Abstract: This application provides a dynamic color filter (CF) macroscopic inspection system and method. The dynamic CF macroscopic inspection system includes: a color film coating unit, configured to coat color filters on a CF glass substrate; a color film developing unit, configured to develop the CF glass substrate; a color film baking unit, configured to bake the CF glass substrate; a color film macroscopic inspection unit, configured to inspect a visual macroscopic abnormality of the CF glass substrate; a color film colorimeter unit, configured to perform a chrominance detection on the CF glass substrate; and at least one conveyor belt, including a first conveyor belt and a second conveyor belt, connected between the color film coating unit, the color film developing unit, the color film baking unit, the color film macroscopic inspection unit, and the color film colorimeter unit, and configured to transport the CF glass substrate.

Abstract: A daily checking and calibrating method includes the following steps. Step (1) is for detecting a state of the length measuring machine at a predetermined daily check time. Step (2) is for stopping the transportation of substrates upon determining the length measuring machine is in an idle state. Step (3) is for measuring coordinates of positioning marks on a substrate-carrying platform to generate a measured data file and comparing the measured coordinates of the positioning marks with predetermined coordinates. Step (4) is for automatically calculating a calibration value when a difference between the measured coordinates of the positioning marks and the predetermined coordinates is smaller than a predetermined value and updating the calibration value to a coordinate parameter file to complete automatic calibration. Otherwise, an alarm is activated.

Abstract: A daily checking and calibrating method of a length measuring machine is disclosed. The method includes the following steps. Step (1) is for detecting a state of the length measuring machine at a predetermined daily check time. Step (2) is for stopping the transportation of substrates upon determining the length measuring machine is in an idle state. Step (3) is for measuring coordinates of positioning marks on a substrate-carrying platform to generate a measured data file and comparing the measured coordinates of the positioning marks with predetermined standard coordinates. Step (4) is for automatically calculating a calibration value when a difference between the measured coordinates of the positioning marks and the predetermined standard coordinates is smaller than a predetermined value and updating the calibration value to a coordinate parameter file to complete automatic calibration. Otherwise, an alarm is activated.

Abstract: A nozzle cleaning device and a coater provided with the nozzle cleaning device are provided, the nozzle cleaning device comprise a cleaner, a vacuum pipe and a vacuum pump; the cleaner has a recessed hole coinciding in shape with the nozzle of the coater for receiving the nozzle of the coater, and the inner wall of the recessed hole is provided with a plurality of through-holes; one end of the vacuum pipe is connected to said a plurality of through-holes, and the other end of the vacuum pipe is connected to the vacuum pump. The nozzle cleaning device of the present invention can be used conveniently to remove the photoresist residue so as to clean the nozzle, which effectively improves the product yield and the production efficiency, and reduces the cost due to needing no expensive nanomaterials.