Patents by Inventor Hsiang-Ming Feng

Hsiang-Ming Feng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11894308
    Abstract: The present disclosure provides a semiconductor substrate, including a first dielectric layer with a first surface and a second surface, a first conductive via extending between the first surface and the second surface, a first patterned conductive layer on the first surface, and a second patterned conductive layer on the second surface. The first conductive via includes a bottom pattern on the first surface and a second patterned conductive layer on the second surface. The bottom pattern has at least two geometric centers corresponding to at least two geometric patterns, respectively, and a distance between one geometric center and an intersection of the two geometrical patterns is a geometric radius. A distance between the at least two geometric centers is greater than 1.4 times the geometric radius. A method for manufacturing the semiconductor substrate described herein and a semiconductor package structure having the semiconductor substrate are also provided.
    Type: Grant
    Filed: December 1, 2020
    Date of Patent: February 6, 2024
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Sheng-Ming Wang, Tien-Szu Chen, Wen-Chih Shen, Hsing-Wen Lee, Hsiang-Ming Feng
  • Publication number: 20210091006
    Abstract: The present disclosure provides a semiconductor substrate, including a first dielectric layer with a first surface and a second surface, a first conductive via extending between the first surface and the second surface, a first patterned conductive layer on the first surface, and a second patterned conductive layer on the second surface. The first conductive via includes a bottom pattern on the first surface and a second patterned conductive layer on the second surface. The bottom pattern has at least two geometric centers corresponding to at least two geometric patterns, respectively, and a distance between one geometric center and an intersection of the two geometrical patterns is a geometric radius. A distance between the at least two geometric centers is greater than 1.4 times the geometric radius. A method for manufacturing the semiconductor substrate described herein and a semiconductor package structure having the semiconductor substrate are also provided.
    Type: Application
    Filed: December 1, 2020
    Publication date: March 25, 2021
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Sheng-Ming WANG, Tien-Szu CHEN, Wen-Chih SHEN, Hsing-Wen LEE, Hsiang-Ming FENG
  • Patent number: 10854550
    Abstract: The present disclosure provides a semiconductor substrate, including a first dielectric layer with a first surface and a second surface, a first conductive via extending between the first surface and the second surface, a first patterned conductive layer on the first surface, and a second patterned conductive layer on the second surface. The first conductive via includes a bottom pattern on the first surface and a second patterned conductive layer on the second surface. The bottom pattern has at least two geometric centers corresponding to at least two geometric patterns, respectively, and a distance between one geometric center and an intersection of the two geometrical patterns is a geometric radius. A distance between the at least two geometric centers is greater than 1.4 times the geometric radius. A method for manufacturing the semiconductor substrate described herein and a semiconductor package structure having the semiconductor substrate are also provided.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: December 1, 2020
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Sheng-Ming Wang, Tien-Szu Chen, Wen-Chih Shen, Hsing-Wen Lee, Hsiang-Ming Feng
  • Publication number: 20190096814
    Abstract: The present disclosure provides a semiconductor substrate, including a first dielectric layer with a first surface and a second surface, a first conductive via extending between the first surface and the second surface, a first patterned conductive layer on the first surface, and a second patterned conductive layer on the second surface. The first conductive via includes a bottom pattern on the first surface and a second patterned conductive layer on the second surface. The bottom pattern has at least two geometric centers corresponding to at least two geometric patterns, respectively, and a distance between one geometric center and an intersection of the two geometrical patterns is a geometric radius. A distance between the at least two geometric centers is greater than 1.4 times the geometric radius. A method for manufacturing the semiconductor substrate described herein and a semiconductor package structure having the semiconductor substrate are also provided.
    Type: Application
    Filed: August 22, 2018
    Publication date: March 28, 2019
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Sheng-Ming WANG, Tien-Szu CHEN, Wen-Chih SHEN, Hsing-Wen LEE, Hsiang-Ming FENG
  • Patent number: 9054118
    Abstract: An embodiment of a method for making semiconductor device packages includes a heat sink matrix and a substrate. A plurality of semiconductor devices is attached to the substrate. Then, a package body is formed between the heat sink matrix and the substrate, wherein the package body encapsulates the semiconductor devices. Then, a plurality of first cutting slots is formed, wherein the first cutting slots extend through the heat sink matrix and partially extend into the package body. Then, a plurality of second cutting slots is formed, wherein the second cutting slots extend through the substrate and through the package body to the first cutting slot, thereby singulating the heat sink matrix and substrate into a plurality of individual semiconductor device packages.
    Type: Grant
    Filed: June 24, 2014
    Date of Patent: June 9, 2015
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Kuang-Hsiung Chen, Sheng-Ming Wang, Yu-Ying Lee, Hsiang-Ming Feng, Bing-Yun Cheng
  • Patent number: 8866311
    Abstract: The substrate includes a first dielectric layer, a first circuit pattern, a plurality of pillars and a second circuit pattern. The first dielectric layer has opposing first and second dielectric surfaces. The first circuit pattern is embedded in the first dielectric layer and defines a plurality of curved trace surfaces. Each of the pillars has an exterior surface adapted for making external electrical connection and a curved base surface abutting a corresponding one of the trace surfaces. The second circuit pattern is on the second dielectric surface of the first dielectric layer and electrically connected to the first circuit pattern.
    Type: Grant
    Filed: September 21, 2012
    Date of Patent: October 21, 2014
    Assignee: Advanced Semiconductor Engineering, Inc.
    Inventors: Tien-Szu Chen, Kuang-Hsiung Chen, Sheng-Ming Wang, Hsiang-Ming Feng, Yen-Hua Kuo
  • Publication number: 20140308778
    Abstract: An embodiment of a method for making semiconductor device packages includes a heat sink matrix and a substrate. A plurality of semiconductor devices is attached to the substrate. Then, a package body is formed between the heat sink matrix and the substrate, wherein the package body encapsulates the semiconductor devices. Then, a plurality of first cutting slots is formed, wherein the first cutting slots extend through the heat sink matrix and partially extend into the package body. Then, a plurality of second cutting slots is formed, wherein the second cutting slots extend through the substrate and through the package body to the first cutting slot, thereby singulating the heat sink matrix and substrate into a plurality of individual semiconductor device packages.
    Type: Application
    Filed: June 24, 2014
    Publication date: October 16, 2014
    Inventors: Kuang-Hsiung Chen, Sheng-Ming Wang, Yu-Ying Lee, Hsiang-Ming Feng, Bing-Yun Cheng
  • Patent number: 8779581
    Abstract: An embodiment of a method for making semiconductor device packages includes a heat sink matrix and a substrate. A plurality of semiconductor devices are attached to the substrate. Then, a package body is formed between the heat sink matrix and the substrate, wherein the package body encapsulates the semiconductor devices. Then, a plurality of first cutting slots is formed, wherein the first cutting slots extend through the heat sink matrix and partially extend into the package body. Then, a plurality of second cutting slots is formed, wherein the second cutting slots extend through the substrate and through the package body to the first cutting slot, thereby singulating the heat sink matrix and substrate into a plurality of individual semiconductor device packages.
    Type: Grant
    Filed: November 7, 2011
    Date of Patent: July 15, 2014
    Assignee: Advanced Semiconductor Engineering, Inc.
    Inventors: Kuang-Hsiung Chen, Sheng-Ming Wang, Yu-Ying Lee, Hsiang-Ming Feng, Bing-Yun Cheng
  • Patent number: 8686568
    Abstract: The package substrate includes a core, a plurality of first circuit segments, and a plurality of conductive pillars. Each of the first circuit segments has a patterned metal layer disposed on the core, a barrier layer disposed on the patterned metal layer, and an upper metal pattern disposed on the barrier layer. The conductive pillars penetrate the core, the patterned metal layer, and the barrier layer, and contact the upper metal pattern. The conductive pillars are formed from a material that can be selectively removed without affecting the barrier layer.
    Type: Grant
    Filed: September 27, 2012
    Date of Patent: April 1, 2014
    Assignee: Advanced Semiconductor Engineering, Inc.
    Inventors: Sheng-Ming Wang, Hsiang-Ming Feng, Yen-Hua Kuo
  • Publication number: 20140084480
    Abstract: The package substrate includes a core, a plurality of first circuit segments, and a plurality of conductive pillars. Each of the first circuit segments has a patterned metal layer disposed on the core, a barrier layer disposed on the patterned metal layer, and an upper metal pattern disposed on the barrier layer. The conductive pillars penetrate the core, the patterned metal layer, and the barrier layer, and contact the upper metal pattern. The conductive pillars are formed from a material that can be selectively removed without affecting the barrier layer.
    Type: Application
    Filed: September 27, 2012
    Publication date: March 27, 2014
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Sheng-Ming Wang, Hsiang-Ming Feng, Yen-Hua Kuo
  • Publication number: 20140084475
    Abstract: The substrate includes a first dielectric layer, a first circuit pattern, a plurality of pillars and a second circuit pattern. The first dielectric layer has opposing first and second dielectric surfaces. The first circuit pattern is embedded in the first dielectric layer and defines a plurality of curved trace surfaces. Each of the pillars has an exterior surface adapted for making external electrical connection and a curved base surface abutting a corresponding one of the trace surfaces. The second circuit pattern is on the second dielectric surface of the first dielectric layer and electrically connected to the first circuit pattern.
    Type: Application
    Filed: September 21, 2012
    Publication date: March 27, 2014
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Tien-Szu Chen, Kuang-Hsiung Chen, Sheng-Ming Wang, Hsiang-Ming Feng, Yen-Hua Kuo
  • Patent number: 8592962
    Abstract: A Quad Flat No Leads (QFN) package includes a lead frame, a chip, an encapsulant, and a protective layer. The lead frame includes a plurality of leads. Each of the leads has a lower surface that is divided into a contact area and a non-contact area. The chip is configured on and electrically connected to the lead frame. The encapsulant encapsulates the chip and the leads and fills spaces between the leads. The contact areas and the non-contact areas of the leads are exposed by the encapsulant. The protective layer covers the non-contact areas of the leads.
    Type: Grant
    Filed: August 29, 2011
    Date of Patent: November 26, 2013
    Assignee: Advanced Semiconductor Engineering, Inc.
    Inventors: Kuang-Hsiung Chen, Sheng-Ming Wang, Hsiang-Ming Feng, Yu-Ying Lee, Mei-Lin Hsieh
  • Publication number: 20120112338
    Abstract: An embodiment of a method for making semiconductor device packages includes a heat sink matrix and a substrate. A plurality of semiconductor devices are attached to the substrate. Then, a package body is formed between the heat sink matrix and the substrate, wherein the package body encapsulates the semiconductor devices. Then, a plurality of first cutting slots is formed, wherein the first cutting slots extend through the heat sink matrix and partially extend into the package body. Then, a plurality of second cutting slots is formed, wherein the second cutting slots extend through the substrate and through the package body to the first cutting slot, thereby singulating the heat sink matrix and substrate into a plurality of individual semiconductor device packages.
    Type: Application
    Filed: November 7, 2011
    Publication date: May 10, 2012
    Inventors: Kuang-Hsiung Chen, Sheng-Ming Wang, Yu-Ying Lee, Hsiang-Ming Feng, Bing-Yun Cheng
  • Publication number: 20120104584
    Abstract: A Quad Flat No Leads (QFN) package includes a lead frame, a chip, an encapsulant, and a protective layer. The lead frame includes a plurality of leads. Each of the leads has a lower surface that is divided into a contact area and a non-contact area. The chip is configured on and electrically connected to the lead frame. The encapsulant encapsulates the chip and the leads and fills spaces between the leads. The contact areas and the non-contact areas of the leads are exposed by the encapsulant. The protective layer covers the non-contact areas of the leads.
    Type: Application
    Filed: August 29, 2011
    Publication date: May 3, 2012
    Inventors: Kuang-Hsiung Chen, Sheng-Ming Wang, Hsiang-Ming Feng, Yu-Ying Lee, Mei-Lin Hsieh
  • Patent number: 8053175
    Abstract: A method of forming measuring targets for measuring the dimensions of a substrate during a substrate manufacturing process is provided. First, a board having a base layer and a conductive layer is provided, wherein the conductive layer is disposed on a surface of the base layer. Then, at least one through hole is formed in the board as a measuring target for measuring the dimensions of the substrate. Next, a plated via is formed in the through hole as another measuring target for measuring the dimensions of the substrate. Thereafter, a patterned dielectric layer is formed on the board to expose the plated via as a next measuring target for measuring the dimensions of the substrate. In the present invention, measuring targets are formed during a substrate manufacturing process and the dimensions of the substrate are measured instantly. The accuracy in process alignment is improved without increasing the fabrication cost.
    Type: Grant
    Filed: June 10, 2008
    Date of Patent: November 8, 2011
    Assignee: ASE Electroncis Inc.
    Inventor: Hsiang-Ming Feng
  • Publication number: 20090258320
    Abstract: A method of forming measuring targets for measuring the dimensions of a substrate during a substrate manufacturing process is provided. First, a board having a base layer and a conductive layer is provided, wherein the conductive layer is disposed on a surface of the base layer. Then, at least one through hole is formed in the board as a measuring target for measuring the dimensions of the substrate. Next, a plated via is formed in the through hole as another measuring target for measuring the dimensions of the substrate. Thereafter, a patterned dielectric layer is formed on the board to expose the plated via as a next measuring target for measuring the dimensions of the substrate. In the present invention, measuring targets are formed during a substrate manufacturing process and the dimensions of the substrate are measured instantly. The accuracy in process alignment is improved without increasing the fabrication cost.
    Type: Application
    Filed: June 10, 2008
    Publication date: October 15, 2009
    Applicant: ASE Electronics Inc.
    Inventor: Hsiang-Ming Feng