Patents by Inventor HSIANG-JEN CHENG

HSIANG-JEN CHENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11545935
    Abstract: An oscillator wafer-level-package structure is provided, comprising a bottom layer, an oscillator crystal and a capping layer. The bottom layer includes an upper plane, the capping layer includes a lower plane, and the oscillator crystal is disposed between the bottom layer and the capping layer and includes at least one cavity. An upper seal ring and a lower seal ring are respectively surrounding the oscillator crystal such that the oscillator crystal is sealed in between the capping layer and the bottom layer by employing the upper and lower seal rings. In addition, a diffusion barrier is further disposed in the upper seal ring and in the lower seal ring for avoiding interface diffusion. Moreover, the present invention adopts the same material for fabricating the capping layer, the oscillator crystal and the bottom layer to achieve an optimal thermal stress result when realizing the packaging structure.
    Type: Grant
    Filed: May 26, 2021
    Date of Patent: January 3, 2023
    Assignee: TXC Corporation
    Inventors: Chih-Hsun Chu, Chih-Hung Chiu, Wun-Kai Wang, Hsiang-Jen Cheng
  • Publication number: 20210376792
    Abstract: An oscillator wafer-level-package structure is provided, comprising a bottom layer, an oscillator crystal and a capping layer. The bottom layer includes an upper plane, the capping layer includes a lower plane, and the oscillator crystal is disposed between the bottom layer and the capping layer and includes at least one cavity. An upper seal ring and a lower seal ring are respectively surrounding the oscillator crystal such that the oscillator crystal is sealed in between the capping layer and the bottom layer by employing the upper and lower seal rings. In addition, a diffusion barrier is further disposed in the upper seal ring and in the lower seal ring for avoiding interface diffusion. Moreover, the present invention adopts the same material for fabricating the capping layer, the oscillator crystal and the bottom layer to achieve an optimal thermal stress result when realizing the packaging structure.
    Type: Application
    Filed: May 26, 2021
    Publication date: December 2, 2021
    Inventors: CHIH-HSUN CHU, CHIH-HUNG CHIU, WUN-KAI WANG, HSIANG-JEN CHENG
  • Publication number: 20020108739
    Abstract: Disclosed is a process and apparatus for transferring heat from a heat source at a first temperature to a heat sink at a second higher temperature in a phase change of a heat transfer fluid. The heat transfer fluid is subjected to a pressure variation which changes the temperature at which the phase change takes place.
    Type: Application
    Filed: August 13, 1999
    Publication date: August 15, 2002
    Inventors: SING-WANG CHENG, HSIANG-JEN CHENG