Patents by Inventor Hsi-Hsin Hong

Hsi-Hsin Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for removing photo-resist
    Patent number: 6283134
    Abstract: An apparatus for removing photo-resist. The apparatus comprises carriers for carrying a wafer, hot plates to remove residue solvent on the wafer, a cooling plate to decrease the wafer temperature, an reverse unit to turn over the wafer, a development unit to develop and remove photo-resist on the wafer, a top scrubbing unit to clean a top side of the wafer, and a back scrubbing unit to clean a back side of the wafer.
    Type: Grant
    Filed: January 22, 1998
    Date of Patent: September 4, 2001
    Assignee: United Microelectronics Corp.
    Inventors: Army Chung, Hsi-Hsin Hong, Chi-Fa Ku
  • Method of removing photo-resist
    Patent number: 6153360
    Abstract: A method of removing photo-resist. Acetone, thinner, and deionized water for scrubbing a wafer are used to clean a wafer on which a photo-resist layer is formed, so that thinner and deionized water are mutually dissolvable with acetone as medium. The photo-resist layer is then removed.
    Type: Grant
    Filed: January 22, 1998
    Date of Patent: November 28, 2000
    Assignee: United Microelectronics Corp.
    Inventors: Army Chung, Hsi-Hsin Hong, Chi-Fa Ku
  • Method and monitor testsite pattern for measuring critical dimension openings
    Patent number: 5637186
    Abstract: A process and a monitor structure to measure semiconductor device dimensions, especially contact and via hole dimensions, and proximity effects. The monitor has structures and layers which match the thickness and configuration of the product devices and allow measurement of step heights and proximity measurements. The monitor pattern includes an alignment region for use with automeasurement equipment. Measurements of openings are performed on the monitor at various points during the fabrication process.
    Type: Grant
    Filed: November 22, 1995
    Date of Patent: June 10, 1997
    Assignee: United Microelectronics Corporation
    Inventors: Chih-Chiang Liu, Po-Wen Yen, Hsi-Hsin Hong