Patents by Inventor Howard Smith Landis
Howard Smith Landis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8288821Abstract: A structure, and a method for forming the same. The structure includes a semiconductor substrate which includes a top substrate surface, a buried dielectric layer on the top substrate surface, N active semiconductor regions on the buried dielectric layer, N active devices on the N active semiconductor regions, a plurality of dummy regions on the buried dielectric layer, a protection layer on the N active devices and the N active semiconductor regions, but not on the plurality of dummy regions. The N active devices comprise first active regions which comprise a first material. The plurality of dummy regions comprise first dummy regions which comprise the first material. A first pattern density of the first active regions and the first dummy regions is uniform across the structure. A trench in the buried dielectric layer such that side walls of the trench are aligned with the plurality of dummy regions.Type: GrantFiled: August 26, 2009Date of Patent: October 16, 2012Assignee: International Business Machines CorporationInventors: Alan Bernard Botula, David S. Collins, Alvin Jose Joseph, Howard Smith Landis, James Albert Slinkman
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Patent number: 8176447Abstract: A method of forming a mask. The method includes providing design information of a design layer. The design layer includes M original design features and N original dummy features. The method further includes (i) creating a cluster of P representative dummy features, P being a positive integer less than N, (ii) performing OPC for the cluster of the P representative dummy features but not for the N original dummy features, resulting in P OPC-applied representative dummy features, and (iii) forming the mask including N mask dummy features. The N mask dummy features are identical. Each mask dummy feature of the N mask dummy features of the mask has an area which is a function of at least an area of an OPC-applied representative dummy feature of the P OPC-applied representative dummy features. The N mask dummy features have the same relative positions as the N original dummy features.Type: GrantFiled: June 2, 2010Date of Patent: May 8, 2012Assignee: International Business Machines CorporationInventors: Amit Kumar, Howard Smith Landis, Jeanne-Tania Sucharitaves
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Patent number: 8089126Abstract: Methods and structures for improving substrate loss and linearity in SOI substrates. The methods include forming damaged crystal structure regions under the buried oxide layer of SOI substrates and the structures included damaged crystal structure regions under the buried oxide layer of the SOI substrate.Type: GrantFiled: July 22, 2009Date of Patent: January 3, 2012Assignee: International Business Machines CorporationInventors: Alan Bernard Botula, David S. Collins, Alvin Jose Joseph, Howard Smith Landis, James Albert Slinkman, Anthony K. Stamper
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Publication number: 20110018060Abstract: Methods and structures for improving substrate loss and linearity in SOI substrates. The methods include forming damaged crystal structure regions under the buried oxide layer of SOI substrates and the structures included damaged crystal structure regions under the buried oxide layer of the SOI substrate.Type: ApplicationFiled: July 22, 2009Publication date: January 27, 2011Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Alan Bernard Botula, David S. Collins, Alvin Jose Joseph, Howard Smith Landis, James Albert Slinkman, Anthony K. Stamper
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Publication number: 20100242012Abstract: A method of forming a mask. The method includes providing design information of a design layer. The design layer includes M original design features and N original dummy features. The method further includes (i) creating a cluster of P representative dummy features, P being a positive integer less than N, (ii) performing OPC for the cluster of the P representative dummy features but not for the N original dummy features, resulting in P OPC-applied representative dummy features, and (iii) forming the mask including N mask dummy features. The N mask dummy features are identical. Each mask dummy feature of the N mask dummy features of the mask has an area which is a function of at least an area of an OPC-applied representative dummy feature of the P OPC-applied representative dummy features. The N mask dummy features have the same relative positions as the N original dummy features.Type: ApplicationFiled: June 2, 2010Publication date: September 23, 2010Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Amit Kumar, Howard Smith Landis, Jeanne-Tania Sucharitaves
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Publication number: 20100230752Abstract: A structure, and a method for forming the same. The structure includes a semiconductor substrate which includes a top substrate surface, a buried dielectric layer on the top substrate surface, N active semiconductor regions on the buried dielectric layer, N active devices on the N active semiconductor regions, a plurality of dummy regions on the buried dielectric layer, a protection layer on the N active devices and the N active semiconductor regions, but not on the plurality of dummy regions. The N active devices comprise first active regions which comprise a first material. The plurality of dummy regions comprise first dummy regions which comprise the first material. A first pattern density of the first active regions and the first dummy regions is uniform across the structure. A trench in the buried dielectric layer such that side walls of the trench are aligned with the plurality of dummy regions.Type: ApplicationFiled: August 26, 2009Publication date: September 16, 2010Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Alan Bernard Botula, David S. Collins, Alvin Jose Joseph, Howard Smith Landis, James Albert Slinkman
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Patent number: 7791166Abstract: A structure and a method for forming the same. The structure includes (a) a substrate which includes a top substrate surface which defines a reference direction perpendicular to the top substrate surface, (b) N semiconductor regions on the substrate, and (c) P semiconductor regions on the substrate, N and P being positive integers. The N semiconductor regions comprise dopants. The P semiconductor regions do not comprise dopants. The structure further includes M interconnect layers on top of the substrate, the N semiconductor regions, and the P semiconductor regions, M being a positive integer. The M interconnect layers include an inductor. (i) The N semiconductor regions do not overlap and (ii) the P semiconductor regions overlap the inductor in the reference direction. A plane perpendicular to the reference direction and intersecting a semiconductor region of the N semiconductor regions intersects a semiconductor region of the P semiconductor regions.Type: GrantFiled: May 4, 2007Date of Patent: September 7, 2010Assignee: International Business Machines CorporationInventors: Brent Alan Anderson, Howard Smith Landis, Edward Joseph Nowak
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Patent number: 7739648Abstract: Structures and methods for forming the same. The method includes providing design information of a design layer. The design layer includes M original design features and N original dummy features. The method further includes (i) creating a cluster of P representative dummy features, P being a positive integer less than N, (ii) performing OPC for the cluster of the P representative dummy features but not for the N original dummy features, resulting in P OPC-applied representative dummy features, and (iii) forming the mask including N mask dummy features. The N mask dummy features are identical. Each mask dummy feature of the N mask dummy features of the mask has an area which is a function of at least an area of an OPC-applied representative dummy feature of the P OPC-applied representative dummy features. The N mask dummy features have the same relative positions as the N original dummy features.Type: GrantFiled: February 12, 2007Date of Patent: June 15, 2010Assignee: International Business Machines CorporationInventors: Amit Kumar, Howard Smith Landis, Jeanne-Tania Sucharitaves
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Publication number: 20080272457Abstract: A structure and a method for forming the same. The structure includes (a) a substrate which includes a top substrate surface which defines a reference direction perpendicular to the top substrate surface, (b) N semiconductor regions on the substrate, and (c) P semiconductor regions on the substrate, N and P being positive integers. The N semiconductor regions comprise dopants. The P semiconductor regions do not comprise dopants. The structure further includes M interconnect layers on top of the substrate, the N semiconductor regions, and the P semiconductor regions, M being a positive integer. The M interconnect layers include an inductor. (i) The N semiconductor regions do not overlap and (ii) the P semiconductor regions overlap the inductor in the reference direction. A plane perpendicular to the reference direction and intersecting a semiconductor region of the N semiconductor regions intersects a semiconductor region of the P semiconductor regions.Type: ApplicationFiled: May 4, 2007Publication date: November 6, 2008Inventors: Brent Alan Anderson, Howard Smith Landis, Edward Joseph Nowak
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Publication number: 20080195995Abstract: Structures and methods for forming the same. The method includes providing design information of a design layer. The design layer includes M original design features and N original dummy features. The method further includes (i) creating a cluster of P representative dummy features, P being a positive integer less than N, (ii) performing OPC for the cluster of the P representative dummy features but not for the N original dummy features, resulting in P OPC-applied representative dummy features, and (iii) forming the mask including N mask dummy features. The N mask dummy features are identical. Each mask dummy feature of the N mask dummy features of the mask has an area which is a function of at least an area of an OPC-applied representative dummy feature of the P OPC-applied representative dummy features. The N mask dummy features have the same relative positions as the N original dummy features.Type: ApplicationFiled: February 12, 2007Publication date: August 14, 2008Inventors: Amit Kumar, Howard Smith Landis, Jeanne-Tania Sucharitaves
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Patent number: 6399976Abstract: Crystal lattice dislocations in material surrounding trench capacitors and other trench structures are avoided by alteration of stresses such as decreasing compressive stresses and/or development of persistent tensile forces within material deposited in the trench and thus at the material interface formed by the trench. Such alteration of stresses is achieved by volume reduction of a film deposited in the trench. The material is preferably a hydrogenated nitride of silicon, boron or silicon-carbon alloy which may be reduced in volume by partial or substantially complete dehydrogenation during subsequent heat treatment at temperatures where the film will exhibit substantial creep resistance. The amount of volume reduction can be closely controlled by control of concentration of hydrogen or other gas or volatile material in the film.Type: GrantFiled: June 6, 1995Date of Patent: June 4, 2002Assignee: International Business Machines CorporationInventors: Peter John Geiss, Howard Smith Landis, Son Van Nguyen
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Patent number: 6069049Abstract: Crystal lattice dislocations in material surrounding trench capacitors and other trench structures are avoided by alteration of stresses such as decreasing compressive stresses and/or development of persistent tensile forces within material deposited in the trench and thus at the material interface formed by the trench. Such alteration of stresses is achieved by volume reduction of a film deposited in the trench. The material is preferably a hydrogenated nitride of silicon, boron or silicon-carbon alloy which may be reduced in volume by partial or substantially complete dehydrogenation during subsequent heat treatment at temperatures where the film will exhibit substantial creep resistance. The amount of volume reduction can be closely controlled by control of concentration of hydrogen or other gas or volatile material in the film.Type: GrantFiled: October 8, 1997Date of Patent: May 30, 2000Assignee: International Business Machines CorporationInventors: Peter John Geiss, Howard Smith Landis, Son Van Nguyen