Abstract: Provided is a low-loss planar spiral coil which may include a conductive wire wound N turns, and a conductive wire corresponding to each number of turns may be formed in a way that an inner surface, close to a center of the spiral coil, and an outer surface, located on an opposite side of the inner surface, have different heights from each other based on a flat lower surface, and may be formed in way that a vertical cross-section of an upper surface connecting an uppermost end of the inner and outer surfaces has a constant height variation.

Abstract: The present disclosure is to provide a polishing pad which is capable of providing physical properties corresponding to various polishing purposes for various polishing objects through the subdivided structural design in a thickness direction, and of securing environmental friendliness by applying a recycled or recyclable material to at least some components, in relation to disposal after use, unlike the conventional polishing pad. Specifically, it includes a polishing layer, wherein the polishing layer includes a polishing variable layer having a polishing surface; and a polishing constant layer disposed on a rear surface side of the polishing variable layer opposite to the polishing surface.

Abstract: The present disclosure is to provide a polishing pad which is capable of providing physical properties corresponding to various polishing purposes for various polishing objects through the subdivided structural design in a thickness direction, and of securing environmental friendliness by applying a recycled or recyclable material to at least some components, in relation to disposal after use, unlike the conventional polishing pad. Specifically, the polishing pad includes a polishing layer, wherein the polishing layer includes a polishing variable layer having a polishing surface; and a polishing constant layer disposed on a rear surface side of the polishing variable layer opposite to the polishing surface, and wherein the polishing constant layer includes a cured product of a composition having thermosetting polyurethane particles and a binder.

Abstract: The present disclosure relates to a method for refreshing a polishing pad, and, through increasing a useful life of a polishing pad used in a polishing process, is capable of reducing the amount of discarded polishing pad, and significantly enhancing polishing efficiency by shortening the time required to replace the polishing pad. In addition, a method for manufacturing a semiconductor device is a manufacturing process using the method for refreshing a polishing pad, wherein a polishing pad having the period of usage ended is reusable by having polishing performance equivalent to a new polishing pad, and process efficiency may be enhanced by reducing the number of replacements of polishing pads.

Abstract: Provided are a polishing pad provided with a structural feature capable of maximizing the leakage prevention effect, the polishing pad including: a polishing layer including a first surface which is a polished surface and a second surface which is an opposite surface thereof, and including a first through hole passing through the first surface and the second surface; a window disposed in the first through hole; and a support layer disposed at the second surface of the polishing layer.

Abstract: The present disclosure is intended to provide, as a polishing pad to which a window for an endpoint detection is applied, and in which the window is capable of providing improved polishing performance in terms of preventing defects, etc., by a specific structure due to the window, rather than negatively affecting polishing performance as a local heterogeneous component on the polishing pad, a polishing pad including: a polishing layer including a first surface that is a polishing surface and a second surface that is a rear surface thereof, and containing a first through-hole penetrating from the first surface to the second surface; a window disposed in the first through-hole; and a void between a side surface of the first through-hole and a side surface of the window, and a method for manufacturing a semiconductor device by applying the same.

Abstract: An image processing-based foreign substance detection method in a wireless charging system and a device performing the method are disclosed. A method for detecting a foreign substance according to an example embodiment includes an operation of acquiring an image of a charging area of a wireless charging system, an operation of detecting, based on an RGB value of a frame of the image, a foreign substance in the charging area, an operation of discriminating a type of the foreign substance, and an operation of performing power control of the wireless charging system according to the type of the foreign substance.

Abstract: Provided is a method for creating a virtual reality content, storing the virtual reality content in a transmission buffer, and after that, managing the transmission buffer. A server creates the virtual reality content based on user's motion information, stores the virtual reality content in the transmission buffer and is allowed to modify the virtual reality content stored in the transmission buffer based on subsequently received user's motion information, so that the most recent user's motion information can be appropriately reflected in the virtual reality content. It is possible to provide a more immersive virtual reality service.

Abstract: A method and system for manufacturing a coil for wireless charging are disclosed herein. The method may include manufacturing a printed circuit board, generating a coil-shaped metal pattern on the printed circuit board, and generating an additional metal pattern on the top of the metal pattern using a 3D metal printer.

Abstract: The present disclosure relates to a polishing pad, a method for manufacturing the polishing pad, and a method for manufacturing a semiconductor device using the polishing pad, and the present disclosure can prevent an error in detecting the end point due to the window in the polishing pad by minimizing the effect on transmittance according to the surface roughness of the window in the polishing pad in the polishing process, and allows the fluidity and loading rate of the polishing slurry in the polishing process to be implemented at similar levels by maintaining the surface roughness difference between the polishing layer and the window in the polishing pad within the predetermined range, thereby enabling the problem of deterioration of polishing performance due to the surface difference between the polishing layer and the window to be prevented. Further, a method for manufacturing a semiconductor device to which a polishing pad is applied may be provided.

Abstract: A wireless power receiving apparatus, according to an example embodiment, may include a receiving coil in which a first wire including a copper core and a second wire not including a copper core are wound around a same axis. The second wire may be located at a pitch of the first wire, and a diameter of the second wire may correspond to the pitch of the first wire.

Abstract: A wireless power transmission system and method are disclosed. The wireless power transmission system includes a plurality of wireless power transmitters configured to provide power to a plurality of wireless power receivers, and a controller configured to control the wireless power transmitters based on information of the wireless power receivers. The controller is configured to receive information of a wireless power receiver from the wireless power receiver, calculate a transmission parameter associated with a transmission efficiency of power to be provided to the wireless power receiver using the information of the wireless power receiver, and provide power to the wireless power receiver through the wireless power transmitters based on the transmission parameter.

Abstract: An antenna device for magnetic field communication may include: a first coil; a second coil; a third coil; a first capacitor connected to a 1-1 terminal of the first coil; a second capacitor connected to a 2-1 terminal of the second coil; a third capacitor connected to a 3-1 terminal of the third coil; and an input port including a first input terminal connected to a 1-2 terminal of the first coil, a 2-2 terminal of the second coil, and a 3-2 terminal of the third coil, and a second input terminal connected to the first capacitor, the second capacitor, and the third capacitor.

Abstract: A removable garment for an animal is presented. The removable garment has two parts: a base unit and a covering unit. The covering unit is larger than the base unit, and it is easily attached to and detached from the base unit. An improved version of the removable garment has three parts: a base unit, a covering unit, and an alternate covering unit. The alternate covering unit is to be used interchangeably with the covering unit; that is, the alternate covering unit is used instead of the covering unit and interacts with the base unit. The removable garment may be used anytime and specially designed to protect the pet from environmental hazards, protecting the pet from rain, cold weather, etc.

Abstract: Provided is a method for creating a virtual reality content, storing the virtual reality content in a transmission buffer, and after that, managing the transmission buffer. A server creates the virtual reality content based on user's motion information, stores the virtual reality content in the transmission buffer and is allowed to modify the virtual reality content stored in the transmission buffer based on subsequently received user's motion information, so that the most recent user's motion information can be appropriately reflected in the virtual reality content. It is possible to provide a more immersive virtual reality service.

Abstract: The present invention relates to a polishing pad, a method for producing the same, and a method of fabricating a semiconductor device using the same. According to the present invention, it is possible to prevent defects from occurring due to an inorganic component contained in a polishing layer during a polishing process, by limiting the content range of the inorganic component contained in the polishing layer. In addition, an unexpanded solid foaming agent is contained in a polishing composition for producing a polishing layer and is expanded during a curing process to form a plurality of uniform pores in the polishing layer, and the content range of the inorganic component contained in the polishing layer, thereby preventing defects from occurring during the polishing process.

Abstract: Disclosed is a resonator for expanding a transfer distance. A conical resonator includes a metal layer configured to operate according to a resonant frequency, and a dielectric layer coupled to the top or bottom of the metal layer to space the metal layer apart from another metal layer without overlap, wherein the metal layer and the dielectric layer have a Swiss-roll structure, and include an input face to which power is supplied on the bottom and an open face on the top.

Abstract: A magnetic field communication method and apparatus using a giant magnetoimpedance (GMI) magnetometer are disclosed. The magnetic field communication apparatus includes a GMI magnetometer configured to detect a first communication signal based on a received magnetic field signal, a first signal extractor configured to extract a second communication signal comprising a message signal from the first communication signal, a second signal extractor configured to extract a third communication signal by removing a magnetization frequency signal from the second communication signal, and a third signal extractor configured to extract the message signal by removing a carrier wave frequency signal from the third communication signal.

Abstract: A polishing pad sheet which provides optimized interfacial properties for the laminated structure of a polishing pad based on appropriate elasticity and high durability, and in which the polishing pad having the polishing pad sheet applied thereto not only has its intrinsic function such as the polishing rate or the like, but also is capable of realizing the function without damage even during the polishing process in a wet environment for a long time, and a polishing pad to which the polishing pad sheet is applied. The polishing pad sheet includes: a first surface which is a polishing layer attachment surface; and a second surface which is a rear surface of the first surface, wherein the first surface has a value of the following Equation 1 of 4.20 to 5.50: 4.20?(|Sv|)/Sz×P (%)?5.50.

Abstract: An atomic magnetometer, which operates in a communication system using a magnetic signal in a very low frequency (VLF) band, may comprise: a vapor cell comprising one or more alkaline metal atoms; a pump light source configured to provide circularly polarized pump beams to the vapor cell; an irradiation light source configured to provide linearly polarized irradiation beams to the vapor cell; a magnetic signal detecting unit configured to detect a magnetic signal by measuring a polarization rotation angle from the linearly polarized irradiation beam passing through the vapor cell; and a bias magnetic field control unit configured to control a bias magnetic field applied to the vapor cell.