Patents by Inventor Honoka ATSUCHI

Honoka ATSUCHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Band-pass filter
    Patent number: 11955681
    Abstract: A band-pass filter includes a first input/output port, a second input/output port, a plurality of resonators, and a multilayer stack. The multilayer stack includes a plurality of stacked dielectric layers. Each of the resonators is an open-ended resonator formed of a conductor line in the multilayer stack. Each of the resonators includes a resonator conductor portion including a first line part and a second line part located away from each other in a direction orthogonal to a stacking direction of the plurality of dielectric layers, and a third line part connecting the first line part and the second line part. The first to third line parts extend to surround a space between the first line part and the second line part.
    Type: Grant
    Filed: December 20, 2021
    Date of Patent: April 9, 2024
    Assignee: TDK CORPORATION
    Inventors: Honoka Atsuchi, Yuta Ashida, Longfei Yi, Yoshinori Matsumaru, Shuhei Sawaguchi, Masahiro Tatematsu, Shigemitsu Tomaki
  • BAND-PASS FILTER
    Publication number: 20220209380
    Abstract: A band-pass filter includes a first input/output port, a second input/output port, a plurality of resonators, and a multilayer stack. The multilayer stack includes a plurality of stacked dielectric layers. Each of the resonators is an open-ended resonator formed of a conductor line in the multilayer stack. Each of the resonators includes a resonator conductor portion including a first line part and a second line part located away from each other in a direction orthogonal to a stacking direction of the plurality of dielectric layers, and a third line part connecting the first line part and the second line part. The first to third line parts extend to surround a space between the first line part and the second line part.
    Type: Application
    Filed: December 20, 2021
    Publication date: June 30, 2022
    Applicant: TDK CORPORATION
    Inventors: Honoka ATSUCHI, Yuta ASHIDA, Longfei YI, Yoshinori MATSUMARU, Shuhei SAWAGUCHI, Masahiro TATEMATSU, Shigemitsu TOMAKI