Patents by Inventor Howard A. Sidaway

Howard A. Sidaway has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers
    Patent number: 7608382
    Abstract: A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: October 27, 2009
    Assignees: Promerus LLC, International Business Machines Corporation
    Inventors: Larry F. Rhodes, Chun Chang, Leah J. Langsdorf, Howard A. Sidaway, Hiroshi Ito
  • Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers
    Publication number: 20080124651
    Abstract: A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties.
    Type: Application
    Filed: October 31, 2007
    Publication date: May 29, 2008
    Applicants: International Business Machines Corporation, Promerus LLC
    Inventors: Larry F. Rhodes, Chun Chang, Leah J. Langsdorf, Howard A. Sidaway, Hiroshi Ito
  • Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers
    Patent number: 7341816
    Abstract: A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: March 11, 2008
    Assignees: Promerus, LLC, International Business Machines Corporation
    Inventors: Larry F. Rhodes, Chun Chang, Leah J. Langsdorf, Howard A. Sidaway, Hiroshi Ito
  • Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers
    Publication number: 20040166436
    Abstract: A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties.
    Type: Application
    Filed: February 20, 2004
    Publication date: August 26, 2004
    Inventors: Larry F. Rhodes, Chun Chang, Leah J. Langsdorf, Howard A. Sidaway, Hiroshi Ito