Patents by Inventor Horacio Tellez Oliva

Horacio Tellez Oliva has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210172060
    Abstract: The invention relates to the improvement of synthesis by chemical vapour deposition, particularly diamond synthesis. It is proposed to reduce the time required for the deposition of diamond layers by compressing the plasma near the deposition substrate in order to increase the chances of collision between active species.
    Type: Application
    Filed: June 18, 2019
    Publication date: June 10, 2021
    Applicant: DIAROTECH
    Inventor: Horacio TELLEZ OLIVA
  • Patent number: 8993375
    Abstract: Method for synthesizing a material by chemical vapor deposition (CVD), according to which a plasma is created in a vacuum chamber in the vicinity of a substrate, and according to which a carbon-carrying substance and H2 are introduced into the chamber in order to produce in the chamber a gas comprising substances carrying reactive-carbon atoms in the form of unsaturated molecules or radicals from which the synthesis of said material will be performed, and in that the electromagnetic absorption and inelastic diffusion spectra of the solid material to be synthesized are used to take from these spectra the absorption frequencies that contribute to the reactions that lead to the formation of the solid material to be synthesized, and in that energetic rays are produced in the form of a photon beam carrying quantities of energy determined by each of the frequencies corresponding to said absorption and inelastic diffusion frequencies, said photon beam being injected into the plasma where, for energy states of the so
    Type: Grant
    Filed: August 1, 2011
    Date of Patent: March 31, 2015
    Assignee: Diarotech
    Inventor: Horacio Tellez Oliva
  • Publication number: 20130280860
    Abstract: Method for synthesising a material by chemical vapour deposition (CVD), according to which a plasma is created in a vacuum chamber in the vicinity of a substrate, and according to which a carbon-carrying substance and H2 are introduced into the chamber in order to produce in the chamber a gas comprising substances carrying reactive-carbon atoms in the form of unsaturated molecules or radicals from which the synthesis of said material will be performed, and in that the electromagnetic absorption and inelastic diffusion spectra of the solid material to be synthesised are used to take from these spectra the absorption frequencies that contribute to the reactions that lead to the formation of the solid material to be synthesised, and in that energetic rays are produced in the form of a photon beam carrying quantities of energy determined by each of the frequencies corresponding to said absorption and inelastic diffusion frequencies, said photon beam being injected into the plasma where, for energy states of the s
    Type: Application
    Filed: August 1, 2011
    Publication date: October 24, 2013
    Inventor: Horacio Tellez Oliva