Abstract: Provided are a high temperature-resistant composite nanofiltration membrane and a preparation method thereof. The high temperature-resistant composite nanofiltration membrane includes a base membrane and a polyamide membrane arranged on the base membrane; wherein the polyamide membrane is prepared from raw materials comprising: an amine, an inorganic salt, a silane additive, a polyacyl chloride, and an oil phase solvent; and the silane additive is at least one selected from the group consisting of 3-aminopropyltriethoxysilane, divinyltriaminopropyltrimethoxysilane, N-cyclohexyl-?-aminopropyltrimethoxysilane, and trimethoxy[3-(phenylamino)propyl]silane.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has grounding electrodes and grounding pads located at edges, and a thin film covering the grounding electrodes but exposing the grounding pads. The workpiece carrier has carrier electrodes located around the workpiece and inside grounding ports at the bottom. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a Z-elevator to raise the workpiece carrier toward the poling source using the grounding ports, and grounding mechanisms including downwardly biased electrical contacts which, when the workpiece carrier is raised by the Z-elevator, connect the grounding pads of the workpiece with the carrier electrodes, to ground the workpiece. The poling apparatus additionally includes preparation platform and transfer platform with conveyer systems with rollers and Z-elevators to move the workpiece carrier in and out of the poling chamber.

Abstract: For in mold spraying, a double-inclined mixing nozzle is connected obliquely and fixedly with a side surface of a third half-mold through a lateral sealing structure and connected with a side surface of a first half-mold in an inclined and sealing manner, side faces of a first half-mold and the third half-mold are respectively provided with installation inclined surfaces. A lateral sealing structure includes a mounting plate and a sealing member. The sealing member is sleeved on the double-inclined mixing nozzle and is in transition fit with the double-inclined mixing nozzle and the mounting plate respectively. A butt sealing groove provided on the installation inclined surface of the first half-mold and is in sealing fit with the mounting plate.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has multiple grounding electrodes, grounding pads located at its edges, and a polymer thin film including multiple areas each covering only one grounding electrode. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a shadow mask below the poling source, and a Z-elevator to raise the workpiece carrier toward the shadow mask and poling source. When the workpiece in the workpiece carrier is raised to contact the underside of the shadow mask, multiple openings of the shadow mask expose only the corresponding multiple thin film areas of the workpiece to the plasma; meanwhile, conductive grounding terminals on the underside of the shadow mask electrically connect the grounding pads of the workpiece with carrier electrodes on the workpiece carrier, to ground the workpiece.

Abstract: The present disclosure provides a preparation method of a reverse osmosis composite membrane, including the following steps: coating a gelatin solution on a non-woven fabric layer and cooling to form a gelatin gel layer; coating a salt solution on a surface of the gelatin gel layer to obtain a gel/non-woven fabric composite membrane; placing the gel/non-woven fabric composite membrane in an aqueous phase solution, transferring into an oil phase solution, and conducting interfacial polymerization to obtain a non-woven fabric/gel/polyamide composite membrane; placing the non-woven fabric/gel/polyamide composite membrane in water, and heating to remove the gelatin gel layer to obtain a non-woven fabric/polyamide composite membrane; and introducing a trimesoyl chloride (TMC) gas from a side where the non-woven fabric layer is away from a polyamide layer in the non-woven fabric/polyamide composite membrane, conducting gas-liquid interfacial polymerization by chemical vapor deposition (CVD), and drying to obtain th

Abstract: The invention relates to ceramic granules with a high UV opacity and high solar reflectance, which is produced by forming a calcined clay mineral powder into green body and re-calcining, featured with a water absorption of 15-35%; ?97% crystalline content and 90-100% UV opacity. The invention further relates to a method for preparing ceramic granules with a high UV opacity and high solar reflectance and the use thereof for reflectance-improving application on building surface for the purpose of energy conservation.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has grounding electrodes and grounding pads located at edges, and a thin film covering the grounding electrodes but exposing the grounding pads. The workpiece carrier has carrier electrodes located around the workpiece and inside grounding ports at the bottom. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a Z-elevator to raise the workpiece carrier toward the poling source using the grounding ports, and grounding mechanisms including downwardly biased electrical contacts which, when the workpiece carrier is raised by the Z-elevator, connect the grounding pads of the workpiece with the carrier electrodes, to ground the workpiece. The poling apparatus additionally includes preparation platform and transfer platform with conveyer systems with rollers and Z-elevators to move the workpiece carrier in and out of the poling chamber.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has grounding electrodes and grounding pads located at edges, and a thin film covering the grounding electrodes but exposing the grounding pads. The workpiece carrier has carrier electrodes located around the workpiece and inside grounding ports at the bottom. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a Z-elevator to raise the workpiece carrier toward the poling source using the grounding ports, and grounding mechanisms including downwardly biased electrical contacts which, when the workpiece carrier is raised by the Z-elevator, connect the grounding pads of the workpiece with the carrier electrodes, to ground the workpiece. The poling apparatus additionally includes preparation platform and transfer platform with conveyer systems with rollers and Z-elevators to move the workpiece carrier in and out of the poling chamber.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has multiple grounding electrodes, grounding pads located at its edges, and a polymer thin film including multiple areas each covering only one grounding electrode. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a shadow mask below the poling source, and a Z-elevator to raise the workpiece carrier toward the shadow mask and poling source. When the workpiece in the workpiece carrier is raised to contact the underside of the shadow mask, multiple openings of the shadow mask expose only the corresponding multiple thin film areas of the workpiece to the plasma; meanwhile, conductive grounding terminals on the underside of the shadow mask electrically connect the grounding pads of the workpiece with carrier electrodes on the workpiece carrier, to ground the workpiece.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has grounding electrodes and grounding pads located at edges, and a thin film covering the grounding electrodes but exposing the grounding pads. The workpiece carrier has carrier electrodes located around the workpiece and inside grounding ports at the bottom. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a Z-elevator to raise the workpiece carrier toward the poling source using the grounding ports, and grounding mechanisms including downwardly biased electrical contacts which, when the workpiece carrier is raised by the Z-elevator, connect the grounding pads of the workpiece with the carrier electrodes, to ground the workpiece. The poling apparatus additionally includes preparation platform and transfer platform with conveyer systems with rollers and Z-elevators to move the workpiece carrier in and out of the poling chamber.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has grounding electrodes and grounding pads located at edges, and a thin film covering the grounding electrodes but exposing the grounding pads. The workpiece carrier has carrier electrodes located around the workpiece and inside grounding ports at the bottom. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a Z-elevator to raise the workpiece carrier toward the poling source using the grounding ports, and grounding mechanisms including downwardly biased electrical contacts which, when the workpiece carrier is raised by the Z-elevator, connect the grounding pads of the workpiece with the carrier electrodes, to ground the workpiece. The poling apparatus additionally includes preparation platform and transfer platform with conveyer systems with rollers and Z-elevators to move the workpiece carrier in and out of the poling chamber.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has multiple grounding electrodes, grounding pads located at its edges, and a polymer thin film including multiple areas each covering only one grounding electrode. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a shadow mask below the poling source, and a Z-elevator to raise the workpiece carrier toward the shadow mask and poling source. When the workpiece in the workpiece carrier is raised to contact the underside of the shadow mask, multiple openings of the shadow mask expose only the corresponding multiple thin film areas of the workpiece to the plasma; meanwhile, conductive grounding terminals on the underside of the shadow mask electrically connect the grounding pads of the workpiece with carrier electrodes on the workpiece carrier, to ground the workpiece.

Abstract: The invention relates to ceramic granules with a high UV opacity and high solar reflectance, which is produced by forming a calcined clay mineral powder into green body and re-calcining, featured with a water absorption of 15-35%; ?97% crystalline content and 90-100% UV opacity. The invention further relates to a method for preparing ceramic granules with a high UV opacity and high solar reflectance and the use thereof for reflectance-improving application on building surface for the purpose of energy conservation.

Abstract: The invention relates to ceramic granules with a high UV opacity and high solar reflectance, which is produced by forming a calcined clay mineral powder into green body and re-calcining, featured with a water absorption of 15-35%; ?97% crystalline content and 90-100% UV opacity. The invention further relates to a method for preparing ceramic granules with a high UV opacity and high solar reflectance and the use thereof for reflectance-improving application on building surface for the purpose of energy conservation.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has multiple grounding electrodes, grounding pads located at its edges, and a polymer thin film including multiple areas each covering only one grounding electrode. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a shadow mask below the poling source, and a Z-elevator to raise the workpiece carrier toward the shadow mask and poling source. When the workpiece in the workpiece carrier is raised to contact the underside of the shadow mask, multiple openings of the shadow mask expose only the corresponding multiple thin film areas of the workpiece to the plasma; meanwhile, conductive grounding terminals on the underside of the shadow mask electrically connect the grounding pads of the workpiece with carrier electrodes on the workpiece carrier, to ground the workpiece.

Abstract: A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has grounding electrodes and grounding pads located at edges, and a thin film covering the grounding electrodes but exposing the grounding pads. The workpiece carrier has carrier electrodes located around the workpiece and inside grounding ports at the bottom. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a Z-elevator to raise the workpiece carrier toward the poling source using the grounding ports, and grounding mechanisms including downwardly biased electrical contacts which, when the workpiece carrier is raised by the Z-elevator, connect the grounding pads of the workpiece with the carrier electrodes, to ground the workpiece. The poling apparatus additionally includes preparation platform and transfer platform with conveyer systems with rollers and Z-elevators to move the workpiece carrier in and out of the poling chamber.

Abstract: The invention relates to ceramic granules with a high UV opacity and high solar reflectance, which is produced by forming a calcined clay mineral powder into green body and re-calcining, featured with a water absorption of 15-35%; ?97% crystalline content and 90-100% UV opacity. The invention further relates to a method for preparing ceramic granules with a high UV opacity and high solar reflectance and the use thereof for reflectance-improving application on building surface for the purpose of energy conservation.

Abstract: Apparatus and method are provided for remediating trichloroethylene-polluting soils by integrated rotated migration and PRB. The apparatus includes a device of electrokinetic remediation, a PRB and a device of injection of surface active agents. The main components of the device of electrokinetic remediation and PRB include cathode, anode, electrode chamber and PRB. A liquid injection pipe is installed between various electrodes and PRBs. The operation of each device is controlled by each control system. The disclosure integrated rotated migration and PRB for remediating contaminants. Surface active agents is helpful for dispersing TCE from soil. The arrangement of the electrode and the PRB greatly shortens distances and time of pollutant migration, which accelerate the speed of remediation and reduce post-processing procedures. In the process of treatment, the three technical methods promote each other, and have the advantages of good repair effect, short time, no secondary pollution and easy operation.

Abstract: The present invention provides a high-flux polyamide composite membrane, which includes a composite membrane body, wherein the composite membrane body includes a non-woven fabric, a porous supporting layer and a polyamide layer which are successively arranged; and the polyamide layer is prepared by a polyamine solution and a poly-acyl chloride solution through an interface polymerization reaction, wherein the polyamine solution contains amino acid. The amino acid adopted in the technical solution of the present invention can be used as an end-capping reagent to react with acyl chloride groups, thereby regulating a polyamide layer structure, decreasing a cross-linking degree of the polyamide layer, and opening a channel for the passing of water molecules; and moreover, the hydrophilic performance of a membrane surface can also be improved, and a water flux is increased while a high interception rate is ensured.

Abstract: Apparatus and method are provided for the treatment of uranium-contaminated soil by using comprehensive joint technology. The apparatus include the pumping system, the electrokinetic remediation system, elution system, remediation-separation system and recharge system. The remediation technologies (i.e. chemical, photolysis and electrokinetic) are used to remedy the uranium-contaminated soil. First, extract uranium from the contaminated areas and make the ionized uranium extract from the soil phase to the solution phase. Then, use the electrokinetic remediation technology to drive uranium enrichment electromigrate to near the anode. Finally, return the repaired-soil and groundwater back to anode area and recharge well, respectively. This comprehensive joint apparatus can reduce the uranium volume in the contaminated soil or water, and recycle the obtained uranium, which are cleaning processes and have no secondary pollution.