Patents by Inventor Hsiang-Chien Hsu

Hsiang-Chien Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250130490
    Abstract: A method for repairing a lithography mask is provided. The method includes receiving a lithography mask having a capping layer that includes a damaged region, identifying a location and a dimension of the damaged region of the capping layer, determining a repairing time duration based on the dimension of the damaged region of the capping layer, and forming a capping patch layer in the damaged region of the capping layer.
    Type: Application
    Filed: March 20, 2024
    Publication date: April 24, 2025
    Inventors: Ying-Hui HSIEH, Boming HSU, Hsiang-Chien HSU, Chien-Hung LAI
  • Patent number: 6841311
    Abstract: A new sequence and chemical composition for cleaning the surface of a halftone shift masks that use MoSiON as shifter material is provided. For purposes of repair or rework, the pellicle is removed from the mask so that the mask can be accessed. After the rework or repair has been completed, a new clean process is performed, for the new clean process the sequence of steps that is conventionally performed has been modified. After the new clean process has been completed, the pellicle is reinstalled over the surface of the mask.
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: January 11, 2005
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Same-Ting Chen, Cheng-Shien Lee, Chin-Wang Hu, Chieh-Yuan Cheng, Hsiang-Chien Hsu, Tzy-Ying Lin, Wen-Rong Huang