Patents by Inventor Hsiang-Wen HSUEH

Hsiang-Wen HSUEH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240126123
    Abstract: This disclosure provides an electronic device and a manufacturing method thereof. The electronic device includes a first substrate, a second substrate, a first supporting member and a plurality of second supporting members. The first supporting member and the second supporting members are disposed between the first substrate and the second substrate. The first supporting member includes a first bottom surface and a first top surface. The second supporting member is disposed adjacent to the first supporting member and includes a second bottom surface and a second top surface. The difference between the radius of the first bottom surface and the radius of the first top surface is defined as a first radius bias. The difference between the radius of the second bottom surface and the radius of the second top surface is defined as a second radius bias. The first radius bias is greater than the second radius bias.
    Type: Application
    Filed: September 8, 2023
    Publication date: April 18, 2024
    Applicant: InnoLux Corporation
    Inventors: Chiung-Chieh KUO, Chi-Han HSIEH, Hsiang-Wen HSUEH, Shu-Hung SHEN