Patents by Inventor Hongsheng Sun

Hongsheng Sun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11911786
    Abstract: The present invention discloses a hydrate energy-storage temperature-control material and a preparation method therefor. The material includes a refrigerant hydrate and a cross-linked polymer. The preparation method comprises the following steps: first, preparing a refrigerant hydrate by using a high-pressure reactor, and conducting grinding, crushing and sieving to obtain hydrate particles; then, uniformly spraying polytetrafluoroethylene suspended ultrafine powder onto the surface of the hydrate particles by using an electrostatic spraying device, and putting the hydrate particles into a plasma instrument to modify polytetrafluoroethylene so as to allow free radicals to be formed on the polytetrafluoroethylene powder surface; finally, subjecting monomers to graft polymerization with the free radicals on the polytetrafluoroethylene surface under the irradiation of a high-pressure mercury lamp of UV lighting system to stabilize the structure of the material, preparing a final product.
    Type: Grant
    Filed: June 30, 2021
    Date of Patent: February 27, 2024
    Assignee: DALIAN UNIVERSITY OF TECHNOLOGY
    Inventors: Jiafei Zhao, Yongchen Song, Mingzhao Yang, Hongsheng Dong, Lunxiang Zhang, Quan Shi, Lei Yang, Zheng Ling, Xiang Sun, Yanghui Li, Weiguo Liu
  • Patent number: 10352215
    Abstract: A method and system for modeling growth of reductant deposits for an aftertreatment system on a real time basis using input including exhaust gas temperature, exhaust gas flow rate, and reductant dosing rate. The growth of the reductant deposits are affected by a rate at which reductant accumulates and decomposes from a surface of the aftertreatment system. Thus, the method and system disclosed determines a net reductant deposit growth rate value based on a reductant deposit accumulation rate value and a reductant deposit decomposition rate value. Further, the method and system disclosed determines a reductant mass deposit value based on the net reductant deposit growth rate value. The reductant mass deposit value determined by the method and system may then be used to control a regeneration strategy of the aftertreatment system to eliminate the reductant deposits from the aftertreatment system.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: July 16, 2019
    Assignee: Caterpillar Inc.
    Inventors: Yong Yi, Shuhai Hou, Hongsheng Sun
  • Publication number: 20190063289
    Abstract: A method and system for modeling growth of reductant deposits for an aftertreatment system on a real time basis using input including exhaust gas temperature, exhaust gas flow rate, and reductant dosing rate. The growth of the reductant deposits are affected by a rate at which reductant accumulates and decomposes from a surface of the aftertreatment system. Thus, the method and system disclosed determines a net reductant deposit growth rate value based on a reductant deposit accumulation rate value and a reductant deposit decomposition rate value. Further, the method and system disclosed determines a reductant mass deposit value based on the net reductant deposit growth rate value. The reductant mass deposit value determined by the method and system may then be used to control a regeneration strategy of the aftertreatment system to eliminate the reductant deposits from the aftertreatment system.
    Type: Application
    Filed: August 29, 2017
    Publication date: February 28, 2019
    Applicant: Caterpillar Inc.
    Inventors: Yong Yi, Shuhai Hou, Hongsheng Sun