contaminants may be introduced into the material. These methods may remove the contaminant by treating the material with a surface modified nanoceramic through nanofiltration and/or active sites adsorption/reaction. The surface modified nanoceramic may remove at least part of the contaminant in the material. No cooling required prior to removing the contaminant from the material, which can lead to great energy saving and pollution reduction.

Abstract: Systems and methods are disclosed that promote the remediation of contaminated materials that are produced during industrial processes. These systems and methods include heating a material, transferring heat from the material to an industrial process. During this transfer, contaminants may be introduced into the material. These methods may remove the contaminant by treating the material with a surface modified nanoceramic through nanofiltration and/or active sites adsorption/reaction. The surface modified nanoceramic may remove at least part of the contaminant in the material. No cooling required prior to removing the contaminant from the material, which can lead to great energy saving and pollution reduction.