Patents by Inventor Houk Jang
Houk Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12268106Abstract: A nonvolatile memory device includes a resistance switching layer, a gate on the resistance switching layer, a gate oxide layer between the resistance switching layer and the gate, and a source and a drain, spaced apart from each other, on the resistance switching layer. A resistance value of the resistance switching layer is changed based on an illumination of light irradiated onto the resistance switching layer and is maintained as a changed resistance value.Type: GrantFiled: February 10, 2023Date of Patent: April 1, 2025Assignees: Samsung Electronics Co., Ltd., President and Fellows Of Harvard CollegeInventors: Minhyun Lee, Houk Jang, Donhee Ham, Chengye Liu, Henry Hinton, Haeryong Kim, Hyeonjin Shin
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Patent number: 12147888Abstract: Disclosed is a neural computer including an image sensor capable of controlling a photocurrent. The neural computer according to an embodiment includes a preprocessor configured to receive an image and generate a feature map for the received image; a flattening unit configured to transform the feature map generated by the preprocessor into tabular data to provide data output; and an image classifier configured to classify images received through the preprocessor by using the data output by the flattening unit as an input value. The preprocessor includes an optical signal processor configured to receive the image and generate the feature map.Type: GrantFiled: October 13, 2021Date of Patent: November 19, 2024Assignees: Samsung Electronics Co., Ltd., President and Fellows of Harvard CollegeInventors: Changhyun Kim, Houk Jang, Henry Julian Hinton, Hyeonjin Shin, Minhyun Lee, Donhee Ham
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Patent number: 11985910Abstract: Provided are memristors and neuromorphic devices including the memristors. A memristor includes a lower electrode and an upper electrode that are apart from each other and first and second two-dimensional material layers that are arranged between the lower electrode and the upper electrode and stacked without a chemical bond therebetween.Type: GrantFiled: June 9, 2022Date of Patent: May 14, 2024Assignee: Samsung Electronics Co., Ltd.Inventors: Minhyun Lee, Dovran Amanov, Renjing Xu, Houk Jang, Haeryong Kim, Hyeonjin Shin, Yeonchoo Cho, Donhee Ham
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Publication number: 20230189673Abstract: A nonvolatile memory device includes a resistance switching layer, a gate on the resistance switching layer, a gate oxide layer between the resistance switching layer and the gate, and a source and a drain, spaced apart from each other, on the resistance switching layer. A resistance value of the resistance switching layer is changed based on an illumination of light irradiated onto the resistance switching layer and is maintained as a changed resistance value.Type: ApplicationFiled: February 10, 2023Publication date: June 15, 2023Applicants: Samsung Electronics Co., Ltd., President and Fellows Of Harvard CollegeInventors: Minhyun LEE, Houk JANG, Donhee HAM, Chengye LIU, Henry Julian HINTON, Haeryong KIM, Hyeonjin SHIN
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Patent number: 11600774Abstract: A nonvolatile memory device includes a resistance switching layer, a gate on the resistance switching layer, a gate oxide layer between the resistance switching layer and the gate, and a source and a drain, spaced apart from each other, on the resistance switching layer. A resistance value of the resistance switching layer is changed based on an illumination of light irradiated onto the resistance switching layer and is maintained as a changed resistance value.Type: GrantFiled: November 10, 2020Date of Patent: March 7, 2023Assignees: Samsung Electronics Co., Ltd., President and Fellows Of Harvard CollegeInventors: Minhyun Lee, Houk Jang, Donhee Ham, Chengye Liu, Henry Julian Hinton, Haeryong Kim, Hyeonjin Shin
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Publication number: 20220320425Abstract: Provided are memristors and neuromorphic devices including the memristors. A memristor includes a lower electrode and an upper electrode that are apart from each other and first and second two-dimensional material layers that are arranged between the lower electrode and the upper electrode and stacked without a chemical bond therebetween.Type: ApplicationFiled: June 9, 2022Publication date: October 6, 2022Applicants: Samsung Electronics Co., Ltd., President and Fellows Of Harvard CollegeInventors: Minhyun LEE, Dovran AMANOV, Renjing XU, Houk JANG, Haeryong KIM, Hyeonjin SHIN, Yeonchoo CHO, Donhee HAM
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Patent number: 11374171Abstract: Provided are memristors and neuromorphic devices including the memristors. A memristor includes a lower electrode and an upper electrode that are apart from each other and first and second two-dimensional material layers that are arranged between the lower electrode and the upper electrode and stacked without a chemical bond therebetween.Type: GrantFiled: March 19, 2020Date of Patent: June 28, 2022Assignees: Samsung Electronics Co., Ltd., President and Fellows of Harvard CollegeInventors: Minhyun Lee, Dovran Amanov, Renjing Xu, Houk Jang, Haeryong Kim, Hyeonjin Shin, Yeonchoo Cho, Donhee Ham
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Publication number: 20220147799Abstract: Disclosed is a neural computer including an image sensor capable of controlling a photocurrent. The neural computer according to an embodiment includes a preprocessor configured to receive an image and generate a feature map for the received image; a flattening unit configured to transform the feature map generated by the preprocessor into tabular data to provide data output; and an image classifier configured to classify images received through the preprocessor by using the data output by the flattening unit as an input value. The preprocessor includes an optical signal processor configured to receive the image and generate the feature map.Type: ApplicationFiled: October 13, 2021Publication date: May 12, 2022Applicants: Samsung Electronics Co., Ltd., President and Fellows Of Harvard CollegeInventors: Changhyun KIM, Houk JANG, Henry Julian HINTON, Hyeonjin SHIN, Minhyun LEE, Donhee HAM
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Publication number: 20210151678Abstract: A nonvolatile memory device includes a resistance switching layer, a gate on the resistance switching layer, a gate oxide layer between the resistance switching layer and the gate, and a source and a drain, spaced apart from each other, on the resistance switching layer. A resistance value of the resistance switching layer is changed based on an illumination of light irradiated onto the resistance switching layer and is maintained as a changed resistance value.Type: ApplicationFiled: November 10, 2020Publication date: May 20, 2021Applicants: Samsung Electronics Co., Ltd., President and Fellows Of Harvard CollegeInventors: Minhyun LEE, Houk JANG, Donhee HAM, Chengye LIU, Henry HINTON, Haeryong KIM, Hyeonjin SHIN
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Publication number: 20200395540Abstract: Provided are memristors and neuromorphic devices including the memristors. A memristor includes a lower electrode and an upper electrode that are apart from each other and first and second two-dimensional material layers that are arranged between the lower electrode and the upper electrode and stacked without a chemical bond therebetween.Type: ApplicationFiled: March 19, 2020Publication date: December 17, 2020Applicants: Samsung Electronics Co., Ltd., President and Fellows Of Harvard CollegeInventors: Minhyun LEE, Dovran AMANOV, Renjing XU, Houk JANG, Haeryong KIM, Hyeonjin SHIN, Yeonchoo CHO, Donhee HAM
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Patent number: 9371234Abstract: The present invention relates to a method for forming graphene at a low temperature, to a method for direct transfer of graphene using same, and to a graphene sheet. The method for forming graphene at a low temperature comprises supplying a carbon-source-containing gas to a metal catalyst layer for graphene growth formed on a substrate, and forming graphene at a low temperature of 500° C. or less by means of inductively coupled plasma-chemical vapor deposition (ICP-CVD).Type: GrantFiled: July 15, 2011Date of Patent: June 21, 2016Assignees: Graphene Square, Inc., Hanwha Techwin Co., Ltd.Inventors: Byung Hee Hong, Jong-Hyun Ahn, Ji Beom Yoo, Su Kang Bae, Myung Hee Jung, Houk Jang, Youngbin Lee, Sang Jin Kim
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Publication number: 20130187097Abstract: The present invention relates to a method for forming graphene at a low temperature, to a method for direct transfer of graphene using same, and to a graphene sheet. The method for forming graphene at a low temperature comprises supplying a carbon-source-containing gas to a metal catalyst layer for graphene growth formed on a substrate, and forming graphene at a low temperature of 500° C. or less by means of inductively coupled plasma-chemical vapor deposition (ICP-CVD).Type: ApplicationFiled: July 15, 2011Publication date: July 25, 2013Applicants: SAMSUNG TECHWIN CO., LTD., SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATIONInventors: Byung Hee Hong, Jong-Hyun Ahn, Ji Beom Yoo, Su Kang Bae, Myung Hee Jung, Houk Jang, Youngbin Lee, Sang Jin Kim