Patents by Inventor Hongtu Guo

Hongtu Guo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for inspecting a wafer
    Patent number: 8885918
    Abstract: A method for inspecting a wafer. The method comprises a training process for creating reference images. The training process comprises capturing a number of images of a first wafer of unknown quality, each of the number of images of the first wafer being captured at a predetermined contrast illumination and each of the number of images of the first wafer comprising a plurality of pixels. The training process also comprises determining a plurality of reference intensities for each of the plurality of pixels of each of the number of images of the first wafer, calculating a plurality of statistical parameters for the plurality of reference intensities of each of the plurality of pixels of each of the number of images of the first wafer, and selecting a plurality of reference images from the plurality of images of the first wafer based on the calculated plurality of statistical parameters.
    Type: Grant
    Filed: January 13, 2010
    Date of Patent: November 11, 2014
    Assignee: Semiconductor Technologies & Instruments Pte Ltd
    Inventors: Ajharali Amanullah, Albert Archwamety, Hongtu Guo
  • System and method for inspecting a wafer
    Publication number: 20100189339
    Abstract: A method for inspecting a wafer. The method comprises a training process for creating reference images. The training process comprises capturing a number of images of a first wafer of unknown quality, each of the number of images of the first wafer being captured at a predetermined contrast illumination and each of the number of images of the first wafer comprising a plurality of pixels. The training process also comprises determining a plurality of reference intensities for each of the plurality of pixels of each of the number of images of the first wafer, calculating a plurality of statistical parameters for the plurality of reference intensities of each of the plurality of pixels of each of the number of images of the first wafer, and selecting a plurality of reference images from the plurality of images of the first wafer based on the calculated plurality of statistical parameters.
    Type: Application
    Filed: January 13, 2010
    Publication date: July 29, 2010
    Applicant: Semiconductor Technologies & Instruments Pte Ltd
    Inventors: Ajharali Amanullah, Albert Archwamety, Hongtu Guo