Abstract: An example system is for testing a device under test (DUT) that includes a first core and a second core. The system includes channels in parallel for connecting to a number of pins on the DUT. The channels are for sending test data to the DUT and for receiving measurement data from the DUT based on the test data. The measurement data includes time-division-multiplexed (TDM) data comprised of successive data packets received from the DUT over the channels as part of a bitstream. Each data packet includes a first number of bits from the first core and a second number of bits from the second core. Circuitry associated with the channels is configured to compare the measurement data with expected data, and to determine pass/fail status for the first core and for the second core based on the comparison.

Abstract: An example system includes first memory, second memory having a greater areal density than the first memory, and a logic circuit configured to move some test data from the second memory to the first memory while at least one of (i) reading other test data from the first memory or (ii) processing the other test data. The logic circuit is configured to process the other test data prior to output along a test channel. The test channel leads to a device under test (DUT) to be tested.

Abstract: A tandem OLED display is provided, including a substrate backplane, an anode layer, at least two stacked OLED layers, each OLED layer comprising a plurality of pixels, at least one charge generation layer (CGL), wherein each CGL is disposed between two adjacent stacked OLED layers, and a cathode layer. At least one of the CGLs is patterned wherein a pattern provides gaps between each of the plurality of pixels.

Abstract: A tandem OLED device is provided, including an anode, a cathode, at least two electroluminescent units disposed between the anode and the cathode, and an alloy thin film disposed between the two electroluminescent units.

Abstract: Systems and methods for performing direct patterning of a material on a substrate with high fidelity to a desired pattern are presented. A pattern of apertures of a shadow mask is compensated to accommodate a range of propagation angles in a vapor plume used to deposit material onto the substrate through the shadow mask. A shadow mask in accordance with the present disclosure includes an aperture pattern in which aperture position is shifted inward toward the center of the shadow mask by an amount based on the distance of the aperture from the center of the shadow mask. As a result, vaporized material passing through an aperture at a non-normal angle deposits onto the substrate at its proper desired location.

Abstract: A direct patterning deposition mask for OLED deposition is provided where the mask includes a sapphire substrate; and a Silicon Nitride (SiN) membrane. The sapphire substrate thickness may be between 0.7 and 2 mm. The sapphire substrate may have a diameter in the range of 200 mm diameter to 300 mm diameter. Warpage of the substrate is preferably less than <10 um.

Abstract: A system for deposition of evaporated material on a substrate is provided. The substrate has a central axis. The system includes an evaporation vacuum chamber, at least one nozzle assembly, and a shadow mask. The nozzle assembly has a three-point plurality of point evaporation sources disposed adjacent to the central axis of the substrate and at a distance from the substrate whereby the nozzle assembly provides for molecules of evaporated material to arrive at the substrate at an incident angle of less than or equal to 5 degrees.

Abstract: An example system includes first memory, second memory having a greater areal density than the first memory, and a logic circuit configured to move some test data from the second memory to the first memory while at least one of (i) reading other test data from the first memory or (ii) processing the other test data. The logic circuit is configured to process the other test data prior to output along a test channel. The test channel leads to a device under test (DUT) to be tested.

Abstract: A method for visually guided storage array installation is disclosed. The method includes receiving an installation plan for a storage array and determining a component of the storage array that is specified in the installation plan. One or more visual indicators that are associated with the component of the storage array are displayed to indicate a status corresponding to executing a portion of the installation plan.

Abstract: Embodiments provided herein describe methods and systems for forming high-k dielectric materials, as well as devices that utilize such materials. A property of a high-k dielectric material is selected. A value of the selected property of the high-k dielectric material is selected. A chemical composition of the high-k dielectric material is selected from a plurality of chemical compositions of the high-k dielectric material. The selected chemical composition of the high-k dielectric material includes an amount of nitridation associated with the selected value of the selected property of the high-k dielectric material. The high-k dielectric material is formed with the selected chemical composition.

Abstract: Embodiments provided herein describe storage capacitors for active matrix displays and methods for making such capacitors. A substrate is provided. A bottom electrode is formed above the substrate. A dielectric layer is formed above the bottom electrode. A top electrode is formed above the dielectric layer. A layer including an amorphous or crystalline material may be formed between the dielectric layer and the top electrode. The bottom electrode may have a thickness of at least 1000 ?, be formed in a gaseous environment of at least 95% argon, and/or not undergo an annealing process before the formation of a dielectric layer above the bottom electrode. The dielectric layer may include a nitrided high-k dielectric material.

Abstract: A semiconductor device-under-test (DUT) may be tested by an automated test system that processes test programs specifying a number of edges per tester cycle that may be greater than the number of edges the tester is capable of generating. The test system may include circuitry that reduces the number of edges in each cycle of a test program based on data specifying operation of the tester in that cycle and/or a prior cycle. Such a reduction simplifies the circuitry required to implement an edge generator by reducing the total number of timing verniers per channel. Nonetheless, flexibility in programming the test system is retained.

Abstract: A semiconductor device-under-test (DUT) may be tested by an automated test system that processes test programs specifying a number of edges per tester cycle that may be greater than the number of edges the tester is capable of generating. The test system may include circuitry that reduces the number of edges in each cycle of a test program based on data specifying operation of the tester in that cycle and/or a prior cycle. Such a reduction simplifies the circuitry required to implement an edge generator by reducing the total number of timing verniers per channel. Nonetheless, flexibility in programming the test system is retained.

Abstract: A mechanism for removing probe covers from an ear thermometer includes a fastening portion, a connecting portion and a pushing portion. The fastening portion is mounted to the thermometer at a portion near the measuring probe. The connecting portion has one end connected to the fastening portion and the other end connected to the pushing portion. The pushing portion is located at rear end of the probe cover so that as the connecting portion or the pushing portion being pressed by user, the probe cover is removed from the probe.

Abstract: Intracorporeal and other elongate medical devices such as guidewires, catheters and the like can be formed with an ionomeric polymer sleeve or jacket covering at least a portion of the elongate medical device to form a hydrophilic surface thereon. The ionomeric polymer sleeve or jacket can be hydrophilic and can eliminate the need for subsequent application of a traditional hydrophilic coating such as a hydrogel.