Abstract: The present invention provides a metallization scheme, a method for manufacturing the metallization scheme, and an integrated circuit including the metallization scheme. In one aspect, the metallization scheme (300) includes a protective layer (320) located over a substrate (310), and a conductive layer (330) located over the protective layer (320). The metallization scheme (300) further includes a stress-reducing low-modulus material (340) located between the protective layer (320) and the conductive layer (330).

Abstract: The present invention provides a metallization scheme, a method for manufacturing the metallization scheme, and an integrated circuit including the metallization scheme. In one aspect, the metallization scheme (300) includes a protective layer (320) located over a substrate (310), and a conductive layer (330) located over the protective layer (320). The metallization scheme (300) further includes a stress-reducing low-modulus material (340) located between the protective layer (320) and the conductive layer (330).

Abstract: A metal structure for a contact pad of a wafer or substrate (101), which have copper interconnecting traces (102) surrounded by a barrier metal layer (103). The wafer or substrate is protected by an insulating overcoat (104). In the structure, the barrier metal layer is selectively exposed by a window (110) in the insulating overcoat. A layer of copper (105), adherent to the barrier metal, conformally covers the exposed barrier metal. Preferably, the copper layer is deposited by sputtering using a shadow mask. A layer of nickel (106) is adherent to the copper layer and a layer of noble metal (106) is adherent to the nickel layer. The noble metal may be palladium, or gold, or a palladium layer with an outermost gold layer. Preferably, the nickel and noble metal layers are deposited by electroless plating.

Abstract: A metal structure for a contact pad of a wafer or substrate (101), which have copper interconnecting traces (102) surrounded by a barrier metal layer (103). The wafer or substrate is protected by an insulating overcoat (104). In the structure, the barrier metal layer is selectively exposed by a window (110) in the insulating overcoat. A layer of copper (105), adherent to the barrier metal, conformally covers the exposed barrier metal. Preferably, the copper layer is deposited by sputtering using a shadow mask. A layer of nickel (106) is adherent to the copper layer and a layer of noble metal (106) is adherent to the nickel layer. The noble metal may be palladium, or gold, or a palladium layer with an outermost gold layer. Preferably, the nickel and noble metal layers are deposited by electroless plating.

Abstract: The present invention provides a metallization scheme, a method for manufacturing the metallization scheme, and an integrated circuit including the metallization scheme. In one aspect, the metallization scheme (300) includes a protective layer (320) located over a substrate (310), and a conductive layer (330) located over the protective layer (320). The metallization scheme (300) further includes a stress-reducing low-modulus material (340) located between the protective layer (320) and the conductive layer (330).

Abstract: A semiconductor device has a semiconductor chip with a periphery and an IC organized in a core portion and a peripheral portion. The IC has a top level of interconnecting metal traces (510) from the peripheral portion to the core portion; the traces are covered by an insulating overcoat (520) which has peripheral windows to expose bond pads. The circuit further has at least one level of metal lines (511) on top of the insulating overcoat; the lines lead from the chip periphery towards the chip core, wherein each line (511) is substantially parallel to one of the traces (510) underneath the insulating overcoat and vertically aligned therewith. After assembling the chip onto a leadframe with segments (504), bonding wires (502) connect the bond pads (510a) and the metal lines (511a) with the segments.

Abstract: A device comprising a workpiece (401) with a surface (401a) including a center (402) and an array of bond pads (420), further an array of interconnects (405) of uniform height. Each of these interconnects comprises an elongated wire loop, which has both wire ends (440, 450) attached to one of the bond pads, respectively, and its major diameter (460) approximately normal to the workpiece surface. A substantial number of the loops has an orientation approximately normal to the vector (410) from the workpiece center to the respective bond pad; this number includes more than 30% of the loops located along the workpiece perimeter and more than 10% of the total loops. Examples of workpieces are a semiconductor device, an integrated circuit (IC) chip, and a semiconductor device package.

Abstract: A robust, reliable and low-cost metal structure and process enabling electrical wire/ribbon connections to the interconnecting copper metallization of integrated circuits. The structure comprises a layer of barrier metal that resists copper diffusion, deposited on the non-oxidized copper surface in a thickness such that the barrier layer reduces the diffusion of copper at 250° C. by more than 80% compared with the absence of the barrier metal. The structure further comprises an outermost bondable layer which reduces the diffusion of the barrier metal at 250° C. by more than 80% compared with the absence of the bondable metal. Finally, a metal wire is bonded to the outermost layer for metallurgical connection. The barrier metal is selected from a group consisting of nickel, cobalt, chromium, molybdenum, titanium, tungsten, and alloys thereof. The outermost bondable metal layer is selected from a group consisting of gold, platinum, and silver.