Patents by Inventor Horst Allmendinger

Horst Allmendinger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6754307
    Abstract: The invention relates to a method for exposure control which is intended notably for dynamic X-ray examinations of an object involving a varying X-ray absorption as well as to an X-ray generator which includes an automatic exposure control unit for carrying out such a method. The method and the device are characterized notably in that an exposure kV start voltage and a maximum exposure time Tmax (for example, 100 ms) can be defined; in order to avoid motional unsharpness in the image, these variables may not be exceeded.
    Type: Grant
    Filed: May 6, 2002
    Date of Patent: June 22, 2004
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Joachim Brendler, Horst Allmendinger
  • Publication number: 20020191741
    Abstract: The invention relates to a method for exposure control which is intended notably for dynamic X-ray examinations of an object involving a varying X-ray absorption as well as to an X-ray generator which includes an automatic exposure control unit for carrying out such a method. The method and the device are characterized notably in that an exposure kV start voltage and a maximum exposure time Tmax (for example, 100 ms) can be defined; in order to avoid motional unsharpness in the image, these variables may not be exceeded.
    Type: Application
    Filed: May 6, 2002
    Publication date: December 19, 2002
    Inventors: Joachim Brendler, Horst Allmendinger
  • Patent number: 6067343
    Abstract: The invention relates to an X-ray device which includes a primary diaphragm device (3) for limiting the X-ray beam and a control circuit (10) for automatic exposure control, which control circuit includes a detector (9) with at least one measuring field (31) which measures the X-ray dose rate. Whereas in the case of customary exposure control systems the X-ray dose is increased when the radiation beam is strongly limited so that parts of the measuring field (31) are not exposed, which could lead to overexposed X-ray images, the X-ray device according to the invention is provided with means (12, 14, 15, 16, 17) for determining a correction value (K) which is dependent on the dimensions of the exposed area (33) of the measuring field (31) and acts on the control circuit (10) in such a manner that an increase of the X-ray dose is even avoided in the case of a partly non-exposed measuring field (31).
    Type: Grant
    Filed: January 20, 1998
    Date of Patent: May 23, 2000
    Assignee: U.S. Philips Corporation
    Inventors: Joachim Brendler, Horst Allmendinger