Patents by Inventor Hongsuk Chung

Hongsuk Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of automatically photographing an image, image processing device and image processing system performing the same
    Patent number: 11330166
    Abstract: A method of photographing an image using a camera includes determining a photographing mode; searching and tracking a main object including a photographer; and automatically photographing the image based on the photographing mode and a movement of the main object.
    Type: Grant
    Filed: August 26, 2020
    Date of Patent: May 10, 2022
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Hongsuk Chung
  • METHOD OF AUTOMATICALLY PHOTOGRAPHING AN IMAGE, IMAGE PROCESSING DEVICE AND IMAGE PROCESSING SYSTEM PERFORMING THE SAME
    Publication number: 20210235009
    Abstract: A method of photographing an image using a camera includes determining a photographing mode; searching and tracking a main object including a photographer; and automatically photographing the image based on the photographing mode and a movement of the main object.
    Type: Application
    Filed: August 26, 2020
    Publication date: July 29, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventor: Hongsuk CHUNG
  • Radioactive electron emitting microchannel plate
    Patent number: 6822249
    Abstract: The present invention relates to a radioactive electron emitting microchannel plate. More particularly, to a radioactive electron generating microchannel plate comprising (a) a pair of parallel substrates; (b) at least one radioactive material layer deposited on an inner surface of the substrates; and (c) at least one electron ray-amplifying layer deposited on the surface of the radioactive material layer. The emitted electron ray is amplified by penetrating into the cavity formed by a pair of parallel substrates and is further amplified by reflecting from the electron ray-amplifying layer. As the substrate in the microchannel plate, use can be made of a capillary tube or a thin plate. The microchannel plate of the present invention can be applied as an electron ray source in an electron ray-generating device, an image display device, and electron ray-etching device.
    Type: Grant
    Filed: July 2, 2002
    Date of Patent: November 23, 2004
    Assignees: Korea Atomic Energy Research Institute, Korea Hydro & Nuclear Power Co., Ltd.
    Inventors: Minsoo Lee, Hongsuk Chung, Jae Hyung Yoo, Hyun-Soo Park
  • Radioactive electron emitting microchannel plate
    Publication number: 20030015661
    Abstract: The present invention relates to a radioactive electron emitting microchannel plate. More particularly, to a radioactive electron generating microchannel plate comprising (a) a pair of parallel substrates; (b) at least one radioactive material layer deposited on an inner surface of the substrates; and (c) at least one electron ray-amplifying layer deposited on the surface of the radioactive material layer. The emitted electron ray is amplified by penetrating into the cavity formed by a pair of parallel substrates and is further amplified by reflecting from the electron ray-amplifying layer. As the substrate in the microchannel plate, use can be made of a capillary tube or a thin plate. The microchannel plate of the present invention can be applied as an electron ray source in an electron ray-generating device, an image display device, and electron ray-etching device.
    Type: Application
    Filed: July 2, 2002
    Publication date: January 23, 2003
    Inventors: Minsoo Lee, Hongsuk Chung, Jae Hyung Yoo, Hyun-Soo Park