Abstract: To provide a polishing tool for a plastic lens, a method of polishing a plastic lens and a method of manufacturing a plastic lens, capable of suppressing a deterioration of a polishing efficiency while reducing a cost required for treating a polishing waste liquid generated during polishing applied to the plastic lens, wherein the polishing tool is used for adjusting and completing an optical surface of the plastic lens, and is composed of a single layer in which abrasive grains made of crystalline alumina are uniformly dispersed and fixed to a substance mainly composed of polyurethane resin having foamability.

Abstract: An imaging unit includes an incident-side optical system; an incident-side prism including a first incident surface which is orthogonal to the optical axis of the incident-side optical system, a first reflecting surface and a first exit surface; an exit-side prism including a second incident surface, a second reflecting surface and a second exit surface which is orthogonal to the optical axis and from which light rays reflected by the second reflecting surface emerge; and an image sensor which receives light rays that emerge from the second exit surface. The first incident surface is positioned closer to the photographic object than the second exit surface. A deflection angle of parallel light rays, on the optical axis, at the first reflecting surface is greater than 90°, and a deflection angle of the parallel light rays at the second reflecting surface is smaller than 90°.

Abstract: An artificial cartilage comprising 15-95% by mass of collagen, 4.9-70% by mass of proteoglycan, and 0.1-20% by mass of hyaluronic acid.

Abstract: A zoom lens system includes first through fourth lens groups. The third lens group includes at least two positive single lens elements, wherein, with respect to the object side, one of a second or subsequently rearward positive single lens element thereof constitutes an image-shake correcting lens element. The following conditions (1) and (2) are satisfied: 0<De<15??(1), and 2.0<1/((1?G3Rmt)Fmt)<3.0??(2), wherein, at the long focal length extremity when focused on an object at infinity, De designates the distance [mm] from the surface on the object side of the image-shake correcting lens element to the incident pupil, G3Rmt designates the lateral magnification of the image-shake correcting lens element, and Fmt designates the lateral magnification of a lens group immediately behind the image-shake correcting lens element.

Abstract: With regard to a glass substrate 1 according to the present invention, a value of an amendment concentricity AC that has taken into consideration Sk and/or Ku calculated from a shape profile over the whole circumference of an inside hole, or the skewness is within a predetermined range. The glass substrate for a magnetic recording medium can stably read servo information including track information stored on a magnetic disk when the glass substrate is used for an HDD.

Abstract: A lens support frame includes an annular body portion; a large diameter lens holding groove on an inner peripheral surface of the body portion which is open on one side; a small diameter lens holding groove formed on an inner peripheral surface of the body portion and is open on the one side; and large-diameter-groove and small-diameter-groove lens-bonding depressions formed on inner peripheral surfaces of a large diameter lens holding groove and the small diameter lens holding groove, respectively, and allow an adhesive to be injected into the large-diameter-groove and small-diameter-groove lens-bonding depressions through end openings thereof on the one side, the end opening of the small-diameter-groove lens-bonding depression being communicatively connected with the large-diameter-groove lens-bonding depression. Circumferential positions of the large-diameter-groove and small-diameter-groove lens-bonding depressions are mutually different.

Abstract: A manufacturing method of a glass substrate for a magnetic disk is provided whereby nano pits and/or nano scratches cannot be easily produced in polishing a principal face of a glass substrate using a slurry containing zirconium oxide as an abrasive. The manufacturing method of a glass substrate for a magnetic disk includes, for instance, a polishing step of polishing a principal face of a glass substrate using a slurry containing, as an abrasive, zirconium oxide abrasive grains having monoclinic crystalline structures (M) and tetragonal crystalline structures (T).

Abstract: A method of manufacturing a magnetic disk glass substrate has a cleaning step of cleaning the glass substrate. In the cleaning step, the cleaning is performed under an acidic condition using a cleaning liquid containing oxalate ions and bivalent iron ions. In parallel with the cleaning step or before or after the cleaning step, trivalent iron ions generated by oxidation of the bivalent iron ions contained in the cleaning liquid are reduced by ultraviolet irradiation.

Abstract: Provided is a mask blank glass substrate that has high surface smoothness, that is formed with a fiducial mark capable of improving the detection accuracy of a defect position or the like, and that enables reuse or recycling of a glass substrate included therein. An underlayer is formed on a main surface, on the side where a transfer pattern is to be formed, of a glass substrate for a mask blank. The underlayer serves to reduce surface roughness of the main surface of the glass substrate or to reduce defects of the main surface of the glass substrate. A surface of the underlayer is a precision-polished surface. A fiducial mark which provides a reference for a defect position in defect information is formed on the underlayer.

Abstract: An optical Glass characterized by comprising, denoted as molar percentages: B2O5—5 to 45 percent; SiO2—0 to 6 percent (excluding 6 percent); Li2O, Na2O, K2O in total—0 to 3 percent; ZnO—10 to 40 percent; La2O3. 5 to 30 percent; Gd2O3—1 to 20 percent; and ZrO2, TaO2, TiO2, Nb2O5, WO3, and Bi2O3 in total—2.5 to 20 percent. The cation ratio of the Ti4+ content relative to the total content of Zr4+, Ta5+, Ti4+, Nb5+, W6+, and Bi3+ is 0.30 or lower; in that the temperature Tp at which a viscosity of 107.2 dPa·s is exhibited is 706° C. or lower. The refractive index nd and the Abbé number v(nu)d satisfy all of the following relations (I) to (IV): 34.0?vd<40 (I); nd?1.87 (II); nd?2.245?0.01×vd (III) and nd?2.28?0.01×vd (IV).

Abstract: There is provided that a substrate comprising a glass substrate 2 constituted by a glass including a silicon oxide. The glass substrate has a through-hole 3 communicating with a front surface and a rear surface of the glass substrate, and filled with a metal material. The substrate is realized by forming an anchor part by selectively etching a silicon oxide on a sidewall surrounding an inside of said through-hole 3 before filling the metal material and by filling the inside of said through-hole 3 with the metal material after forming the anchor part.

Abstract: The present invention is a reflective mask blank used to fabricate a reflective mask, which has a laminated structure of a multilayer reflective film, an absorber film and an etching mask film in this order on a substrate, wherein the etching mask film comprises a material containing chromium, the absorber film comprises a material containing tantalum, a highly oxidized layer is formed on the surface layer of the absorber film on the opposite side from the substrate, and a Ta 4f narrow spectrum of the highly oxidized layer when analyzed by X-ray photoelectron spectroscopy has a maximum peak at a binding energy of more than 23 eV.

Abstract: The present invention is a mask blank used to fabricate a transfer mask, which has a laminated structure of a light shielding film and an etching mask film in this order on a transparent substrate, wherein the etching mask film comprises a material containing chromium, the light shielding film comprises a material containing tantalum, a highly oxidized layer is formed on the surface layer of the light shielding film on the opposite side from the transparent substrate, and a Ta 4 f narrow spectrum of the highly oxidized layer analyzed by X-ray photoelectron spectroscopy has a maximum peak at a binding energy of more than 23 eV.

Abstract: A reflective mask blank and a reflective mask that can improve the contrast for EUV exposure light in use of the mask and further can improve the pattern resolution at a pattern edge portion of the mask, thereby enabling high-resolution pattern transfer. The reflective mask blank has a substrate and, further, a multilayer reflective film adapted to reflect the EUV exposure light and an absorber film adapted to absorb the EUV exposure light, which are formed in this order over the substrate. The absorber film is made of a material containing Ta and has a film density of 6.0 to 16.0 g/cm3. A reflective mask is obtained by forming a transfer pattern in the absorber film of the reflective mask blank.

Abstract: The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a lower layer, an interlayer and an upper layer are laminated in this order from the side close to the light transmissive substrate; the thickness of the entire light-shielding film is 60 nm or less; the lower layer is made of a film containing a metal and has a first etching rate; the upper layer is made of a film containing a metal and has a third etching rate; the interlayer is made of a film containing the same metal as that contained in the lower layer or the upper layer and has a second etching rate that is lower than the first etching rate and the third etching rate; and the thickness of the interlayer is 30% or less of the thickness of the entire light-shielding film.

Abstract: An optical glass having a refractive index nd of 1.70 or greater and an Abbé number of 50 or greater. Given as mole percentages, it comprises: B2O3 (20 to 80 percent), SiO2 (0 to 30 percent), Li2O (1 to 25 percent), ZnO (0 to 20 percent), La2O3 (4 to 30 percent), Gd2O3 (1 to 25 percent), Y2O3 (0 to 20 percent), ZrO2 (0 to 5 percent), MgO (0 to 25 percent), CaO (0 to 15 percent), and SrO (0 to 10 percent), with the combined quantity of the above components being 97 percent or greater. The molar ratio of {ZnO/(La2O3+Gd2O3+Y2O3)} is 0.8 or less and the molar ratio of {(CaO+SrO+BaO)/(La2O3+Gd2O3+Y2O3)} is 0.8 or less. Ta2O5 may be incorporated as an optional component, with the molar ratio {(ZrO2+Ta2O5)/(La2O3+Gd2O3+Y2O3)} being 0.4 or less.