Abstract: A thin film transistor, a controlling method thereof, an array substrate and a display device. The thin film transistor includes: a substrate; and a gate electrode, an active layer, a source and a drain on the substrate. The source comprises two source electrodes electrically connected with each other; the drain comprises two drain electrodes electrically connected with each other, and the two drain electrodes are between the two source electrodes; and the active layer comprises primary channels between adjacent source electrodes and drain electrodes and a secondary channel between the two drain electrodes.

Abstract: A patterning method employing a half tone mask includes the steps of: successively forming a first thin film layer, a second thin film layer and a photoresist thin film layer on a substrate; exposing and developing the photoresist thin film layer by using a half tone mask plate; performing a first etching on the substrate that is exposed and developed; performing a second etching on the substrate that has been subject to the first etching; passivating the substrate that has been subject to the first etching; ashing the substrate that has been passivated; performing a third etching on the substrate that has been subject to the ashing and the second etching; and, stripping the substrate that has been subject to the third etching.

Abstract: A patterning method employing a half tone mask includes the steps of: successively forming a first thin film layer, a second thin film layer and a photoresist thin film layer on a substrate; exposing and developing the photoresist thin film layer by using a half tone mask plate; performing a first etching on the substrate that is exposed and developed; performing a second etching on the substrate that has been subject to the first etching; passivating the substrate that has been subject to the first etching; ashing the substrate that has been passivated; performing a third etching on the substrate that has been subject to the ashing and the second etching; and, stripping the substrate that has been subject to the third etching.