Patents by Inventor Hsiang-Chiu Wu
Hsiang-Chiu Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240136291Abstract: Semiconductor devices and methods of forming the same are provided. In some embodiments, a method includes receiving a workpiece having a redistribution layer disposed over and electrically coupled to an interconnect structure. In some embodiments, the method further includes patterning the redistribution layer to form a recess between and separating a first conductive feature and a second conductive feature of the redistribution layer, where corners of the first conductive feature and the second conductive feature are defined adjacent to and on either side of the recess. The method further includes depositing a first dielectric layer over the first conductive feature, the second conductive feature, and within the recess. The method further includes depositing a nitride layer over the first dielectric layer. In some examples, the method further includes removing portions of the nitride layer disposed over the corners of the first conductive feature and the second conductive feature.Type: ApplicationFiled: January 12, 2023Publication date: April 25, 2024Inventors: Hsiang-Ku SHEN, Chen-Chiu HUANG, Chia-Nan LIN, Man-Yun WU, Wen-Tzu CHEN, Sean YANG, Dian-Hao CHEN, Chi-Hao CHANG, Ching-Wei LIN, Wen-Ling CHANG
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Patent number: 9448217Abstract: A gas sensing system includes an air intake hole which comprises a plurality of micro-flow channels, a replaceable sensor for receiving an air from the air intake hole and detecting the received air, and a processing unit coupled to the replaceable sensor and doing determination for the component of the air according to a detection result of the replaceable sensor. Wherein, the replaceable sensor includes a plurality of sensing chips arranged in an array and each sensing chip is coated with a sensing thin film separately to detect a different gas.Type: GrantFiled: March 3, 2014Date of Patent: September 20, 2016Assignee: NATIONAL TSING HUA UNIVERSITYInventors: Hsiang-Chiu Wu, Shih-Wen Chiu, Ting-I Chou, Chia-Min Yang, Da-Jeng Yao, Hsin Chen, Kea-Tiong Tang
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Publication number: 20150136600Abstract: A gas sensing system includes an air intake hole which comprises a plurality of micro-flow channels, a replaceable sensor for receiving an air from the air intake hole and detecting the received air, and a processing unit coupled to the replaceable sensor and doing determination for the component of the air according to a detection result of the replaceable sensor. Wherein, the replaceable sensor includes a plurality of sensing chips arranged in an array and each sensing chip is coated with a sensing thin film separately to detect a different gas.Type: ApplicationFiled: March 3, 2014Publication date: May 21, 2015Applicant: National Tsing Hua UniversityInventors: Hsiang-Chiu Wu, Shih-Wen Chiu, Ting-I Chou, Chia-Min Yang, Da-Jeng Yao, Hsin Chen, Kea-Tiong Tang
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Patent number: 8018147Abstract: A double-faced display apparatus includes a first transparent substrate, second transparent substrate, frame adhesive, first OELD, second OELD, first buffer layer, second buffer layer, first absorbent layer and second absorbent layer. The second transparent substrate is disposed in parallel to the first transparent substrate. The frame adhesive is disposed between the first transparent substrate and second transparent substrate for defining a space. The first OELD is disposed in the space and located on the first transparent substrate. The second OELD is disposed in the space and located on the second transparent substrate. The first buffer layer is disposed in the space and covers the first OELD. The second buffer layer is disposed in the space and covering the second OELD. The first absorbent layer is disposed in the space and covers the first buffer layer. The second absorbent layer is disposed in the space and covers the second buffer layer.Type: GrantFiled: July 12, 2007Date of Patent: September 13, 2011Assignee: Au Optronics CorporationInventors: Min-Ling Hung, Hsiang-Chiu Wu, Chun-Yi Chiu, Min-Chieh Hu
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Publication number: 20080110363Abstract: The disclosed is a physisorption-based microcontact printing process capable of controlling film thickness, primarily for creating patterns of thin film of organic molecules in micron and submicron scales, comprising an inking phase, a printing phase, and a demolding phase. The inking phase is combined with a thin-film growth approach, wherein the thin-film approach enables growth of an organic thin film with desired thickness onto a stamp, effectively controls the thickness of the pattern of the organic thin film transferred in the next printing phase. The demolding phase enables proper control of the temperature of and the printing pressure upon the transferred thin-film pattern to control the quality of surface roughness and residual internal stress in the printed pattern.Type: ApplicationFiled: November 14, 2006Publication date: May 15, 2008Applicant: NATIONAL CHUNG CHENG UNIVERSITYInventors: Jung-Wei John Cheng, Jeng-Rong Ho, Wei-Hsuan Hung, Jia-De Jhu, Hsiang-Chiu Wu, Wei-Chun Lin, Wei-Ben Wang
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Publication number: 20080012478Abstract: A double-faced display apparatus includes a first transparent substrate, second transparent substrate, frame adhesive, first OELD, second OELD, first buffer layer, second buffer layer, first absorbent layer and second absorbent layer. The second transparent substrate is disposed in parallel to the first transparent substrate. The frame adhesive is disposed between the first transparent substrate and second transparent substrate for defining a space. The first OELD is disposed in the space and located on the first transparent substrate. The second OELD is disposed in the space and located on the second transparent substrate. The first buffer layer is disposed in the space and covers the first OELD. The second buffer layer is disposed in the space and covering the second OELD. The first absorbent layer is disposed in the space and covers the first buffer layer. The second absorbent layer is disposed in the space and covers the second buffer layer.Type: ApplicationFiled: July 12, 2007Publication date: January 17, 2008Applicant: AU OPTRONICS CORP.Inventors: Min-Ling Hung, Hsiang-Chiu Wu, Chun-Yi Chiu, Min-Chieh Hu
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Publication number: 20070237889Abstract: A direct and effective method of fabricating full-color OLED arrays on the basis of microcontact printing process is disclosed. The key of the method lies in a physisorption-based microcontact printing process capable of controlling thickness of the printed films. The organic EL materials involved can be of either small or large molecular weights, as long as they are suitable for solution process.Type: ApplicationFiled: March 28, 2007Publication date: October 11, 2007Applicant: NATIONAL CHUNG CHENG UNIVERSITYInventors: Jung-Wei John Cheng, Jeng-Rong Ho, Wei-Hsuan Hung, Jia-De Jhu, Hsiang-Chiu Wu, Wei-Chun Lin, Wei-Ben Wang
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Publication number: 20070170848Abstract: A dual emission display and a method of manufacturing a dual emission display are provided. The method comprises providing a substrate having a first region and a second region, forming a light shielding layer on the second region, forming a controlling device on the light shielding layer, forming an organic emitting device electrically connected to the controlling device, thereby completing a first display device. The first display device and a second display device, obtained by repeating the above procedures, are oppositely disposed and packaged to complete the dual emission display.Type: ApplicationFiled: July 11, 2006Publication date: July 26, 2007Applicant: AU OPTRONICS CORP.Inventors: Hsiang-Chiu Wu, Shi-Hao Li