Patents by Inventor Ho Seong Yoo

Ho Seong Yoo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11104848
    Abstract: Disclosed is an etching solution for a silicon substrate. More specifically, an etching solution for a silicon substrate is disclosed in which a concentration of a silane compound (silicon) in the etching solution for the silicon substrate is adjusted to improve an etching selectivity of a silicon nitride film relative to a silicon oxide film during etching of the nitride film.
    Type: Grant
    Filed: January 22, 2020
    Date of Patent: August 31, 2021
    Assignee: OCI COMPANY LTD.
    Inventors: Ho-Seong Yoo, Myung-Hyun Kim, Jun-Eun Lee, Pyong-Hwa Jang
  • Publication number: 20200239771
    Abstract: Disclosed is an etching solution for a silicon substrate. More specifically, an etching solution for a silicon substrate is disclosed in which a concentration of a silane compound (silicon) in the etching solution for the silicon substrate is adjusted to improve an etching selectivity of a silicon nitride film relative to a silicon oxide film during etching of the nitride film.
    Type: Application
    Filed: January 22, 2020
    Publication date: July 30, 2020
    Inventors: Ho-Seong YOO, Myung-Hyun KIM, Jun-Eun LEE, Pyong-Hwa JANG
  • Patent number: 5103013
    Abstract: 2-(1,3-Dithietan-2-ylidene)-2-[N-(subsittuted)carbamoyl]acetate esters and 2-(1,3-dithiolan-2-ylidene)-2-[N-(substituted) carbamoyl]acetate esters, having potent therapeutic and prophylactic effect for hepatic disorders, are provided.
    Type: Grant
    Filed: October 23, 1989
    Date of Patent: April 7, 1992
    Assignee: Yuhan Corporation, Ltd.
    Inventors: Choong S. Kim, Jeong S. Chae, Ho Seong Yoo, Jong W. Lee, Jae G. Park, Jeong W. Lee